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公开(公告)号：US20110105000A1
公开(公告)日：2011-05-05
申请号：US12891612
申请日：2010-09-27
摘要： A polishing pad includes a polymer matrix and polyhedral oligomeric silsequioxane (“POSS”) molecules or soluble particles and a surfactant dispersed within the polymer matrix. A polishing pad can be formed by casting a liquid polymer on a conveyer belt having a casting surface with a set of projections and curing the liquid polymer on the conveyer belt such that a polymer matrix has a surface with a second set of projections complimentary to the first set of projections.
摘要翻译： 抛光垫包括分散在聚合物基体内的聚合物基质和多面体低聚硅氧烷（“POSS”）分子或可溶性颗粒和表面活性剂。 可以通过在具有铸造表面的输送带上浇铸具有一组突起的液体聚合物并将液体聚合物固化在输送带上的方法来形成抛光垫，使得聚合物基质具有与第二组突起互补的表面 第一套预测。
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公开(公告)号：US10160093B2
公开(公告)日：2018-12-25
申请号：US12631557
申请日：2009-12-04
IPC分类号： H01L21/321 , B24B41/06 , B24B7/20 , B24B37/30 , B24B37/32
摘要： An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.
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公开(公告)号：US08662957B2
公开(公告)日：2014-03-04
申请号：US12825276
申请日：2010-06-28
IPC分类号： B24B49/00
CPC分类号： B24B37/205 , B24B37/26 , B24B49/12
摘要： In one aspect, a polishing pad includes a homogeneous unitary polishing layer having a polishing surface, an opposed bottom surface, a recess in the polishing surface extending partially but not entirely through the polishing layer, and a solid light-transmissive window is secured in the recess. In another aspect, a polishing pad includes a polishing layer having a polishing surface, and the polishing surface includes a first region having a first plurality of grooves with a first depth extending partially but not entirely through the polishing layer and a second region surrounded by the first region and having a second plurality of grooves with a second depth extending partially but not entirely through the polishing layer, the second depth greater than the first depth.
摘要翻译： 在一个方面，抛光垫包括具有研磨表面，相对的底表面，抛光表面中的部分但不完全延伸穿过抛光层的凹部的均匀单一抛光层，并且固体透光窗口固定在 休息。 在另一方面，抛光垫包括具有抛光表面的抛光层，并且抛光表面包括具有第一多个凹槽的第一区域，该第一区域具有部分但不完全延伸穿过该抛光层的第一深度和由该抛光层包围的第二区域 第一区域并且具有第二多个凹槽，其具有部分但不完全延伸穿过抛光层的第二深度，第二深度大于第一深度。
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公开(公告)号：US20100330879A1
公开(公告)日：2010-12-30
申请号：US12825276
申请日：2010-06-28
CPC分类号： B24B37/205 , B24B37/26 , B24B49/12
摘要： In one aspect, a polishing pad includes a homogeneous unitary polishing layer having a polishing surface, an opposed bottom surface, a recess in the polishing surface extending partially but not entirely through the polishing layer, and a solid light-transmissive window is secured in the recess. In another aspect, a polishing pad includes a polishing layer having a polishing surface, and the polishing surface includes a first region having a first plurality of grooves with a first depth extending partially but not entirely through the polishing layer and a second region surrounded by the first region and having a second plurality of grooves with a second depth extending partially but not entirely through the polishing layer, the second depth greater than the first depth.
摘要翻译： 在一个方面，抛光垫包括具有研磨表面，相对的底表面，抛光表面中的部分但不完全延伸穿过抛光层的凹部的均匀单一抛光层，并且固体透光窗口固定在 休息。 在另一方面，抛光垫包括具有抛光表面的抛光层，并且抛光表面包括具有第一多个凹槽的第一区域，该第一区域具有部分但不完全延伸穿过该抛光层的第一深度和由该抛光层包围的第二区域 第一区域并且具有第二多个凹槽，其具有部分但不完全延伸穿过抛光层的第二深度，第二深度大于第一深度。
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公开(公告)号：US20100311311A1
公开(公告)日：2010-12-09
申请号：US12631239
申请日：2009-12-04
CPC分类号： B24B37/30
摘要： A flexible membrane includes a horizontal central portion, a vertical portion coupled to the central portion, a thick rim portion coupled to the vertical portion, and an extension coupled to the thick rim portion. An outer surface of the horizontal central portion provides a mounting surface configured to receive a substrate. The thick rim portion has a thickness that is greater than a portion directly adjacent to the thick rim portion. The thick rim portion is between the extension and the vertical portion and a greatest dimension of the extension is less than the thickness of the thick rim portion.
摘要翻译： 柔性膜包括水平中心部分，连接到中心部分的垂直部分，耦合到垂直部分的厚边缘部分，以及连接到厚边缘部分的延伸部分。 水平中心部分的外表面提供了构造成接收基底的安装表面。 厚边缘部分的厚度大于与厚边缘部分直接相邻的部分。 厚边缘部分在延伸部分和垂直部分之间，并且延伸部分的最大尺寸小于厚边缘部分的厚度。
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公开(公告)号：US08475231B2
公开(公告)日：2013-07-02
申请号：US12631239
申请日：2009-12-04
CPC分类号： B24B37/30
摘要： A flexible membrane includes a horizontal central portion, a vertical portion coupled to the central portion, a thick rim portion coupled to the vertical portion, and an extension coupled to the thick rim portion. An outer surface of the horizontal central portion provides a mounting surface configured to receive a substrate. The thick rim portion has a thickness that is greater than a portion directly adjacent to the thick rim portion. The thick rim portion is between the extension and the vertical portion and a greatest dimension of the extension is less than the thickness of the thick rim portion.
摘要翻译： 柔性膜包括水平中心部分，连接到中心部分的垂直部分，耦合到垂直部分的厚边缘部分和连接到厚边缘部分的延伸部分。 水平中心部分的外表面提供了构造成接收基底的安装表面。 厚边缘部分的厚度大于与厚边缘部分直接相邻的部分。 厚边缘部分在延伸部分和垂直部分之间，并且延伸部分的最大尺寸小于厚边缘部分的厚度。
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公开(公告)号：US20100173566A1
公开(公告)日：2010-07-08
申请号：US12631557
申请日：2009-12-04
CPC分类号： B24B37/30 , B24B37/32 , H01L21/3212
摘要： An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.
摘要翻译： 一种装置包括用于与基板化学机械抛光装置的载体头一起使用的柔性膜。 膜包括提供基板接收表面的外表面，其中外表面具有中心部分和围绕中心部分的边缘部分，其中中心部分具有第一表面粗糙度，并且边缘部分具有第二表面粗糙度，第一 表面粗糙度大于第二表面粗糙度。
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公开(公告)号：US20140287662A1
公开(公告)日：2014-09-25
申请号：US14219913
申请日：2014-03-19
申请人： Irfanulla Khuddus Rahmathullah , Bopanna Ichettira Vansantha , Padma Gopalakrishnan , Abraham Palaty , Aswathnarayanaiah Ravi , Ashish Bhatnagar , Young J. Paik , Stacy Meyer , Daniel Martin
发明人： Irfanulla Khuddus Rahmathullah , Bopanna Ichettira Vansantha , Padma Gopalakrishnan , Abraham Palaty , Aswathnarayanaiah Ravi , Ashish Bhatnagar , Young J. Paik , Stacy Meyer , Daniel Martin
IPC分类号： B24B37/32
CPC分类号： B24B37/32
摘要： A retaining ring includes a generally annular upper portion having a top surface configured to be connected to a base of a carrier head and a lower surface, and a plurality of substantially identical arcuate segments detachably secured to the upper portion to form an annular lower portion. Each of the arcuate segments has an upper surface that abuts the lower surface of the upper portion and a bottom surface for contacting a polishing pad during polishing.
摘要翻译： 保持环包括大致环形的上部，其具有构造成连接到承载头和下表面的基部的顶表面，以及可拆卸地固定到上部以形成环形下部的多个基本相同的弧形段。 每个弧形段具有邻接上部下表面的上表面和用于在抛光过程中接触抛光垫的底表面。
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公开(公告)号：US08722389B1
公开(公告)日：2014-05-13
申请号：US13089380
申请日：2011-04-19
摘要： A system and method for culturing algae are presented. The system and method utilize a fog of growth medium that is delivered to an algal mat generator along with a stream of CO2 to promote growth of algal cells contained in the generator.
摘要翻译： 提出了一种培养藻类的系统和方法。 该系统和方法利用生长培养基的雾，其与CO 2流一起递送至藻类发生器以促进发生器中包含的藻细胞的生长。
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10.发明授权Heated catalytic treatment of an effluent gas from a substrate fabrication process 有权对基板制造工艺中的废气进行加热催化处理公开(公告)号：US06824748B2
公开(公告)日：2004-11-30
申请号：US09872254
申请日：2001-06-01
申请人： Tony S. Kaushal , Shamouil Shamouilian , Harshad Borgaonkar , Kwok Manus Wong , Michael G. Chafin , Ashish Bhatnagar
发明人： Tony S. Kaushal , Shamouil Shamouilian , Harshad Borgaonkar , Kwok Manus Wong , Michael G. Chafin , Ashish Bhatnagar
IPC分类号： F28D2100
CPC分类号： H01J37/32844 , B01D53/8662 , B01D53/885 , B01J19/12 , B01J19/129 , B01J2219/0809 , B01J2219/083 , B01J2219/0835 , B01J2219/0871 , B01J2219/0875 , B01J2219/0892 , C23C16/4412 , H01J37/3244 , Y02C20/30
摘要： A substrate processing apparatus has a process chamber with a substrate support, a gas supply to introduce a gas into the chamber, and a gas energizer to energize the gas in the processing of a substrate, thereby generating an effluent gas. A catalytic reactor has an effluent gas inlet to receive the effluent gas and an effluent gas outlet to exhaust treated effluent gas. A heater is adapted to heat the effluent gas in the catalytic reactor. The heated catalytic treatment of the effluent gas abates the hazardous gases in the effluent. An additive gas source and a prescrubber may also be used to further treat the effluent.
摘要翻译： 基板处理装置具有具有基板支撑件的处理室，向室内引入气体的气体供给部，以及在基板的加工中使气体通电的气体增压器，从而产生流出气体。 催化反应器具有用于接收废气的废气入口和用于排出经处理的废气的废气出口。 加热器适于加热催化反应器中的废气。 流出气体的加热催化处理减少流出物中的有害气体。 还可以使用添加气体源和预饱和物来进一步处理流出物。
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