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公开(公告)号:US20050229426A1
公开(公告)日:2005-10-20
申请号:US11054336
申请日:2005-02-09
申请人: Younes Achkire , Alexander Lerner , Boris Govzman , Boris Fishkin , Michael Sugarman , Rashid Mavliev , Haoquan Fang , Shijian Li , Guy Shirazi , Jianshe Tang
发明人: Younes Achkire , Alexander Lerner , Boris Govzman , Boris Fishkin , Michael Sugarman , Rashid Mavliev , Haoquan Fang , Shijian Li , Guy Shirazi , Jianshe Tang
IPC分类号: B05D3/02 , F26B3/00 , H01L21/00 , H01L21/306
CPC分类号: H01L21/02052 , H01L21/67034
摘要: In a first aspect, a first method of drying a substrate is provided. The first method includes the steps of (1) lifting a substrate through an air/fluid interface at a first rate; (2) directing a drying vapor at the air/fluid interface during lifting of the substrate; and (3) while a portion of the substrate remains in the air/fluid interface, reducing a rate at which a remainder of the substrate is lifted through the air/fluid interface to a second rate. The drying vapor may form an angle of about 23° with the air/fluid interface and/or the second rate may be about 2.5 mm/sec.
摘要翻译: 在第一方面中,提供了干燥基板的第一种方法。 第一种方法包括以下步骤:(1)以第一速率提升衬底通过空气/流体界面; (2)在提升衬底期间在空气/流体界面处引导干燥蒸汽; 和(3)当衬底的一部分保留在空气/流体界面中时,降低衬底的剩余部分通过空气/流体界面提升到第二速率的速率。 干燥蒸气可以与空气/流体界面形成约23°的角度和/或第二速率可以为约2.5mm / sec。
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公开(公告)号:US20050241684A1
公开(公告)日:2005-11-03
申请号:US11179926
申请日:2005-07-12
申请人: Younes Achkire , Alexander Lerner , Boris Govzman , Boris Fishkin , Michael Sugarman , Rashid Mavleiv , Haoquan Fang , Shijian Li , Guy Shirazi , Jianshe Tang
发明人: Younes Achkire , Alexander Lerner , Boris Govzman , Boris Fishkin , Michael Sugarman , Rashid Mavleiv , Haoquan Fang , Shijian Li , Guy Shirazi , Jianshe Tang
IPC分类号: H01L21/304 , H01L21/00 , B08B3/00
CPC分类号: H01L21/67034 , B08B3/10 , H01L21/67751 , H01L21/681 , H01L21/68764 , Y10S414/139
摘要: In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line with a load port to a second orientation wherein the wafer is in line with an unload port; (2) a catcher adapted to contact and travel passively with a wafer as it is unloaded from the processing portion; (3) an enclosed output portion adapted to create a laminar air flow from one side thereof to the other; (4) an output portion having a plurality of wafer receivers; (5) submerged fluid nozzles; and/or (6) drying gas flow deflectors, etc. Other aspects include methods of wafer processing.
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公开(公告)号:US20070295371A1
公开(公告)日:2007-12-27
申请号:US11846400
申请日:2007-08-28
申请人: Younes Achkire , Alexander Lerner , Boris Govzman , Boris Fishkin , Michael Sugarman , Rashid Mavleiv , Haoquan Fang , Shijian Li , Guy Shirazi , Jianshe Tang
发明人: Younes Achkire , Alexander Lerner , Boris Govzman , Boris Fishkin , Michael Sugarman , Rashid Mavleiv , Haoquan Fang , Shijian Li , Guy Shirazi , Jianshe Tang
IPC分类号: B08B1/00
CPC分类号: H01L21/67034 , B08B3/10 , H01L21/67751 , H01L21/681 , H01L21/68764 , Y10S414/139
摘要: In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line with a load port to a second orientation wherein the wafer is in line with an unload port; (2) a catcher adapted to contact and travel passively with a wafer as it is unloaded from the processing portion; (3) an enclosed output portion adapted to create a laminar air flow from one side thereof to the other; (4) an output portion having a plurality of wafer receivers; (5) submerged fluid nozzles; and/or (6) drying gas flow deflectors, etc. Other aspects include methods of wafer processing.
摘要翻译: 在第一方面,提供一种适于处理晶片的模块。 模块包括具有一个或多个特征的处理部分,例如(1)可旋转晶片支撑件,用于从第一取向旋转输入晶片,其中晶片与负载端口对准至第二取向,其中晶片与 卸货港 (2)捕捉器,其适于在从所述处理部分卸载时与晶片被动接触和行进; (3)适于产生从其一侧到另一侧的层流空气流的封闭输出部分; (4)具有多个晶片接收器的输出部分; (5)浸没式流体喷嘴; 和/或(6)干燥气体导流板等。其它方面包括晶片处理的方法。
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公开(公告)号:US20060174921A1
公开(公告)日:2006-08-10
申请号:US11398058
申请日:2006-04-04
申请人: Younes Achkire , Alexander Lerner , Boris Govzman , Boris Fishkin , Michael Sugarman , Rashid Mavleiv , Haoquan Fang , Shijian Li , Guy Shirazi , Jianshe Tang
发明人: Younes Achkire , Alexander Lerner , Boris Govzman , Boris Fishkin , Michael Sugarman , Rashid Mavleiv , Haoquan Fang , Shijian Li , Guy Shirazi , Jianshe Tang
IPC分类号: B08B3/00
CPC分类号: H01L21/67034 , B08B3/10 , H01L21/67751 , H01L21/681 , H01L21/68764 , Y10S414/139
摘要: In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line with a load port to a second orientation wherein the wafer is in line with an unload port; (2) a catcher adapted to contact and travel passively with a wafer as it is unloaded from the processing portion; (3) an enclosed output portion adapted to create a laminar air flow from one side thereof to the other; (4) an output portion having a plurality of wafer receivers; (5) submerged fluid nozzles; and/or (6) drying gas flow deflectors, etc. Other aspects include methods of wafer processing.
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公开(公告)号:US07513062B2
公开(公告)日:2009-04-07
申请号:US11054336
申请日:2005-02-09
申请人: Younes Achkire , Alexander N Lerner , Boris Govzman , Boris Fishkin , Michael N Sugarman , Rashid A Mavliev , Haoquan Fang , Shijian Li , Guy E Shirazi , Jianshe Tang
发明人: Younes Achkire , Alexander N Lerner , Boris Govzman , Boris Fishkin , Michael N Sugarman , Rashid A Mavliev , Haoquan Fang , Shijian Li , Guy E Shirazi , Jianshe Tang
CPC分类号: H01L21/02052 , H01L21/67034
摘要: In a first aspect, a first method of drying a substrate is provided. The first method includes the steps of (1) lifting a substrate through an air/fluid interface at a first rate; (2) directing a drying vapor at the air/fluid interface during lifting of the substrate; and (3) while a portion of the substrate remains in the air/fluid interface, reducing a rate at which a remainder of the substrate is lifted through the air/fluid interface to a second rate. The drying vapor may form an angle of about 23° with the air/fluid interface and/or the second rate may be about 2.5 mm/sec.
摘要翻译: 在第一方面中,提供了干燥基板的第一种方法。 第一种方法包括以下步骤:(1)以第一速率提升衬底通过空气/流体界面; (2)在提升衬底期间在空气/流体界面处引导干燥蒸汽; 和(3)当衬底的一部分保留在空气/流体界面中时,降低衬底的剩余部分通过空气/流体界面提升到第二速率的速率。 干燥蒸气可以与空气/流体界面形成约23°的角度和/或第二速率可以为约2.5mm / sec。
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公开(公告)号:US06227585B1
公开(公告)日:2001-05-08
申请号:US09206087
申请日:1998-12-04
IPC分类号: B25J1506
摘要: Substrate handling apparatus and methods are described. In one aspect, the substrate handling apparatus includes a clamping member having an extended condition wherein substrate movement relative to the transfer arm is substantially restricted and a retracted condition wherein substrate movement relative to the transfer arm is substantially free. The substrate handling apparatus further includes a sense mechanism (e.g., a vacuum sensor) constructed to determine whether a substrate is properly positioned on the support arm and to trigger the mode of operation of the clamping member between extended and retracted conditions. The sense mechanism also provides information relating to the operating condition of the clamping member.
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公开(公告)号:US07427337B2
公开(公告)日:2008-09-23
申请号:US10822424
申请日:2004-04-12
CPC分类号: B24B37/046 , B24B37/20 , C25F7/00 , H01L21/2885 , H01L21/32115 , H01L21/32125 , H01L21/67075 , H01L21/6715
摘要: An apparatus for electropolishing a conductive layer on a wafer using a solution is disclosed. The apparatus comprises an electrode assembly immersed in the solution configured proximate to the conductive layer having a longitudinal dimension extending to at least a periphery of the wafer, the electrode assembly including an elongated contact electrode configured to receive a potential difference, an isolator adjacent the elongated contact electrode, and an elongated process electrode adjacent the isolator configured to receive the potential difference, a voltage supply is configured to supply the potential difference between the contact electrode and the process electrode to electropolish the conductive layer on the wafer.
摘要翻译: 公开了一种使用溶液对晶片上的导电层进行电解抛光的装置。 该装置包括浸入在靠近导电层配置的溶液中的电极组件,其具有延伸至晶片的至少周边的纵向尺寸,电极组件包括构造成接收电位差的细长接触电极,邻近细长的隔离器 接触电极和邻近隔离器的细长工艺电极,其被配置为接收电位差,电压源被配置为提供接触电极和处理电极之间的电位差以对晶片上的导电层进行电解抛光。
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8.
公开(公告)号:US5957751A
公开(公告)日:1999-09-28
申请号:US862350
申请日:1997-05-23
申请人: Boris Govzman , Steven M. Zuniga , Hung Chen , Sasson Somekh
发明人: Boris Govzman , Steven M. Zuniga , Hung Chen , Sasson Somekh
IPC分类号: B24B37/005 , B24B37/30 , H01L21/304 , B24B49/00
CPC分类号: B24B37/30 , B24B37/0053
摘要: A carrier head for a chemical mechanical polishing system includes a substrate sensing mechanism. The carrier head includes a base and a flexible member connected to the base to define a chamber. A lower surface of the flexible member provides a substrate receiving surface. The substrate sensing mechanism includes a sensor to measure a pressure in the chamber and generate an output signal representative thereof, and a processor configured to indicate whether the substrate is attached to the substrate receiving surface in response to the output signal.
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公开(公告)号:US07059944B2
公开(公告)日:2006-06-13
申请号:US10369118
申请日:2003-02-18
申请人: Jalal Ashjaee , Boris Govzman , Bernard M. Frey , Boguslaw A. Nagorski , Douglas W. Young , Bulent M. Basol , Homayoun Talieh
发明人: Jalal Ashjaee , Boris Govzman , Bernard M. Frey , Boguslaw A. Nagorski , Douglas W. Young , Bulent M. Basol , Homayoun Talieh
IPC分类号: B24B1/00
CPC分类号: H01L21/67745 , B24B37/345 , G05B19/41865 , G05B2219/32272 , G05B2219/45031 , H01L21/67028 , H01L21/67034 , H01L21/67046 , H01L21/67051 , H01L21/67173 , H01L21/67219 , H01L21/68707 , H01L21/68728 , Y02P90/20
摘要: An integrated process tool for chemical mechanical processing, cleaning and drying a semiconductor workpiece is provided. The integrated process tool includes a CMP module and a cleaning and drying module. After being processed, the workpiece is transported from the CMP module to the cleaning and drying module using a movable housing. In the cleaning and drying module, a cleaning mechanism is used to clean the workpiece while the workpiece is rotated and held by a support stucture of the movable housing. A drying mechanism of the cleaning and drying module picks up the workpiece from the moveable housing and spin dries it. Throughout the CMP process, cleaning and drying, the processed surface of the wafer faces down.
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10.
公开(公告)号:US06244932B1
公开(公告)日:2001-06-12
申请号:US09369663
申请日:1999-08-05
申请人: Boris Govzman , Steven M. Zuniga , Hung Chen
发明人: Boris Govzman , Steven M. Zuniga , Hung Chen
IPC分类号: B24B4900
CPC分类号: B24B37/30 , B24B37/0053
摘要: A carrier head for a chemical mechanical polishing system includes a substrate sensing mechanism. The carrier head includes a base and a flexible member connected to the base to define a chamber. A lower surface of the flexible member provides a substrate receiving surface. The substrate sensing mechanism includes a sensor to measure a pressure in the chamber and generate an output signal representative thereof, and a processor configured to indicate whether the substrate is attached to the substrate receiving surface in response to the output signal.
摘要翻译: 用于化学机械抛光系统的载体头包括基底感测机构。 承载头包括基部和连接到基部以限定室的柔性构件。 柔性构件的下表面提供衬底接收表面。 衬底检测机构包括用于测量腔室中的压力并产生代表其的输出信号的传感器,以及被配置为响应于输出信号指示衬底是否附着到衬底接收表面的处理器。
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