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公开(公告)号：US20090241996A1
公开(公告)日：2009-10-01
申请号：US12345642
申请日：2008-12-29
申请人： Younes Achkire , Alexander N. Lerner , Boris I. Govzman , Boris Fishkin , Michael N. Sugarman , Rashid A. Mavliev , Haoquan Fang , Shijian Li , Guy E. Shirazi , Jianshe Tang
发明人： Younes Achkire , Alexander N. Lerner , Boris I. Govzman , Boris Fishkin , Michael N. Sugarman , Rashid A. Mavliev , Haoquan Fang , Shijian Li , Guy E. Shirazi , Jianshe Tang
IPC分类号： B08B3/00
CPC分类号： H01L21/67034 , B08B3/10 , H01L21/67751 , H01L21/681 , H01L21/68764 , Y10S414/139
摘要： In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line with a load port to a second orientation wherein the wafer is in line with an unload port; (2) a catcher adapted to contact and travel passively with a wafer as it is unloaded from the processing portion; (3) an enclosed output portion adapted to create a laminar air flow from one side thereof to the other; (4) an output portion having a plurality of wafer receivers; (5) submerged fluid nozzles; and/or (6) drying gas flow deflectors, etc. Other aspects include methods of wafer processing.
摘要翻译： 在第一方面，提供一种适于处理晶片的模块。 模块包括具有一个或多个特征的处理部分，例如（1）可旋转晶片支撑件，用于从第一取向旋转输入晶片，其中晶片与负载端口对准至第二取向，其中晶片与 卸货港 （2）捕捉器，其适于在从所述处理部分卸载时与晶片被动接触和行进; （3）适于产生从其一侧到另一侧的层流空气流的封闭输出部分; （4）具有多个晶片接收器的输出部分; （5）浸没式流体喷嘴; 和/或（6）干燥气体导流板等。其它方面包括晶片处理的方法。
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公开(公告)号：US07815787B2
公开(公告)日：2010-10-19
申请号：US12246834
申请日：2008-10-07
申请人： Hung Chih Chen , Rashid A. Mavliev
发明人： Hung Chih Chen , Rashid A. Mavliev
摘要： A method and apparatus for retaining electrolyte on a rotating platen using directional air flow is provided. In one embodiment, an apparatus for processing a substrate is provided. The apparatus includes a platen assembly having a surface for supporting a processing pad and disposed on a stationary base so that the platen assembly may rotate relative to the base; and an air knife coupled to the base and extended over a portion of the surface, the air knife operable to deliver a stream of air toward the pad to divert at least a portion of a fluid disposed on the pad toward a center of the pad.
摘要翻译： 提供了一种使用定向气流将电解质保持在旋转台板上的方法和装置。 在一个实施例中，提供了一种用于处理衬底的设备。 该装置包括压板组件，该压板组件具有用于支撑处理衬垫并设置在固定底座上的表面，使得压板组件可相对于底座旋转; 以及气刀，其联接到所述基座并且延伸到所述表面的一部分上，所述气刀可操作以将空气流输送到所述垫，以将设置在所述垫上的流体的至少一部分转向所述垫的中心。
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公开(公告)号：US07520968B2
公开(公告)日：2009-04-21
申请号：US11243488
申请日：2005-10-04
IPC分类号： C25B9/00
CPC分类号： B24B37/22 , B23H5/08 , B24B37/046 , B24B37/245 , H01L21/32125
摘要： An apparatus and method for manufacturing and refurbishing a conductive polishing pad assembly for performing an electrochemical process on a substrate is disclosed. The conductive polishing pad assembly is formed using a contact surface as a foundation that is coated with a metallic coating to create a conductive contact surface. In one embodiment, the metallic coating is a high purity tin/zinc alloy that is sprayed on the contact surface. The contact surface contains abrasive particles while the metallic coating provides at least conductive qualities to the contact surface.
摘要翻译： 公开了一种用于在基板上进行电化学处理的导电抛光垫组件的制造和翻新的装置和方法。 导电抛光垫组件使用接触表面作为基底形成，其被涂覆有金属涂层以产生导电接触表面。 在一个实施例中，金属涂层是喷涂在接触表面上的高纯度锡/锌合金。 接触表面含有磨料颗粒，同时金属涂层至少提供导电性质的接触表面。
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公开(公告)号：US20090032408A1
公开(公告)日：2009-02-05
申请号：US12246834
申请日：2008-10-07
申请人： Hung Chih Chen , Rashid A. Mavliev
发明人： Hung Chih Chen , Rashid A. Mavliev
摘要： A method and apparatus for retaining electrolyte on a rotating platen using directional air flow is provided. In one embodiment, an apparatus for processing a substrate is provided. The apparatus includes a platen assembly having a surface for supporting a processing pad and disposed on a stationary base so that the platen assembly may rotate relative to the base; and an air knife coupled to the base and extended over a portion of the surface, the air knife operable to deliver a stream of air toward the pad to divert at least a portion of a fluid disposed on the pad toward a center of the pad.
摘要翻译： 提供了一种使用定向气流将电解质保持在旋转台板上的方法和装置。 在一个实施例中，提供了一种用于处理衬底的设备。 该装置包括压板组件，该压板组件具有用于支撑处理衬垫并设置在固定底座上的表面，使得压板组件可相对于底座旋转; 以及气刀，其联接到所述基座并且延伸到所述表面的一部分上，所述气刀可操作以将空气流输送到所述垫，以将设置在所述垫上的流体的至少一部分转向所述垫的中心。
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5.发明授权Conductive pad with ion exchange membrane for electrochemical mechanical polishing 失效带离子交换膜的导电垫用于电化学机械抛光公开(公告)号：US07344432B2
公开(公告)日：2008-03-18
申请号：US11555145
申请日：2006-10-31
申请人： Liang-Yun Chen , Yuchun Wang , Yan Wang , Alain Duboust , Daniel A. Carl , Ralph Wadensweiler , Manoocher Birang , Paul D. Butterfield , Rashid A. Mavliev , Stan D. Tsai , You Wang , Jie Diao , Renhe Jia , Lakshmanan Karuppiah , Robert Ewald
发明人： Liang-Yun Chen , Yuchun Wang , Yan Wang , Alain Duboust , Daniel A. Carl , Ralph Wadensweiler , Manoocher Birang , Paul D. Butterfield , Rashid A. Mavliev , Stan D. Tsai , You Wang , Jie Diao , Renhe Jia , Lakshmanan Karuppiah , Robert Ewald
CPC分类号： B24B37/046 , B24B27/0023 , B24B37/24 , B24B37/26 , B24D3/34 , B82Y30/00
摘要： An article of manufacture and apparatus are provided for processing a substrate surface. In one aspect, an article of manufacture is provided for polishing a substrate including polishing article comprising a body having at least a partially conductive polishing surface. An electrode is disposed below the polishing surface having a dielectric material therebetween. A plurality of apertures may be formed in the polishing surface and the dielectric material to at least partially expose the electrode to the polishing surface. A membrane may be disposed between the electrode and the polishing surface that is permeable to ions and current to promote continuity between the electrode and the polishing surface.
摘要翻译： 提供了一种用于处理基板表面的制造和设备。 在一个方面，提供了一种用于抛光衬底的制品，所述衬底包括具有至少部分导电的抛光表面的主体的抛光制品。 电极设置在其间具有介电材料的抛光表面下方。 可以在抛光表面和电介质材料中形成多个孔，以至少部分地将电极暴露于抛光表面。 可以在电极和抛光表面之间设置膜，其可透过离子和电流，以促进电极和抛光表面之间的连续性。
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公开(公告)号：US20070298692A1
公开(公告)日：2007-12-27
申请号：US11475639
申请日：2006-06-27
申请人： Rashid A. Mavliev , Hung Chih Chen
发明人： Rashid A. Mavliev , Hung Chih Chen
IPC分类号： B24B1/00
CPC分类号： B24B53/017
摘要： A method for cleaning a polishing pad is disclosed. In CMP and ECMP, a polishing pad must be conditioned to obtain good and predictable polishing results. During conditioning, debris is generated that must be removed to prevent processing defects. An effective method to clean a polishing pad is disclosed herein. In one embodiment, a washing fluid is directed at the pad to clean debris from the while a second fluid is utilized to remove the washing fluid. In another embodiment, the washing fluid is provided by a high pressure water jet while the second fluid is provided by an air knife.
摘要翻译： 公开了一种清洁抛光垫的方法。 在CMP和ECMP中，必须调整抛光垫以获得良好且可预测的抛光结果。 在调理期间，产生必须清除的碎屑，以防止加工缺陷。 本文公开了一种清洁抛光垫的有效方法。 在一个实施例中，洗涤流体被引导到垫处以清洁碎屑，同时使用第二流体来移除洗涤流体。 在另一个实施例中，洗涤流体由高压水射流提供，而第二流体由气刀提供。
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7.发明申请公开(公告)号：US20070218587A1
公开(公告)日：2007-09-20
申请号：US11683197
申请日：2007-03-07
申请人： Yuchun Wang , Yuan A. Tian , Yongqi Hu , Rashid A. Mavliev , Robert A. Ewald
发明人： Yuchun Wang , Yuan A. Tian , Yongqi Hu , Rashid A. Mavliev , Robert A. Ewald
IPC分类号： H01L21/00
CPC分类号： H01L21/68735 , B23H5/08 , C25F7/00 , H01L21/67046 , H01L21/6708
摘要： Embodiments of the invention generally provide a conductive processing pad and a method for fabricating the same. In one embodiment the conductive processing pad includes a grid of conductive material disposed in a polymer layer. A plurality of perforations is formed through the polymer in the open area defined by the grid such that the side walls of the perforations do not expose the conductive grid. In another embodiment, a method for forming a conductive pad is provided. In one embodiment, the method includes the steps of pressing a conductive grid into a polymer sheet at a temperature greater than the polymer's last transition temperature but lower than the melting point of the material comprising the conductive grid and perforating the polymer sheet through the open area defined by the grid without exposing the conductive grid.
摘要翻译： 本发明的实施例通常提供导电加工垫及其制造方法。 在一个实施例中，导电处理垫包括布置在聚合物层中的导电材料格栅。 在由栅格限定的开放区域中通过聚合物形成多个穿孔，使得穿孔的侧壁不暴露导电栅格。 在另一个实施例中，提供了形成导电焊盘的方法。 在一个实施方案中，该方法包括以下步骤：在高于聚合物的最后转变温度但低于包含导电栅格的材料的熔点并且通过开放区域穿孔聚合物片材的温度下将导电栅格压入聚合物片材 由栅格定义而不暴露导电栅格。
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公开(公告)号：US07407433B2
公开(公告)日：2008-08-05
申请号：US11556114
申请日：2006-11-02
IPC分类号： B24B49/00
摘要： Tools and methods for in-situ characterizing of a surface of a polishing pad are described. A characterization tool is integrated with polishing tool so that the polishing pad can be monitored in-situ. The characterization tool and the polishing pad can be rotated or moved so that any portion of the polishing pad can be tested.
摘要翻译： 描述了用于原位表征抛光垫表面的工具和方法。 表征工具与抛光工具集成在一起，从而可以原位监测抛光垫。 表征工具和抛光垫可以旋转或移动，以便可以对抛光垫的任何部分进行测试。
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公开(公告)号：US20070295610A1
公开(公告)日：2007-12-27
申请号：US11475637
申请日：2006-06-27
申请人： Hung Chih Chen , Rashid A. Mavliev
发明人： Hung Chih Chen , Rashid A. Mavliev
IPC分类号： B23H5/08
摘要： A method and apparatus for retaining electrolyte on a rotating platen using directional air flow is provided. In one embodiment, an apparatus for processing a substrate is provided. The apparatus includes a platen assembly having a surface for supporting a processing pad and disposed on a stationary base so that the platen assembly may rotate relative to the base; and an air knife coupled to the base and extended over a portion of the surface, the air knife operable to deliver a stream of air toward the pad to divert at least a portion of a fluid disposed on the pad toward a center of the pad.
摘要翻译： 提供了一种使用定向气流将电解质保持在旋转台板上的方法和装置。 在一个实施例中，提供了一种用于处理衬底的设备。 该装置包括压板组件，该压板组件具有用于支撑处理衬垫并设置在固定底座上的表面，使得压板组件可相对于底座旋转; 以及气刀，其联接到所述基座并且延伸到所述表面的一部分上，所述气刀可操作以将空气流输送到所述垫，以将设置在所述垫上的流体的至少一部分转向所述垫的中心。
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公开(公告)号：US5903338A
公开(公告)日：1999-05-11
申请号：US022104
申请日：1998-02-11
CPC分类号： G01N15/065
摘要： A modified mixing-type condensation nuclei counter for measuring the size and number of small particles is presented. A gas stream is saturated with respect to a working fluid. The saturated gas at a first temperature is mixed in a growth chamber with a sample gas at a second temperature that is lower than the first temperature. The mixture of the saturated gas and the sample gas at different temperatures results in supersaturation of the mixed gas with respect to the working fluid. Particles in the sample gas act as nucleation sites for condensation of the working fluid. The particles are thus grown to a larger size and therefore are more easily measured by known light-scattering particle detection methods. The efficiency of the supersaturation process is made even more efficient by cooling the growth chamber to a third temperature which is lower than the second temperature or by turbulently mixing the saturated gas and the sample gas. False count rate is reduced by filtering the saturated gas before it is mixed with the sample gas to remove droplets of the working fluid from the saturated gas.
摘要翻译： 提出了一种用于测量小颗粒尺寸和数量的改进的混合型冷凝核计数器。 气流相对于工作流体饱和。 在第一温度下的饱和气体在生长室中与样品气体在低于第一温度的第二温度下混合。 在不同温度下，饱和气体和样品气体的混合物导致混合气体相对于工作流体过饱和。 样品气体中的颗粒充当工作流体冷凝的成核位置。 因此，颗粒生长到更大的尺寸，因此通过已知的光散射粒子检测方法更容易测量。 通过将生长室冷却至低于第二温度的第三温度或通过将饱和气体和样品气体混合混合，使过饱和过程的效率更高效。 通过在饱和气体与样品气体混合之前过滤饱和气体以从饱和气体中除去工作流体的液滴来减少假计数率。
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