摘要:
A novel method of making articles that comprise a periodic heteroepitaxial semiconductor structure is disclosed. The method pertains to growth of the periodic structure by MBE, CVD or similar growth techniques, and involves periodically changing the substrate temperature. For instance, a periodic multilayer GaAs/AlGaAs is grown by MBE, with the substrate temperature cycled between 600.degree. C. and 700.degree. C. The novel method can produce multilayer structures of uniformly high material quality.
摘要:
Disclosed is an edge-emitting semiconductor laser that has a single waveguiding structure, and that comprises means for reducing the transverse divergence of the far-field pattern of the laser emission. Typically these means comprise reflecting means (preferably transverse distributed Bragg reflectors) disposed parallel to the junction plane of the laser. Lasers according to the invention can have a highly stable single mode output having a substantially symmetrical far field pattern. Disclosed is also an advantageous method of making ridge-waveguide lasers that can, inter alia, be used to make lasers according to the invention. The method is a self-aligned method that does not comprise any critical alignment steps. Thus it is useful for making lasers that have a very narrow ridge waveguide. Such lasers are desirable because they can suppress lateral higher order modes.
摘要:
Disclosed is an advantageous method of making ridge-waveguide lasers. The method is a self-aligned method that does not comprise any critical alignment steps. Thus it is useful for making lasers that have a very narrow ridge waveguide. Such lasers are desirable because they can suppress lateral higher order modes.
摘要:
Disclosed are a method of making GaAs-based enhancement-type MOS-FETs, and articles (e.g., GaAs-based ICs) that comprise such a MOS-FET. The MOS-FETs are planar devices, without etched recess or epitaxial re-growth, with gate oxide that is primarily Ga2O3, and with low midgap interface state density (e.g., at most 1×1011 cm−2 eV−1 at 20° C.). The method involves ion implantation, implant activation in an As-containing atmosphere, surface reconstruction, and in situ deposition of the gate oxide. In preferred embodiments, no processing step subsequent to gate oxide formation is carried out above 300° C. in air, or above about 700° C. in UHV. The method makes possible fabrication of planar enhancement-type MOS-FETs having excellent characteristics, and also makes possible fabrication of complementary MOS-FETs, as well as ICs comprising MOS-FETs and MES-FETs. The method includes deposition of gate oxide of overall composition GaxAyOz, where Ga substantially is in the 3+ oxidation state, A is one or more electropositive stabilizer element adapted for stabilizing Ga in the 3+ oxidation state, x is greater than or equal to zero, z is selected to satisfy the requirement that both Ga and A are substantially fully oxidized, and y/(x+y) is greater than 0.1.
摘要翻译:公开了制造基于GaAs的增强型MOS-FET的方法以及包括这种MOS-FET的制品(例如,基于GaAs的IC)。 MOS-FET是没有蚀刻凹槽或外延再生长的平面器件,其栅极氧化物主要是Ga 2 O 3,并且具有低的中间隙界面态密度(例如,在20℃下至多为1×10 11 cm -2 eV-1) 。 该方法涉及离子注入,在含As气氛中的注入活化,表面重构和栅极氧化物的原位沉积。 在优选的实施方案中,栅极氧化物形成之后的处理步骤在高于300℃的空气中或在高于约700℃的UHV中进行。 该方法可以制造具有优异特性的平面增强型MOS-FET,并且还可以制造互补MOS-FET以及包括MOS-FET和MES-FET的IC。 该方法包括沉积总体组成为GaxAyOz的栅极氧化物,其中Ga基本上处于3+氧化态,A是一种或多种适用于稳定3+氧化态的Ga的正电荷稳定剂元素,x大于或等于零 选择z以满足Ga和A基本上完全氧化,y /(x + y)大于0.1的要求。
摘要:
A GaAs-based self-aligned laser with emission wavelength in the approximate wavelength regime 0.87-1.1 .mu.m is disclosed. The laser is a strained layer QW laser and is readily manufacturable. Preferred embodiments of the inventive laser do not comprise Al-containing semiconductor alloy. Lasers according to the invention can for instance be used advantageously as 0.98 .mu.m pump sources for Er-doped fiber amplifiers.
摘要:
Disclosed is apparatus that comprises integrated colliding pulse mode-locked means for generating ultrashort optical pulses. The means advantageously are capable of producing transform-limited (or nearly transform-limited) pulses. Several exemplary embodiments are disclosed. Exemplarily the invention is embodied in InP-based integrated means that produced 1.4 ps pulses at a 32.6 GHz repetition rate.
摘要:
An apparatus includes a dielectric slab having first and opposing second major surfaces. A planar antenna element is located on the first major surface. A via formed through the dielectric slab is conductively connected to the antenna element. A plurality of solder bump pads is located on the second major surface and is configured to attach the dielectric slab to an integrated circuit.
摘要:
An optical path is configured to propagate an input optical signal. A plurality of electrodes are configured to produce a plurality of discrete phase shifts on the optical signal. An output optical signal is phase-shifted with respect to the input optical signal by a sum of the plurality of discrete phase shifts.
摘要:
An approach is provided that uses diversity to compensate fading of free-space optical (FSO) signals propagating through an environment characterized by atmospheric scintillation. One embodiment involves collecting at least one FSO beam, demultiplexing the beam by wavelength into at least two sub-beams, detecting each sub-beam to produce an electrical output therefrom, and recovering a signal using complementary information from at least two of the electrical outputs. Another embodiment involves collecting the FSO beam onto an array of spatially separated sub-apertures, detecting the light entering each sub-aperture to produce an electrical output therefrom, and recovering a signal using complementary information from at least two of the electrical outputs. This second embodiment enables both electronic adaptive processing to coherently integrate across the sub-apertures and in the case of multiple transmit apertures a free space optical Multiple Input Multiple Output (MIMO) system.