Salt suitable for an acid generator and a chemically amplified resist composition containing the same
    1.
    发明授权
    Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
    适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物

    公开(公告)号:US07301047B2

    公开(公告)日:2007-11-27

    申请号:US11586640

    申请日:2006-10-26

    IPC分类号: C07C69/00

    摘要: The present invention provides a salt of the formula (I): wherein ring X represents monocyclic or bicyclic hydrocarbon group having 3 to 30 carbon atoms, and one or more hydrogen atom in the ring X is optionally substituted with alkyl group having 1 to 6 carbon atoms, alkenyl group having 2 to 6 carbon atoms, alkoxy group having 2 to 6 carbon atoms or perfluoroalkyl group having 1 to 4 carbon atoms; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+ represents organic counter ion; and n shows an integer of 1 to 12. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

    摘要翻译: 本发明提供式(I)的盐:其中环X表示具有3-30个碳原子的单环或双环烃基,并且环X中的一个或多个氢原子任选被具有1至6个碳原子的烷基取代 碳原子数2〜6的烯基,碳原子数2〜6的烷氧基或碳原子数1〜4的全氟烷基; Q 1和Q 2各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; A + 代表有机抗衡离子; 并且n表示1至12的整数。本发明还提供包含式(I)的盐的化学放大抗蚀剂组合物。

    Salt suitable for an acid generator and a chemically amplified resist composition containing the same
    2.
    发明申请
    Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
    适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物

    公开(公告)号:US20070122750A1

    公开(公告)日:2007-05-31

    申请号:US11600884

    申请日:2006-11-17

    IPC分类号: G03C5/00 C07C309/12

    摘要: The present invention provides a salt of the formula (I): wherein ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, and one or more hydrogen atom in the monocyclic or polycyclic hydrocarbon group is optionally substituted with alkyl group having 1 to 10 carbon atom, alkoxy group having 1 to 10 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 10 carbon atoms or cyano group; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A+ represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

    摘要翻译: 本发明提供式(I)的盐:其中环X表示碳原子数为3〜30的单环或多环烃基,单环或多环烃基中的一个或多个氢原子任选被具有1个 10个碳原子,碳原子数1〜10的烷氧基,碳原子数1〜4的全氟烷基,碳原子数1〜10的羟基烷基或氰基。 Q 1和Q 2各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; 而A +表示有机抗衡离子。 本发明还提供了包含式(I)的盐的化学放大抗蚀剂组合物。

    Salt suitable for an acid generator and a chemically amplified resist composition containing the same
    3.
    发明申请
    Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
    适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物

    公开(公告)号:US20070027336A1

    公开(公告)日:2007-02-01

    申请号:US11390319

    申请日:2006-03-28

    IPC分类号: C07C309/51

    CPC分类号: C07C309/17 C07C2603/74

    摘要: The present invention provides a salt of the formula (L) A salt of the formula (L): wherein Q represents —CO— group or —C(OH)— group; ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms in which a hydrogen atom is substituted with a hydroxyl group at Q position when Q is —C(OH)— group or in which two hydrogen atoms are substituted with ≡O group at Q position when Q is —CO— group, and at least one hydrogen atom in the monocylic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; R10 and R20 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A+ represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (L).

    摘要翻译: 本发明提供式(L)的盐式(L)的盐:其中Q表示-CO-基或-C(OH) - 基; 环X表示当Q为-C(OH) - 基团或其中两个氢原子被≡O基团取代时,其中氢原子被Q位羟基取代的具有3-30个碳原子的单环或多环烃基 在Q为-CO-基的Q位置,单环或多环烃基中的至少一个氢原子可以任选被具有1至6个碳原子的烷基,具有1至6个碳原子的烷氧基,具有1至6个碳原子的烷氧基, 1至4个碳原子,具有1至6个碳原子的羟基烷基,羟基或氰基; R 10和R 20各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; 而A +表示有机抗衡离子。 本发明还提供了包含式(L)的盐的化学放大抗蚀剂组合物。

    Salt suitable for an acid generator and a chemically amplified resist composition containing the same
    4.
    发明授权
    Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
    适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物

    公开(公告)号:US08124803B2

    公开(公告)日:2012-02-28

    申请号:US11390319

    申请日:2006-03-28

    IPC分类号: C07C309/19

    CPC分类号: C07C309/17 C07C2603/74

    摘要: The present invention provides a salt of the formula (L)A salt of the formula (L): wherein Q represents —CO— group or —C(OH)— group; ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms in which a hydrogen atom is substituted with a hydroxyl group at Q position when Q is —C(OH)— group or in which two hydrogen atoms are substituted with ═O group at Q position when Q is —CO— group, and at least one hydrogen atom in the monocylic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; R10 and R20 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A+ represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (L).

    摘要翻译: 本发明提供式(L)的盐式(L)的盐:其中Q表示-CO-基或-C(OH) - 基; 环X表示具有3〜30个碳原子的单环或多环烃基,其中当Q为-C(OH) - 基时,其中氢原子被Q位上的羟基取代,或其中两个氢原子被取代为= 在Q为-CO-基的Q位置,单环或多环烃基中的至少一个氢原子可以任选被具有1至6个碳原子的烷基,具有1至6个碳原子的烷氧基,具有1至6个碳原子的烷氧基, 1至4个碳原子,具有1至6个碳原子的羟基烷基,羟基或氰基; R 10和R 20各自独立地表示氟原子或具有1〜6个碳原子的全氟烷基; 而A +代表有机抗衡离子。 本发明还提供了包含式(L)的盐的化学放大抗蚀剂组合物。

    Salt suitable for an acid generator and a chemically amplified resist composition containing the same
    5.
    发明授权
    Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
    适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物

    公开(公告)号:US07527910B2

    公开(公告)日:2009-05-05

    申请号:US11644955

    申请日:2006-12-26

    IPC分类号: G03F7/004 C07C69/00

    摘要: The present invention provides a salt of the formula (I): wherein X represents alkylene group or substituted alkylene group; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+ represents organic counter ion; and n shows 0 or 1. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I), and a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

    摘要翻译: 本发明提供式(I)的盐:其中X表示亚烷基或取代的亚烷基; Q1和Q2各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; A +代表有机抗衡离子; 本发明还提供一种包含式(I)的盐的化学放大型抗蚀剂组合物和含有具有酸不稳定基团并且本身不溶或难溶的结构单元的树脂 碱性水溶液,但是通过酸的作用变得可溶于碱性水溶液。

    Salt suitable for an acid generator and a chemically amplified resist composition containing the same
    7.
    发明授权
    Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
    适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物

    公开(公告)号:US07786322B2

    公开(公告)日:2010-08-31

    申请号:US11600884

    申请日:2006-11-17

    IPC分类号: C07C315/00

    摘要: The present invention provides a salt of the formula (I): wherein ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, and one or more hydrogen atom in the monocyclic or polycyclic hydrocarbon group is optionally substituted with alkyl group having 1 to 10 carbon atom, alkoxy group having 1 to 10 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 10 carbon atoms or cyano group; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A+ represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

    摘要翻译: 本发明提供式(I)的盐:其中环X表示碳原子数为3〜30的单环或多环烃基,单环或多环烃基中的一个或多个氢原子任选被具有1个 10个碳原子,碳原子数1〜10的烷氧基,碳原子数1〜4的全氟烷基,碳原子数1〜10的羟基烷基或氰基。 Q1和Q2各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; 而A +代表有机抗衡离子。 本发明还提供了包含式(I)的盐的化学放大抗蚀剂组合物。

    Salt suitable for an acid generator and a chemically amplified resist composition containing the same
    9.
    发明授权
    Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
    适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物

    公开(公告)号:US07531686B2

    公开(公告)日:2009-05-12

    申请号:US11586638

    申请日:2006-10-26

    IPC分类号: C07C69/74 C07C303/00 G03C1/00

    摘要: The present invention provides a salt of the formula (I): wherein ring X represents polycyclic hydrocarbon group having tricycle or more and having 10 to 30 carbon atoms, and one or more hydrogen atom in the ring X is optionally substituted with alkyl group having 1 to 6 carbon atoms, alkoxy group having 1 to 6 carbon atoms, perfluoroalkyl group having 1 to 4 carbon atoms or cyano group; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; n shows an integer of 1 to 12; and A+ represents a cation selected from the group consist of a cation of the following formulae (IIa), (IIb) and (IIc): The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

    摘要翻译: 本发明提供式(I)的盐:其中环X表示具有三环或更多且具有10至30个碳原子的多环烃基,并且环X中的一个或多个氢原子任选被具有1个 至6个碳原子,具有1至6个碳原子的烷氧基,具有1至4个碳原子的全氟烷基或氰基; Q1和Q2各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; n表示1〜12的整数, 并且A +表示选自下式(IIa),(IIb)和(IIc)的阳离子的阳离子:本发明还提供包含式(I)的盐的化学放大抗蚀剂组合物。

    Salt suitable for an acid generator and a chemically amplified resist composition containing the same
    10.
    发明申请
    Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
    适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物

    公开(公告)号:US20070184382A1

    公开(公告)日:2007-08-09

    申请号:US11644955

    申请日:2006-12-26

    IPC分类号: G03C1/00

    摘要: The present invention provides a salt of the formula (I): wherein X represents alkylene group or substituted alkylene group; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+ represents organic counter ion; and n shows 0 or 1. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I), and a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

    摘要翻译: 本发明提供式(I)的盐:其中X表示亚烷基或取代的亚烷基; Q 1和Q 2各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; A + 代表有机抗衡离子; 本发明还提供一种包含式(I)的盐的化学放大型抗蚀剂组合物和含有具有酸不稳定基团并且本身不溶或难溶的结构单元的树脂 碱性水溶液,但是通过酸的作用变得可溶于碱性水溶液。