摘要:
An ESD protection circuit installed among a plurality of reference nodes includes a clamping device coupled between two reference nodes among the plurality of reference nodes; a stack-coupling device coupled between the clamping device and one of the reference nodes; and at least a resistive device coupled between the stack-coupling device and another one of the reference nodes.
摘要:
A cascaded diode structure with a deep N-well for effectively reducing the leakage current of the P-type substrate by floating the base of a parasitic transistor in the cascaded diode structure. The cascaded diode structure includes a P-type substrate, a deep N-well formed on the P-type substrate, a plurality of elemental diodes formed on the deep N-well, and a plurality of connecting parts for cascading the elemental diodes. Each elemental diode includes a P-well formed on the deep N-well, a heavily doped P-type region formed on the P-well, and a heavily doped N-type region formed on the P-well.
摘要:
A cascaded diode structure with a deep N-well for effectively reducing the leakage current of the P-type substrate by floating the base of a parasitic transistor in the cascaded diode structure. The cascaded diode structure includes a P-type substrate, a deep N-well formed on the P-type substrate, a plurality of elemental diodes formed on the deep N-well, and a plurality of connecting parts for cascading the elemental diodes. Each elemental diode includes a P-well formed on the deep N-well, a heavily doped P-type region formed on the P-well, and a heavily doped N-type region formed on the P-well.
摘要:
An ESD clamp circuit includes an ESD detecting unit and a discharge circuit with a longitudinal BJT. The longitudinal BJT is formed on a P-type substrate and includes a deep N-well formed on the P-type substrate, a P-well formed on parts of the deep N-well, a N-well formed on the deep N-well surrounding the P-well, a first N+ region formed on parts of the P-well and electrically coupled to a first voltage, a P+ region formed on the P-well surrounding the first N+ region and electrically coupled to a trigger signal, and a second N+ region formed on the N-well and electrically coupled to a second voltage. In the structure of the longitudinal BJT, the leakage current can be decreased, the current gain can be increased, and the dimension of the ESD clamp circuit can be reduced.
摘要:
An ESD protection circuit for hybrid voltage sources includes a first bipolar transistor set and a second bipolar transistor set, a first detection circuit, and a second detection circuit. The ON/OFF states of the first bipolar transistor set and the second bipolar transistor set are determined by the first and the second detection circuit, and the ON/OFF states function to isolate terminals of the different voltage sources and discharge electrostatic charges injected into one of the terminals.
摘要:
An ESD protection circuit for hybrid voltage sources includes a first bipolar transistor set and a second bipolar transistor set, a first detection circuit, and a second detection circuit. The ON/OFF states of the first bipolar transistor set and the second bipolar transistor set are determined by the first and the second detection circuit, and the ON/OFF states function to isolate terminals of the different voltage sources and discharge electrostatic charges injected into one of the terminals.
摘要:
A variable inductor includes an inductor element and a first inductance adjusting circuit. The first inductance adjusting circuit includes a first open-loop structure and a first switch element. The first switch element is coupled to the first open-loop structure. When the first switch element is in a conducting state, the first open-loop structure and the first switch element forms a first closed-loop to induce a first magnetic flux which alters a magnetic flux from the inductor element in operation.
摘要:
A stacked structure of a spiral inductor includes a first metal layer, a second metal layer, a first set of vias, and a second set of vias. The first metal layer includes a first segment, a second segment, and a third segment, wherein the layout direction of the third segment is different from the layout direction of the first and second segments. The second metal layer includes a fourth segment, a fifth segment, and a sixth segment connected to the fifth segment, wherein the layout direction of the sixth segment is different from the layout direction of the fourth and fifth segments. The first set of vias connects the first and fourth segments, and they construct a first shunt winding. The second set of vias connects the second and fifth segments, and they construct a second shunt winding. The third and sixth segments construct a crossover region.
摘要:
An integrated inductor formed on a substrate comprises a metal layer pattern, a via layer pattern overlapping and electrically connected to the metal layer, and a redistribution layer pattern overlapping and electrically connected to the via layer. The metal layer pattern, the via layer pattern, and the redistribution layer pattern are a coil pattern.
摘要:
The structure of the MOS transistor provided in this invention has LDD (lightly doped drain) and halo doped regions removed from the source, the drain or both regions in the substrate for improved linearity range when operated as a voltage-controlled resistor. The removal of the LDD and halo doped regions is performed by simply modifying the standard mask of the MOS process using a logic operation layer with no extra mask required.