公开(公告)号：US20090117313A1

公开(公告)日：2009-05-07

申请号：US12342507

申请日：2008-12-23

申请人： Yuuki TAUCHI ,  Katsutoshi Takagi ,  Junichi Nakai ,  Toshiki Sato

发明人： Yuuki TAUCHI ,  Katsutoshi Takagi ,  Junichi Nakai ,  Toshiki Sato

IPC分类号： B32B3/02

CPC分类号： C22C5/06 ,  C22C1/002 ,  C22C5/08 ,  C23C14/024 ,  C23C14/185 ,  C23C14/205 ,  C23C14/3414 ,  C23C14/584 ,  G02B5/0808 ,  G11B7/252 ,  G11B7/2531 ,  G11B7/257 ,  G11B7/258 ,  G11B7/259 ,  G11B7/266 ,  Y10T428/10 ,  Y10T428/1059 ,  Y10T428/1095 ,  Y10T428/12 ,  Y10T428/12431 ,  Y10T428/12896 ,  Y10T428/12924 ,  Y10T428/21 ,  Y10T428/265 ,  Y10T428/31678

摘要： The present invention relates to an Ag alloy film. Particularly, it is preferably used as a reflective film or semi-transmissive reflective film for an optical information recording medium having high thermal conductivity/high reflectance/high durability in the field of optical information recording media, an electromagnetic-shielding film excellent in Ag aggregation resistance, and an optical reflective film on the back of a reflection type liquid crystal display device, or the like. The Ag alloy film of the present invention comprises an Ag base alloy containing Bi and/or Sb in a total amount of to 10% (in terms of at %). Further, the present invention relates to a sputtering target used for the deposition of such an Ag alloy film.

摘要翻译： 本发明涉及一种Ag合金膜。 特别优选用作在光信息记录介质领域中具有高导热性/高反射率/高耐久性的光学信息记录介质的反射膜或半透射反射膜，Ag聚集性优异的电磁屏蔽膜 电阻，反射型液晶显示装置背面的光反射膜等。 本发明的Ag合金膜包含总量为10％（以％计）的Bi和/或Sb的Ag基合金。 此外，本发明涉及用于沉积这种Ag合金膜的溅射靶。

公开(公告)号：US07514037B2

公开(公告)日：2009-04-07

申请号：US10633550

申请日：2003-08-05

申请人： Yuuki Tauchi ,  Katsutoshi Takagi ,  Junichi Nakai ,  Toshiki Sato

发明人： Yuuki Tauchi ,  Katsutoshi Takagi ,  Junichi Nakai ,  Toshiki Sato

IPC分类号： C22C5/06

CPC分类号： C22C5/06 ,  C22C1/002 ,  C22C5/08 ,  C23C14/024 ,  C23C14/185 ,  C23C14/205 ,  C23C14/3414 ,  C23C14/584 ,  G02B5/0808 ,  G11B7/252 ,  G11B7/2531 ,  G11B7/257 ,  G11B7/258 ,  G11B7/259 ,  G11B7/266 ,  Y10T428/10 ,  Y10T428/1059 ,  Y10T428/1095 ,  Y10T428/12 ,  Y10T428/12431 ,  Y10T428/12896 ,  Y10T428/12924 ,  Y10T428/21 ,  Y10T428/265 ,  Y10T428/31678

摘要： The present invention relates to an Ag alloy film. Particularly, it is preferably used as a reflective film or semi-transmissive reflective film for an optical information recording medium having high thermal conductivity/high reflectance/high durability in the field of optical information recording media, an electromagnetic-shielding film excellent in Ag aggregation resistance, and an optical reflective film on the back of a reflection type liquid crystal display device, or the like. The Ag alloy film of the present invention comprises an Ag base alloy containing Bi and/or Sb in a total amount of 0.005 to 10% (in terms of at %). Further, the present invention relates to a sputtering target used for the deposition of such an Ag alloy film.

摘要翻译： 本发明涉及一种Ag合金膜。 特别优选用作在光信息记录介质领域中具有高导热性/高反射率/高耐久性的光学信息记录介质的反射膜或半透射反射膜，Ag聚集性优异的电磁屏蔽膜 电阻，反射型液晶显示装置背面的光反射膜等。 本发明的Ag合金膜包含总量为0.005〜10％（以％计）的Bi和/或Sb的Ag基合金。 此外，本发明涉及用于沉积这种Ag合金膜的溅射靶。

公开(公告)号：US07419711B2

公开(公告)日：2008-09-02

申请号：US11313815

申请日：2005-12-22

申请人： Yuuki Tauchi ,  Katsutoshi Takagi ,  Junichi Nakai ,  Toshiki Sato

发明人： Yuuki Tauchi ,  Katsutoshi Takagi ,  Junichi Nakai ,  Toshiki Sato

IPC分类号： B32B3/02

CPC分类号： C22C5/06 ,  C22C1/002 ,  C22C5/08 ,  C23C14/024 ,  C23C14/185 ,  C23C14/205 ,  C23C14/3414 ,  C23C14/584 ,  G02B5/0808 ,  G11B7/252 ,  G11B7/2531 ,  G11B7/257 ,  G11B7/258 ,  G11B7/259 ,  G11B7/266 ,  Y10T428/10 ,  Y10T428/1059 ,  Y10T428/1095 ,  Y10T428/12 ,  Y10T428/12431 ,  Y10T428/12896 ,  Y10T428/12924 ,  Y10T428/21 ,  Y10T428/265 ,  Y10T428/31678

摘要： The present invention relates to an Ag alloy film. Particularly, it is preferably used as a reflective film or semi-transmissive reflective film for an optical information recording medium having high thermal conductivity/high reflectance/high durability in the field of optical information recording media, an electromagnetic-shielding film excellent in Ag aggregation resistance, and an optical reflective film on the back of a reflection type liquid crystal display device, or the like. The Ag alloy film of the present invention comprises an Ag base alloy containing Bi and/or Sb in a total amount of 0.005 to 10% (in terms of at %). Further, the present invention relates to a sputtering target used for the deposition of such an Ag alloy film.

摘要翻译： 本发明涉及一种Ag合金膜。 特别优选用作在光信息记录介质领域中具有高导热性/高反射率/高耐久性的光学信息记录介质的反射膜或半透射反射膜，Ag聚集性优异的电磁屏蔽膜 电阻，反射型液晶显示装置背面的光反射膜等。 本发明的Ag合金膜包含总量为0.005〜10％（以％计）的Bi和/或Sb的Ag基合金。 此外，本发明涉及用于沉积这种Ag合金膜的溅射靶。

公开(公告)号：US07203003B2

公开(公告)日：2007-04-10

申请号：US10870996

申请日：2004-06-21

申请人： Junichi Nakai ,  Toshiki Sato ,  Katsutoshi Takagi ,  Yuuki Tauchi

发明人： Junichi Nakai ,  Toshiki Sato ,  Katsutoshi Takagi ,  Yuuki Tauchi

IPC分类号： G02B1/10

CPC分类号： G02B5/0858 ,  B60R1/08 ,  G02B5/08 ,  Y10S359/90

摘要： A reflective Ag alloy film includes a Ag—Bi alloy thin film, and a Bi layer and/or a Bi oxide layer formed on the surface and/or between the Ag—Bi alloy thin film and another layer formed on the Ag—Bi alloy thin film. The thickness of the Bi layer and/or the Bi oxide layer is 2.0 nm or below. The Ag—Bi alloy thin film of the reflective Ag alloy film has a Bi content in the range of 0.01 to 3.0 at %. A reflector is formed by depositing the Ag—Bi alloy thin film on a base member.

摘要翻译： 反应性Ag合金膜包括Ag-Bi合金薄膜，在Ag-Bi合金薄膜和形成在Ag-Bi合金上的另一层之间的表面上和/或之间形成的Bi层和/或Bi氧化物层 薄膜。 Bi层和/或Bi氧化物层的厚度为2.0nm以下。 反应性Ag合金膜的Ag-Bi合金薄膜的Bi含量为0.01〜3.0原子％。 通过将Ag-Bi合金薄膜沉积在基底构件上形成反射体。

公开(公告)号：US07452604B2

公开(公告)日：2008-11-18

申请号：US10871493

申请日：2004-06-21

申请人： Katsutoshi Takagi ,  Toshiki Sato ,  Junichi Nakai ,  Yuuki Tauchi

发明人： Katsutoshi Takagi ,  Toshiki Sato ,  Junichi Nakai ,  Yuuki Tauchi

IPC分类号： B32B9/00

CPC分类号： C23C14/024 ,  C23C14/185 ,  C23C14/3414 ,  C23C14/541 ,  G02B5/08 ,  Y10T428/12472 ,  Y10T428/12993

摘要： A reflective Ag alloy film for reflectors, which has excellent surface flatness and shows high reflectivity even under a heating environment and a reflector.The reflective Ag alloy film for reflectors has an average surface roughness of 2.0 nm or less and contains a rare earth element (such as Nd) in a content in the range of 0.1 to 3.0 at %, or further at least one selected from Au, Pd, Cu and Pt in a content in the range of 0.5 to 5.0 at %. The reflector comprises the above reflective Ag alloy film formed on a substrate.

摘要翻译： 用于反射器的反射型Ag合金膜，即使在加热环境下也具有优异的表面平坦度并显示高反射率和反射器。 反射器用反射型Ag合金膜的平均表面粗糙度为2.0nm以下，含有0.1〜3.0原子％的含量的稀土类元素（Nd），还含有选自Au， Pd，Cu和Pt的含量范围为0.5-5.0at％。 反射器包括形成在基板上的上述反射Ag合金膜。

公开(公告)号：US20060104853A1

公开(公告)日：2006-05-18

申请号：US11313815

申请日：2005-12-22

申请人： Yuuki Tauchi ,  Katsutoshi Takagi ,  Junichi Nakai ,  Toshiki Sato

发明人： Yuuki Tauchi ,  Katsutoshi Takagi ,  Junichi Nakai ,  Toshiki Sato

IPC分类号： C22C5/06

CPC分类号： C22C5/06 ,  C22C1/002 ,  C22C5/08 ,  C23C14/024 ,  C23C14/185 ,  C23C14/205 ,  C23C14/3414 ,  C23C14/584 ,  G02B5/0808 ,  G11B7/252 ,  G11B7/2531 ,  G11B7/257 ,  G11B7/258 ,  G11B7/259 ,  G11B7/266 ,  Y10T428/10 ,  Y10T428/1059 ,  Y10T428/1095 ,  Y10T428/12 ,  Y10T428/12431 ,  Y10T428/12896 ,  Y10T428/12924 ,  Y10T428/21 ,  Y10T428/265 ,  Y10T428/31678

摘要： The present invention relates to an Ag alloy film. Particularly, it is preferably used as a reflective film or semi-transmissive reflective film for an optical information recording medium having high thermal conductivity/high reflectance/high durability in the field of optical information recording media, an electromagnetic-shielding film excellent in Ag aggregation resistance, and an optical reflective film on the back of a reflection type liquid crystal display device, or the like. The Ag alloy film of the present invention comprises an Ag base alloy containing Bi and/or Sb in a total amount of 0.005 to 10% (in terms of at %). Further, the present invention relates to a sputtering target used for the deposition of such an Ag alloy film.

公开(公告)号：US20090061142A1

公开(公告)日：2009-03-05

申请号：US12183700

申请日：2008-07-31

申请人： Yuuki TAUCHI ,  Katsutoshi Takagi ,  Junichi Nakai ,  Toshiki Sato

发明人： Yuuki TAUCHI ,  Katsutoshi Takagi ,  Junichi Nakai ,  Toshiki Sato

IPC分类号： G11B7/241

CPC分类号： C22C5/06 ,  C22C1/002 ,  C22C5/08 ,  C23C14/024 ,  C23C14/185 ,  C23C14/205 ,  C23C14/3414 ,  C23C14/584 ,  G02B5/0808 ,  G11B7/252 ,  G11B7/2531 ,  G11B7/257 ,  G11B7/258 ,  G11B7/259 ,  G11B7/266 ,  Y10T428/10 ,  Y10T428/1059 ,  Y10T428/1095 ,  Y10T428/12 ,  Y10T428/12431 ,  Y10T428/12896 ,  Y10T428/12924 ,  Y10T428/21 ,  Y10T428/265 ,  Y10T428/31678

摘要： The present invention relates to an Ag alloy film. Particularly, it is preferably used as a reflective film or semi-transmissive reflective film for an optical information recording medium having high thermal conductivity/high reflectance/high durability in the field of optical information recording media, an electromagnetic-shielding film excellent in Ag aggregation resistance, and an optical reflective film on the back of a reflection type liquid crystal display device, or the like. The Ag alloy film of the present invention comprises an Ag base alloy containing Bi and/or Sb in a total amount of 0.005 to 10% (in terms of at %). Further, the present invention relates to a sputtering target used for the deposition of such an Ag alloy film.

摘要翻译： 本发明涉及一种Ag合金膜。 特别优选用作在光信息记录介质领域中具有高导热性/高反射率/高耐久性的光学信息记录介质的反射膜或半透射反射膜，Ag聚集性优异的电磁屏蔽膜 电阻，反射型液晶显示装置背面的光反射膜等。 本发明的Ag合金膜包含总量为0.005〜10％（以％计）的Bi和/或Sb的Ag基合金。 此外，本发明涉及用于沉积这种Ag合金膜的溅射靶。

公开(公告)号：US20050008883A1

公开(公告)日：2005-01-13

申请号：US10871493

申请日：2004-06-21

申请人： Katsutoshi Takagi ,  Toshiki Sato ,  Junichi Nakai ,  Yuuki Tauchi

发明人： Katsutoshi Takagi ,  Toshiki Sato ,  Junichi Nakai ,  Yuuki Tauchi

IPC分类号： G02B1/10 ,  C22C5/06 ,  C23C14/06 ,  C23C14/14 ,  C23C14/34 ,  F21S8/10 ,  F21V7/00 ,  F21V7/22 ,  F21V17/00 ,  G02B5/08 ,  B32B15/04

CPC分类号： C23C14/024 ,  C23C14/185 ,  C23C14/3414 ,  C23C14/541 ,  G02B5/08 ,  Y10T428/12472 ,  Y10T428/12993

摘要： A reflective Ag alloy film for reflectors, which has excellent surface flatness and shows high reflectivity even under a heating environment and a reflector. The reflective Ag alloy film for reflectors has an average surface roughness of 2.0 nm or less and contains a rare earth element (such as Nd) in a content in the range of 0.1 to 3.0 at %, or further at least one selected from Au, Pd, Cu and Pt in a content in the range of 0.5 to 5.0 at %. The reflector comprises the above reflective Ag alloy film formed on a substrate.

摘要翻译： 用于反射器的反射型Ag合金膜，即使在加热环境下也具有优异的表面平坦度并显示高反射率和反射器。 反射器用反射型Ag合金膜的平均表面粗糙度为2.0nm以下，含有0.1〜3.0原子％的含量的稀土类元素（Nd），还含有选自Au， Pd，Cu和Pt的含量范围为0.5-5.0at％。 反射器包括形成在基板上的上述反射Ag合金膜。

公开(公告)号：US08936856B2

公开(公告)日：2015-01-20

申请号：US13437350

申请日：2012-04-02

申请人： Yuuki Tauchi ,  Katsutoshi Takagi ,  Junichi Nakai ,  Toshiki Sato

发明人： Yuuki Tauchi ,  Katsutoshi Takagi ,  Junichi Nakai ,  Toshiki Sato

IPC分类号： B32B15/00 ,  C22C5/06 ,  C22C5/08 ,  C22C1/00 ,  C23C14/02 ,  C23C14/18 ,  C23C14/20 ,  C23C14/34 ,  C23C14/58 ,  G02B5/08 ,  G11B7/252 ,  G11B7/257 ,  G11B7/258 ,  G11B7/259 ,  G11B7/26 ,  G11B7/2531

CPC分类号： C22C5/06 ,  C22C1/002 ,  C22C5/08 ,  C23C14/024 ,  C23C14/185 ,  C23C14/205 ,  C23C14/3414 ,  C23C14/584 ,  G02B5/0808 ,  G11B7/252 ,  G11B7/2531 ,  G11B7/257 ,  G11B7/258 ,  G11B7/259 ,  G11B7/266 ,  Y10T428/10 ,  Y10T428/1059 ,  Y10T428/1095 ,  Y10T428/12 ,  Y10T428/12431 ,  Y10T428/12896 ,  Y10T428/12924 ,  Y10T428/21 ,  Y10T428/265 ,  Y10T428/31678

摘要： The present invention relates to an Ag alloy film. Particularly, it is preferably used as a reflective film or semi-transmissive reflective film for an optical information recording medium having high thermal conductivity/high reflectance/high durability in the field of optical information recording media, an electromagnetic-shielding film excellent in Ag aggregation resistance, and an optical reflective film on the back of a reflection type liquid crystal display device, or the like. The Ag alloy film of the present invention comprises an Ag base alloy containing Bi and/or Sb in a total amount of 0.005 to 10% (in terms of at %). Further, the present invention relates to a sputtering target used for the deposition of such an Ag alloy film.

公开(公告)号：US08178174B2

公开(公告)日：2012-05-15

申请号：US12915138

申请日：2010-10-29

申请人： Yuuki Tauchi ,  Katsutoshi Takagi ,  Junichi Nakai ,  Toshiki Sato

发明人： Yuuki Tauchi ,  Katsutoshi Takagi ,  Junichi Nakai ,  Toshiki Sato

IPC分类号： G02B1/10 ,  C09K19/52 ,  B32B15/00 ,  C22C5/06

CPC分类号： C22C5/06 ,  C22C1/002 ,  C22C5/08 ,  C23C14/024 ,  C23C14/185 ,  C23C14/205 ,  C23C14/3414 ,  C23C14/584 ,  G02B5/0808 ,  G11B7/252 ,  G11B7/2531 ,  G11B7/257 ,  G11B7/258 ,  G11B7/259 ,  G11B7/266 ,  Y10T428/10 ,  Y10T428/1059 ,  Y10T428/1095 ,  Y10T428/12 ,  Y10T428/12431 ,  Y10T428/12896 ,  Y10T428/12924 ,  Y10T428/21 ,  Y10T428/265 ,  Y10T428/31678

摘要： The present invention relates to an Ag alloy film. Particularly, it is preferably used as a reflective film or semi-transmissive reflective film for an optical information recording medium having high thermal conductivity/high reflectance/high durability in the field of optical information recording media, an electromagnetic-shielding film excellent in Ag aggregation resistance, and an optical reflective film on the back of a reflection type liquid crystal display device, or the like. The Ag alloy film of the present invention comprises an Ag base alloy containing Bi and/or Sb in a total amount of 0.005 to 10% (in terms of at %). Further, the present invention relates to a sputtering target used for the deposition of such an Ag alloy film.

摘要翻译： 本发明涉及一种Ag合金膜。 特别优选用作光信息记录介质领域中具有高导热性/高反射率/高耐久性的光学信息记录介质的反射膜或半透射反射膜，Ag聚集性优异的电磁屏蔽膜 电阻，反射型液晶显示装置背面的光反射膜等。 本发明的Ag合金膜包含总量为0.005〜10％（以％计）的Bi和/或Sb的Ag基合金。 此外，本发明涉及用于沉积这种Ag合金膜的溅射靶。