Pattern defect inspection apparatus
    2.
    发明授权
    Pattern defect inspection apparatus 失效
    图案缺陷检查装置

    公开(公告)号:US4731855A

    公开(公告)日:1988-03-15

    申请号:US720730

    申请日:1985-04-08

    IPC分类号: G01N21/956 H01L21/26 G06K9/00

    CPC分类号: G01N21/956 H01L21/26

    摘要: A pattern defect inspection apparatus detects presence or absence of a defect in a pattern formed on a semiconductor wafer by scanning the pattern normally to the surface thereof by a coherent light beam of a predetermined spot size, detecting reflected diffraction lights generated thereby and processing the detected lights. It comprises an abnormal direction signal detector including photo-detectors having wide light receiving areas arranged in a plurality of spatial areas which the reflected diffraction lights from a normal pattern do not normally reach, a normal pattern detector including photo-detectors having large light receiving areas arranged in a plurality of spatial areas which the reflected diffraction lights from the normal pattern reach, and a defect discriminator for determining if the abnormal direction signals are due to a true defect or not in accordance with the signals from the abnormal direction signal detector and the normal pattern detector.

    摘要翻译: 图案缺陷检查装置通过用预定光斑尺寸的相干光束将图案通常扫描到其表面来检测在半导体晶片上形成的图案中的缺陷的存在或不存在,检测由此产生的反射衍射光并且处理检测到的 灯光 它包括异常方向信号检测器,其包括具有布置在多个空间区域中的宽光接收区域的光检测器,正常图案的反射衍射光通常不能正常到达,包括光检测器的正常图案检测器具有大的光接收面积 布置在从正常图案到达的反射衍射光的多个空间区域中,以及用于根据来自异常方向信号检测器的信号和用于确定异常方向信号是否由于真实缺陷而导致的缺陷鉴别器 正常模式检测器