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公开(公告)号：US11333969B2
公开(公告)日：2022-05-17
申请号：US16190588
申请日：2018-11-14
发明人： Keiji Yamashita , Yutaka Watanabe , Takuya Kono , Masayuki Hatano , Ikuo Yoneda
IPC分类号： G03F7/00
摘要： Provided is an imprint apparatus that applies a resin (drops) dispersed at a plurality of locations on a substrate, brings the resin and a mold into contact, and transfers the contoured pattern that is formed in the mold to the resin comprising: a controller that sets a principal axis direction according to the contoured pattern and an array direction in which a plurality of resin drops are aligned, and determines application positions for the resin such that the array direction is angled with respect to the principal axis direction; and a dispenser that applies the resin based on the application positions that have been determined.
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公开(公告)号：US11199772B2
公开(公告)日：2021-12-14
申请号：US16437167
申请日：2019-06-11
摘要： Methods for imprinting on abutted fields of a substrate are described. Generally, a first field of a substrate may be imprinted using an imprint lithography template. The template may then be placed such that a portion of the template overlaps the first field of the substrate while imprinting a second field of the substrate.
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公开(公告)号：US10124529B2
公开(公告)日：2018-11-13
申请号：US14565507
申请日：2014-12-10
发明人： Gaddi S. Haase , Kosta S. Selinidis , Zhengmao Ye
摘要： Imprint lithography templates having leading and trailing edge borders are provided that achieve zero-gap imprinting between adjacent fields with full-feature height features provided in the pattern exclusion zones (PEZ) located between such fields. The leading edge borders include dummy features, e.g., elongated features directionally oriented parallel to the mesa edge, while the trailing edge border includes a recess extending to the mesa edges. When used in a step-and-repeat process, the trailing edge border overlaps edge portions of an adjacent imprinted field that were previously patterned by the leading edge border of the template, producing full-feature height features in the pattern exclusion zones between such fields, and avoiding gaps or open areas between such fields that otherwise lead to non-uniformity of downstream processes such as etch processes and CMP.
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公开(公告)号：US09529274B2
公开(公告)日：2016-12-27
申请号：US14570651
申请日：2014-12-15
CPC分类号： G03F7/7035 , B25B11/005 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/703 , G03F7/70375
摘要： In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.
摘要翻译： 在压印光刻系统中，模板卡盘上的凹进的支撑件可以改变定位在其上的模板的形状，从而在纳米压印光刻工艺中最小化和/或消除模板的外边缘的过早向下偏移。
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5.发明授权Nano imprinting with reusable polymer template with metallic or oxide coating 有权使用金属或氧化物涂层的可重复使用的聚合物模板进行纳米压印公开(公告)号：US09170485B2
公开(公告)日：2015-10-27
申请号：US14216017
申请日：2014-03-17
发明人： Se Hyun Ahn , Byung-Jin Choi , Frank Y. Xu
CPC分类号： C23C16/513 , B29C59/043 , B29C59/046 , B29C59/14 , B29C2059/145 , B41C1/10 , B82Y10/00 , B82Y40/00 , C23C16/402 , C23C16/48 , G03F7/0002
摘要： Methods and systems are provided for fabricating polymer-based imprint lithography templates having thin metallic or oxide coated patterning surfaces. Such templates show enhanced fluid spreading and filling (even in absence of purging gases), good release properties, and longevity of use. Methods and systems for fabricating oxide coated versions, in particular, can be performed under atmospheric pressure conditions, allowing for lower cost processing and enhanced throughput.
摘要翻译： 提供了用于制造具有薄金属或氧化物涂覆的图案化表面的基于聚合物的压印光刻模板的方法和系统。 这样的模板显示出增强的流体扩散和填充（即使没有吹扫气体），良好的脱模性能和使用寿命。 特别是用于制造氧化物涂层版本的方法和系统可以在大气压条件下进行，从而允许较低成本的处理和增加的生产量。
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公开(公告)号：US09090014B2
公开(公告)日：2015-07-28
申请号：US14604822
申请日：2015-01-26
发明人： Xiaoming Lu , Philip D. Schumaker
CPC分类号： B29C43/58 , B29C43/003 , B29C43/021 , B29C2043/025 , B29C2043/5808 , B29C2043/5833 , B29C2043/5841 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Systems for controlling velocity of a contact line and height profile between a template and a substrate during imprinting of polymerizable material are described.
摘要翻译： 描述了在可聚合材料的压印期间控制接触线速度和模板和基底之间的高度分布的系统。
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7.发明申请LOW CONTACT IMPRINT LITHOGRAPHY TEMPLATE CHUCK SYSTEM FOR IMPROVED OVERLAY CORRECTION 有权用于改进的覆盖度校正的低接触式印刷机公开(公告)号：US20150131072A1
公开(公告)日：2015-05-14
申请号：US14536069
申请日：2014-11-07
IPC分类号： G03F7/20
CPC分类号： G03F7/70708 , G03F7/0002
摘要： Imprint lithography template chucks and related systems and methods are provided that substantially maintain structural support functions while significantly enhancing imprint quality functions. The chucks incorporate dynamic vacuum seals to substantially reduce template contact during alignment and distortion correction while still providing good structural support upon separation.
摘要翻译： 提供了压印光刻模板卡盘以及相当的系统和方法，其基本上保持了结构支撑功能，同时显着提高了压印质量功能。 卡盘结合动态真空密封件，以便在对准和失真校正期间大大减少模板接触，同时在分离时仍然提供良好的结构支撑。
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公开(公告)号：US09616614B2
公开(公告)日：2017-04-11
申请号：US13773217
申请日：2013-02-21
申请人： Byung-Jin Choi , Se Hyun Ahn , Mahadevan GanapathiSubramanian , Michael N. Miller , Sidlgata V. Sreenivasan
发明人： Byung-Jin Choi , Se Hyun Ahn , Mahadevan GanapathiSubramanian , Michael N. Miller , Sidlgata V. Sreenivasan
CPC分类号： B29C59/026 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Methods and systems are provided for patterning polymerizable material dispensed on flexible substrates or flat substrates using imprint lithography techniques. Template replication methods and systems are also presented where patterns from a master are transferred to flexible substrates to form flexible film templates. Such flexible film templates are then used to pattern large area flat substrates. Contact between the imprint template and substrate can be initiated and propagated by relative translation between the template and the substrate.
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公开(公告)号：US09227361B2
公开(公告)日：2016-01-05
申请号：US14026775
申请日：2013-09-13
CPC分类号： B29C59/002 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Nano imprint lithography templates for purging of fluid during nano imprint lithography processes are described. The templates may include an inner channel and an outer channel. The inner channel constructed to provide fluid communication with a process gas supply to a region between the template and a substrate during the nano imprint lithography process. The outer channel constructed to evacuate fluid and/or confine fluid between the active area of template and the substrate.
摘要翻译： 描述了纳米压印光刻过程中用于清洗流体的纳米压印光刻模板。 模板可以包括内部通道和外部通道。 内部通道构造成在纳米压印光刻工艺期间提供与模板和衬底之间的区域的工艺气体供应的流体连通。 外部通道构造成在模板的有效区域和基底之间排出流体和/或限制流体。
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公开(公告)号：US08967992B2
公开(公告)日：2015-03-03
申请号：US13455966
申请日：2012-04-25
CPC分类号： B29C43/58 , B29C59/00 , B29C2043/585 , B29K2105/24 , B29K2905/02 , B29K2995/0018 , B29K2995/0027 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7042 , G03F9/7084 , Y10T428/24612 , Y10T428/2462
摘要： Imprint lithography templates having alignment marks with highly absorptive material. The alignment marks are insensitive to the effects of liquid spreading and can provide stability and increase contrast to alignment system during liquid imprint filling of template features.
摘要翻译： 压印光刻模板，具有高吸收性材料的对准标记。 对准标记对液体扩散的影响不敏感，并且可以在模板特征的液体印迹填充期间提供稳定性并增加对准系统的对比度。
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