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1.发明授权Method of fabricating tridimensional micro- and nanostructures as well as optical element assembly having a tridimensional convex structure obtained by the method 失效制造立体微结构和纳米结构的方法以及通过该方法获得的具有三维凸结构的光学元件组件公开(公告)号：US07760435B2
公开(公告)日：2010-07-20
申请号：US11816804
申请日：2005-02-21
CPC分类号： B81C99/009 , B81B2207/056 , B81C99/0085 , B81C2201/0132 , B81C2201/0143 , B82Y20/00 , G02B3/0012
摘要： A method is for forming three-dimensional micro- and nanostructures, based on the structuring of a body of material by a mould having an impression area which reproduces the three-dimensional structure in negative form. This method includes providing a mould having a substrate of a material which can undergo isotropic chemical etching, in which the impression area is to be formed. An etching pattern is defined on (in) the substrate, having etching areas having zero-, uni- or bidimensional extension, which can be reached by an etching agent. A process of isotropic chemical etching of the substrate from the etching areas is carried out for a corresponding predetermined time, so as to produce cavities which in combination make up the impression area. The method is advantageously used in the fabrication of sets of microlenses with a convex three-dimensional structure, of the refractive or hybrid refractive/diffractive type, for forming images on different focal planes.
摘要翻译： 一种用于形成三维微结构和纳米结构的方法，其基于通过具有以负形式再现三维结构的印模区域的模具构造材料体。 该方法包括提供具有能够进行各向同性化学蚀刻的材料的基材的模具，其中将形成印模区域。 蚀刻图案被定义在衬底的（在）中，其蚀刻区域具有零，一维或二维延伸，这可由蚀刻剂达到。 从蚀刻区域对基板进行各向同性化学蚀刻的过程进行相应的预定时间，以产生组合构成印模区域的空腔。 该方法有利地用于制造具有折射或混合折射/衍射类型的凸立体结构的微透镜组，用于在不同焦平面上形成图像。
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