公开(公告)号：US20210181458A1

公开(公告)日：2021-06-17

申请号：US17256471

申请日：2019-06-04

申请人： NIKON CORPORATION ,  TOCHIGI NIKON CORPORATION

发明人： Kunihiko SHIMIZU ,  Satoshi WAIZUMI ,  Takehiro KOIZUMI

IPC分类号： G02B7/10 ,  G03B17/14 ,  G02B7/02 ,  G02B15/14

摘要： A lens barrel capable of increasing the moving range of a lens includes: a lens retainer frame for holding a lens; a drive unit for driving the lens retainer frame along the optical axis direction; a first cylinder that holds the drive unit and has a cam follower; a second cylinder that has a cam groove for engaging the cam follower; and a bias part for biasing the first cylinder along the optical axis.

公开(公告)号：US20070267571A1

公开(公告)日：2007-11-22

申请号：US11798255

申请日：2007-05-11

申请人： Susumu Makinouchi ,  Toru Imai ,  Akihiro Watanabe

发明人： Susumu Makinouchi ,  Toru Imai ,  Akihiro Watanabe

IPC分类号： G01D5/34

CPC分类号： G01D5/38

摘要： When an incident light is obliquely incident on an index scale, the optical path length of light A becomes longer than the optical path length of light B and an optical path length difference occurs, which causes a phase difference in both of the diffracted lights incident on a photodetection element. According to the phase difference, intensity of a photoelectric detection signal output from the photodetection element changes. That is, due to a periodic change in the incident angle of the incident light, the phase difference between light A and light B is modulated, and the interference signal becomes greatly modulated.

摘要翻译： 当入射光倾斜地入射到指数刻度上时，光A的光程长度比光B的光路长度长，并且产生光程长度差，导致入射到的两个衍射光的相位差 光电检测元件。 根据相位差，从光检测元件输出的光电检测信号的强度变化。 也就是说，由于入射光的入射角度的周期性变化，光A和光B之间的相位差被调制，并且干扰信号变得很大地被调制。

公开(公告)号：US20050140946A1

公开(公告)日：2005-06-30

申请号：US10969971

申请日：2004-10-22

申请人： Toshihiko Tsuji ,  Yoshitomo Nagahashi ,  Manabu Fujii ,  Hironori Murakami

发明人： Toshihiko Tsuji ,  Yoshitomo Nagahashi ,  Manabu Fujii ,  Hironori Murakami

IPC分类号： G03F7/20 ,  G03B27/52

CPC分类号： G03F7/70991 ,  G03F7/70858 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/709

摘要： An exposure system is provided which can maintain a predetermined performance of the exposure apparatus stably by maintaining a cooling capacity by preventing a negative pressure from being generated in a circulation path of the liquid and preventing the back pressure from increasing even if at least a part of a temperature adjusting device is disposed under a disposition surface of the exposure apparatus due to the disposition area. A sealed tank which stores the cooling agent which is circulated in the circuiting systems and a pump, etc., which circulates the cooling agent are disposed under the disposition surface FL of the exposure system. The reticle stage and the wafer stage which are objects of which the temperature is supposed to be controlled are disposed above the disposition surface FL. A tank which open to air is provided so as to prevent the negative pressure from being generated in the reticle stage, etc. such that the tank and the tank are connected by a connecting piping arrangement. Also, the piping arrangement which eliminates the bubbles which are contained in the cooling agent which is circulated in the circulating systems are connected to the circulating systems.

摘要翻译： 提供一种曝光系统，其可以通过防止在液体的循环路径中产生负压并通过保持冷却能力来稳定地保持曝光装置的预定性能，并且即使在至少一部分 温度调节装置由于配置区域而设置在曝光装置的配置表面下。 储存在循环系统中循环的冷却剂的密封罐和循环冷却剂的泵等设置在曝光系统的配置面FL的下方。 作为温度被控制的对象的标线片台和晶片台设置在配置面FL上方。 设置有开放空气的罐，以防止在标线片等中产生负压，使得罐和罐通过连接配管装置连接。 此外，消除在循环系统中循环的冷却剂中包含的气泡的管道装置连接到循环系统。

公开(公告)号：US06885437B2

公开(公告)日：2005-04-26

申请号：US10781661

申请日：2004-02-20

申请人： Kenji Nishi ,  Katsunobu Ogura ,  Hidekazu Kikuchi

发明人： Kenji Nishi ,  Katsunobu Ogura ,  Hidekazu Kikuchi

IPC分类号： G03F7/20 ,  G03B27/62 ,  G03B27/32 ,  G03B27/42

CPC分类号： G03F7/70733 ,  G03F7/70741

摘要： When a reticle stage capable of moving while holding a reticle is at a predetermined unloading position, an unloading arm performs unloading of a reticle. Also, the instant or immediately after the reticle is separated from the reticle stage by the unloading arm, the reticle stage is moved to a predetermined loading position where a reticle is loaded onto the reticle stage by a loading arm. This allows the reticle to be loaded onto the reticle stage before the unloading arm completely withdraws from the unloading position, which reduces the downtime between the retile unloading and the reticle loading. Accordingly, the throughput of the exposure apparatus can be improved, since the time required for reticle exchange is reduced.

摘要翻译： 当保持掩模版时能够移动的标线片台处于预定的卸载位置时，卸载臂执行掩模版的卸载。 此外，在通过卸载臂将掩模版与刻划台分隔开之后或之后，通过装载臂将标线片载物台移动到预定的装载位置，在该装载位置将掩模版装载到标线片台上。 这样就可以在卸载臂从卸载位置完全退出之前，将掩模版加载到标线片台上，从而减少了沉淀物卸载与掩模版加载之间的停机时间。 因此，由于减少了掩模版交换所需的时间，因此可以提高曝光装置的生产量。

公开(公告)号：US5732305A

公开(公告)日：1998-03-24

申请号：US827712

申请日：1997-04-08

申请人： Kouji Satou

发明人： Kouji Satou

IPC分类号： G03B17/02

CPC分类号： G03B17/02 ,  G03B2217/002

摘要： A camera including a body unit and a top cover unit configured to be mounted on the body unit. The body unit has a body section that defines a space within the camera. The camera also includes a component disposed on the top cover unit and a control unit disposed in the space defined within the camera. The control unit controls the component. The camera also includes a connection unit that electrically connects the component and the control unit. The connection unit is disposed proximately close to the space defined within the camera, thereby allowing the top cover unit to be removed from the body unit without disconnecting the component and the control unit and thereby allowing diagnostic operations to be performed within the camera.

摘要翻译： 一种照相机，包括构造成安装在主体单元上的主体单元和顶盖单元。 身体单元具有在相机内限定空间的身体部分。 相机还包括设置在顶盖单元上的部件和设置在相机内限定的空间中的控制单元。 控制单元控制组件。 摄像机还包括一个连接单元，电连接该组件和控制单元。 连接单元靠近相机内限定的空间设置，从而允许顶盖单元从主体单元移除，而不断开组件和控制单元，从而允许在相机内执行诊断操作。

公开(公告)号：US20090135388A1

公开(公告)日：2009-05-28

申请号：US12330119

申请日：2008-12-08

申请人： Susumu MAKINOUCHI ,  Toru IMAI ,  Akihiro WATANABE

发明人： Susumu MAKINOUCHI ,  Toru IMAI ,  Akihiro WATANABE

IPC分类号： G01B9/02 ,  G03B27/58 ,  G03B27/42

CPC分类号： G01D5/38 ,  G01D5/266 ,  G03F7/70716 ,  G03F7/70775

摘要： A moving grating is arranged on a side of a wafer stage, a light source irradiates a light to the moving grating, diffracted lights generated from the moving grating are interfered by fixed scales and an index scale of which positional relation with the light source is fixed, and a detection instrument detects the interfered light. In this case, since the moving grating is arranged on a side of the wafer stage, upsizing of the entire wafer stage can be suppressed. Further, since interference occurs between a plurality of diffracted lights (e.g., the ±1st-order diffracted light) passing extremely close optical paths, influence caused by a fluctuation of ambient atmosphere becomes less in comparison to conventional interferometers, and thus, a high-precision measurement of positional information of the movable body is possible.

摘要翻译： 移动光栅布置在晶片台的一侧，光源将光照射到移动光栅，由移动光栅产生的衍射光被固定的刻度干扰，并且与光源的位置关系固定的折射率 并且检测仪器检测被干扰的光。 在这种情况下，由于移动光栅布置在晶片台的一侧，因此可以抑制整个晶片台的大型化。 此外，由于在通过非常接近的光路的多个衍射光（例如±1级衍射光）之间发生干涉，所以与常规干涉仪相比，由环境大气的波动引起的影响变小， 移动体的位置信息的精度测量是可能的。

公开(公告)号：US20080258050A1

公开(公告)日：2008-10-23

申请号：US12144936

申请日：2008-06-24

申请人： Susumu MAKINOUCHI ,  Toru IMAI ,  Akihiro WATANABE

发明人： Susumu MAKINOUCHI ,  Toru IMAI ,  Akihiro WATANABE

IPC分类号： G01D5/34

CPC分类号： G01D5/38 ,  G01D5/34784

摘要： A light via first and second index scales is split by a beam splitter, and one of the split lights is received by a first light-receiving element via a movable scale and also the other of the split lights is received by a second light-receiving element via a reference scale, and therefore by computing positional information of the movable scale using an output of the first light-receiving element (a first output) and an output of the second light-receiving element (a second output), movement information of the movable scale can be measured with high precision without being affected by drift of the modulation center (the oscillation center) of the beam.

摘要翻译： 通过第一和第二索引刻度的光被分束器分开，并且其中一个分光灯通过可移动刻度被第一光接收元件接收，另一个分光灯由第二光接收 并且因此通过使用第一受光元件（第一输出）的输出和第二光接收元件的输出（第二输出）来计算可移动刻度的位置信息，以及 可以高精度地测量可移动刻度，而不受波束的调制中心（振荡中心）的漂移的影响。

公开(公告)号：US07106414B2

公开(公告)日：2006-09-12

申请号：US10969971

申请日：2004-10-22

申请人： Toshihiko Tsuji ,  Yoshitomo Nagahashi ,  Manabu Fujii ,  Hironori Murakami

发明人： Toshihiko Tsuji ,  Yoshitomo Nagahashi ,  Manabu Fujii ,  Hironori Murakami

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70991 ,  G03F7/70858 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/709

摘要： An exposure system is provided which can maintain a predetermined performance of the exposure apparatus stably by maintaining a cooling capacity by preventing a negative pressure from being generated in a circulation path of the liquid and preventing the back pressure from increasing even if at least a part of a temperature adjusting device is disposed under a disposition surface of the exposure apparatus due to the disposition area. A sealed tank which stores the cooling agent which is circulated in the circuiting systems and a pump, etc., which circulates the cooling agent are disposed under the disposition surface FL of the exposure system. The reticle stage and the wafer stage which are objects of which the temperature is supposed to be controlled are disposed above the disposition surface FL. A tank which open to air is provided so as to prevent the negative pressure from being generated in the reticle stage, etc. such that the tank and the tank are connected by a connecting piping arrangement. Also, the piping arrangement which eliminates the bubbles which are contained in the cooling agent which is circulated in the circulating systems are connected to the circulating systems.

摘要翻译： 提供一种曝光系统，其可以通过防止在液体的循环路径中产生负压并通过保持冷却能力来稳定地保持曝光装置的预定性能，并且即使在至少一部分 温度调节装置由于配置区域而设置在曝光装置的配置表面下。 储存在循环系统中循环的冷却剂的密封罐和循环冷却剂的泵等设置在曝光系统的配置面FL的下方。 作为温度被控制的对象的标线片台和晶片台设置在配置面FL上方。 设置有开放空气的罐，以防止在标线片等中产生负压，使得罐和罐通过连接配管装置连接。 此外，消除在循环系统中循环的冷却剂中包含的气泡的管道装置连接到循环系统。

公开(公告)号：US06050689A

公开(公告)日：2000-04-18

申请号：US116934

申请日：1998-07-17

申请人： Hiroki Nakamura ,  Yoshihiro Watanabe ,  Hidenori Aizawa ,  Atsushi Sekine

发明人： Hiroki Nakamura ,  Yoshihiro Watanabe ,  Hidenori Aizawa ,  Atsushi Sekine

IPC分类号： H04N9/31 ,  G03B21/14

CPC分类号： G02B27/148 ,  G02B27/0961 ,  G02B27/1053 ,  H04N9/3108 ,  H04N9/3152 ,  G02B3/0043 ,  G02F1/133526 ,  G02F2001/133623

摘要： Disclosed is a single plate projection type display apparatus which is capable of achieving a high luminance without an increase in an output of a light source. A first lens plate having a plurality of lenses divides a light from a light source into a plurality of light beams. A second lens plate having a plurality of lenses superposes the divided plurality of light beams on a light valve, thereby performing an illumination. A color separation optical system composed of dichroic mirrors which are perpendicular to an XY plane and form predetermined angles to each other, performs a color separation for the light beams from the second lens plate. The light valve modulates R, G and B light beams which are incident thereonto. The modulated lights are projected by a projection lens. The whole shape of the second lens plate is a rectangle. The second lens plate is disposed so that a longitudinal direction of the longer side of the whole shape of the rectangle is perpendicular to a plane formed by a normal line to the dichroic mirrors and an optical axis immediately before an incidence onto the dichroic mirrors.

摘要翻译： 公开了一种能够在不增加光源的情况下实现高亮度的单板投影型显示装置。 具有多个透镜的第一透镜板将来自光源的光分成多个光束。 具有多个透镜的第二透镜板将分割的多个光束叠加在光阀上，从而进行照明。 由垂直于XY平面并且彼此形成预定角度的分色镜组成的分色光学系统对来自第二透镜板的光进行分色。 光阀调制入射到其上的R，G和B光束。 调制光由投影透镜投影。 第二透镜板的整个形状是矩形。 第二透镜板被配置成使得矩形的整个形状的长边的纵向方向垂直于与分色镜的法线形成的平面以及在入射到分色镜之前的光轴。

公开(公告)号：US20040057030A1

公开(公告)日：2004-03-25

申请号：US10635803

申请日：2003-08-05

申请人： Nikon Corporation ,  Sendai Nikon Corporation

发明人： Yukiharu Okubo ,  Hidekazu Kikuchi

IPC分类号： G03B027/42

CPC分类号： G03F1/66 ,  G03F7/70741 ,  Y10S414/11 ,  Y10S414/137

摘要： Reticle-holding devices (reticle nullpodsnull) are disclosed for holding circular reticles as used microlithography systems that use circular reticles. An exemplary reticle pod includes a base and cover. Mounted to the base are multiple (desirably three) reticle-support blocks providing three respective, equally spaced, reticle-contact surfaces that support a reticle in the peripheral nullhandling zonenull of the reticle. Mounted to the inside surface of the cover are corresponding compliant pressure-application members (desirably respective flat springs terminating with respective reticle-contact members) that apply a holding force to the reticle. A respective portion of the reticle is situated between each pressure-application member and a respective reticle-support surface. Thus, the reticle, configured as a SEMI standard wafer, is stably held at three points in the handling zone of the reticle without damaging the reticle.

摘要翻译： 公开了用于保持圆形掩模版的标线片保持装置（掩模版“荚”），这是使用环形掩模版的微光刻系统。 示例性掩模托架包括底座和盖。 安装到基座上是多个（期望地三个）掩模版支撑块，其提供三个相应的，等间隔的光罩接触表面，其支撑掩模版的外围“处理区”中的掩模版。 安装到盖的内表面的是相应的柔性压力施加构件（期望地相应于各个标线接触构件的平板弹簧），其将保持力施加到掩模版。 标线片的相应部分位于每个压力施加构件和相应的掩模版支撑表面之间。 因此，配置为SEMI标准晶片的掩模版被稳定地保持在掩模版的处理区域中的三个点处，而不会损坏掩模版。