公开(公告)号：US20190071599A1

公开(公告)日：2019-03-07

申请号：US15774289

申请日：2015-11-11

Applicant: Dow Global Technologies LLC ,  Rohm and Haas Electronic Materials LLC

Inventor： Xiuyan Wang ,  Bo Lu ,  Yang Li ,  Nan Hu ,  Xiaofan Ren ,  Peter Trefonas, III ,  Yuanqiao Rao

IPC: C09K11/07 ,  C09K11/02 ,  H01L51/00

Abstract: Light emitting nanoparticles have improved photostability, thermal stability and emission properties, and a process of preparing the nanoparticles.

公开(公告)号：US20170285470A1

公开(公告)日：2017-10-05

申请号：US15614376

申请日：2017-06-05

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Emad Aqad ,  Mingqi Li ,  Joseph Mattia ,  Cheng-Bai Xu

IPC: G03F7/004 ,  C07J31/00 ,  C07C381/12

Abstract: New photoacid generator compounds (“PAGs”) are provided that comprise a cholate moiety and photoresist compositions that comprise such PAG compounds.

公开(公告)号：US20160347709A1

公开(公告)日：2016-12-01

申请号：US15167223

申请日：2016-05-27

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Irvinder Kaur ,  Cong Liu ,  Cheng-Bai Xu

IPC: C07C309/17 ,  C07D493/18 ,  G03F7/32 ,  G03F7/16 ,  G03F7/20 ,  C07D307/00 ,  G03F7/004

CPC classification number: C07C309/17 ,  C07C309/01 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D307/00 ,  C07D493/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  H01L21/0274

Abstract: Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, acid generators are provided that comprise one or more hydrophilic moieties.

Abstract translation: 提供了特别可用作光致抗蚀剂组合物组分的酸发生剂化合物。 在一个优选的方面，提供了包含一个或多个亲水部分的酸产生剂。

公开(公告)号：US12234369B2

公开(公告)日：2025-02-25

申请号：US16222064

申请日：2018-12-17

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Irvinder Kaur ,  Chunyi Wu ,  Joshua A. Kaitz ,  Mingqi Li ,  Doris Kang ,  Xisen Hou ,  Cong Liu

IPC: G03F7/004 ,  C09D133/02 ,  C09D133/06 ,  C09D133/08 ,  G03F7/11 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32

Abstract: Photoresist topcoat compositions, comprising: a first polymer that is aqueous base soluble and is present in an amount of from 70 to 99 wt % based on total solids of the composition; a second polymer comprising a repeat unit of general formula (IV) and a repeat unit of general formula (V): wherein: R5 independently represents H, halogen atom, C1-C3 alkyl, or C1-C3 haloalkyl; R6 represents linear, branched or cyclic C1 to C20 fluoroalkyl; R7 represents linear, branched or cyclic C1 to C20 fluoroalkyl; L3 represents a multivalent linking group; and m is an integer of from 1 to 5; wherein the second polymer is free of non-fluorinated side chains; and wherein the second polymer is present in an amount of from 1 to 30 wt % based on total solids of the composition and a solvent. The invention finds particular applicability in the manufacture of semiconductor devices.

公开(公告)号：US12140866B2

公开(公告)日：2024-11-12

申请号：US17454331

申请日：2021-11-10

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Emad Aqad

IPC: G03F7/004 ,  C07C51/02 ,  C07C303/32 ,  C07C309/12 ,  C07C381/12 ,  C08F220/30 ,  G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  G03F7/32

Abstract: Photoacid generators comprising a moiety of formula (1): wherein: Ar1 is a substituted or unsubstituted aryl group; R1 is an alkyl or aryl group, each of which may be substituted or unsubstituted, wherein Ar1 and R1 are optionally connected together by a single bond or a divalent linking group to form a ring; Y is a single bond or a divalent group; and * is the point of attachment of the moiety to another atom of the photoacid generator. The photoacid generator compounds find particular use in photoresist compositions that can be used to form lithographic patterns for the formation of electronic devices.

公开(公告)号：US11940732B2

公开(公告)日：2024-03-26

申请号：US17231417

申请日：2021-04-15

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Sheng Liu ,  James F. Cameron ,  Shintaro Yamada ,  Iou-Sheng Ke ,  Keren Zhang ,  Suzanne M. Coley ,  Li Cui ,  Paul J. LaBeaume ,  Deyan Wang

IPC: G03F7/11 ,  C09D4/06 ,  C09D7/47 ,  C09D7/63 ,  G03F7/025 ,  G03F7/075 ,  G03F7/09 ,  G03F7/16 ,  G03F7/20

CPC classification number: G03F7/11 ,  C09D4/06 ,  C09D7/47 ,  C09D7/63 ,  G03F7/025 ,  G03F7/0752 ,  G03F7/091 ,  G03F7/094 ,  G03F7/16 ,  G03F7/2016

Abstract: Coating compositions comprise: a curable compound comprising: a core chosen from a C6 carbocyclic aromatic ring, a C2-5 heterocyclic aromatic ring, a C9-30 fused carbocyclic aromatic ring system, a C4-30 fused heterocyclic aromatic ring system, C1-20 aliphatic, and C3-20 cycloaliphatic, and three or more substituents of formula (1)




wherein at least two substituents of formula (1) are attached to the aromatic core; provided that no substituents of formula (1) are in an ortho position to each other on the same aromatic ring of the core; a polymer; and one or more solvents, wherein the total solvent content is from 50 to 99 wt % based on the coating composition.

公开(公告)号：US11829069B2

公开(公告)日：2023-11-28

申请号：US16236725

申请日：2018-12-31

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Joshua Kaitz ,  Tomas Marangoni ,  Emad Aqad ,  Amy M. Kwok ,  Mingqi Li ,  Thomas Cardolaccia ,  Choong-Bong Lee ,  Ke Yang ,  Cong Liu

IPC: G03F7/11 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/16 ,  G03F7/32 ,  G03F7/38 ,  C09D133/16 ,  C08F220/24 ,  C08F220/28 ,  C08F220/18

CPC classification number: G03F7/11 ,  C08F220/24 ,  C08F220/283 ,  C09D133/16 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  C08F220/1808

Abstract: New photoresist and topcoat compositions are provided that are useful in a variety of applications. In one aspect, new photoresist compositions are provided that comprise: (a) a first matrix polymer; (b) one or more acid generators; and (c) one or more additive compounds of Formulae (I) and/or (II).

公开(公告)号：US20230348721A1

公开(公告)日：2023-11-02

申请号：US18219833

申请日：2023-07-10

Applicant: Rohm and Haas Electronic Materials Korea Ltd. ,  Rohm and Haas Electronic Materials LLC ,  DuPont Toray Specialty Materials Kabushiki Kaisha

Inventor： Shunya Takeuchi ,  Anna Ya Ching Feng ,  Yutaka Oka ,  Jung Hye Chae

IPC: C08L83/04 ,  C08G77/20 ,  C08G77/28 ,  C08G77/00 ,  C08K5/132 ,  C08K5/18 ,  C08K5/5397

CPC classification number: C08L83/04 ,  C08G77/20 ,  C08G77/28 ,  C08G77/80 ,  C08K5/132 ,  C08K5/18 ,  C08K5/5397 ,  C08L2312/06 ,  C08L2201/08 ,  C08L2201/10 ,  C08L2203/16 ,  C08L2203/206 ,  C08L2205/025 ,  C08L2205/03

Abstract: A UV curable silicone composition has exceptional curability by ultraviolet irradiation. The UV curable silicone composition includes (A) an organopolysiloxane composition selected from the following: (A-1) an organopolysiloxane composition comprising a linear organopolysiloxane in which both ends of the molecular chain are capped with alkenyl groups and/or a branched organopolysiloxane containing at least 2 alkenyl groups at the ends of the molecular chain, and an organopolysiloxane containing at least 2 thiol groups in side-chains of the molecular chain, wherein the thiol group content is 1% by mass or more per molecule, (A-2) an organopolysiloxane composition comprising a linear organopolysiloxane in which both ends of the molecular chain are capped with thiol groups, wherein the thiol group content is 1% by mass or more per molecule, and an organopolysiloxane containing at least 2 alkenyl groups in side-chains of the molecular chain and/or a resinous organopolysiloxane containing at least 2 alkenyl groups at the ends of the molecular chain, or (A-3) an organopolysiloxane composition comprising an alkenyl group- and aryl group-containing organopolysiloxane and a multifunctional thiol compound, but furthermore comprising an alkenyl group-containing resinous organopolysiloxane when the multifunctional thiol compound contains only a bifunctional thiol compound, and (B) a silicone-compatible photo-initiator comprising a compound selected from the following: (B-1) an alpha-hydroxyacetophenone, (B-2) a combination of an alpha-hydroxyacetophenone and an alpha-aminoalkylphenone, or (B-3) a combination of an alpha-hydroxyacetophenone and a mono-acylphosphine oxide, wherein the ratio between the thiol groups and alkenyl groups (SH/Vi ratio) included in the organopolysiloxane composition is 0.6 or more.

公开(公告)号：US20230348635A1

公开(公告)日：2023-11-02

申请号：US17731605

申请日：2022-04-28

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Colin HAYES ,  Michael K. GALLAGHER ,  Gregory PROKOPOWICZ

IPC: C08F12/12 ,  C08F2/06

CPC classification number: C08F12/12 ,  C08F2/06 ,  H01B3/18

Abstract: There is provided a resin composition from a mixture including: (a) 60-90 weight % of at least one thermosetting resin; and (b) 10-40 weight % of at least one aryl ether resin. The resin composition can be used in electronics applications.

公开(公告)号：US20230314934A1

公开(公告)日：2023-10-05

申请号：US17710126

申请日：2022-03-31

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Emad Aqad ,  Jong Keun Park ,  Yinjie Cen ,  Choong-Bong Lee

IPC: G03F7/004 ,  C07C381/12 ,  C07C255/19 ,  C07C57/42

CPC classification number: G03F7/0045 ,  C07C381/12 ,  C07C255/19 ,  C07C57/42

Abstract: A photoactive compound of formula (1a) or (1b):




wherein R1 is substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C3-30 heterocycloalkyl, substituted or unsubstituted C6-30 aryl, or substituted or unsubstituted C3-30 heteroaryl comprising an aromatic ring heteroatom chosen from nitrogen, oxygen, or a combination thereof; R2 and R3 are as provided herein; R4 is substituted or unsubstituted C1-30 alkyl, substituted or unsubstituted C3-30 cycloalkyl, substituted or unsubstituted C3-30 heterocycloalkyl, substituted or unsubstituted C6-30 aryl, or substituted or unsubstituted C3-30 heteroaryl; and M+ is an organic cation.