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公开(公告)号:US12110304B2
公开(公告)日:2024-10-08
申请号:US16977734
申请日:2019-03-05
申请人: TOSOH CORPORATION
IPC分类号: C07F9/24 , C08K5/5399 , C08L71/02
CPC分类号: C07F9/24 , C08K5/5399 , C08L71/02
摘要: Provided are a divalent phosphazenium salt which is neutral and is excellent in thermal stability and aldehyde scavenging ability, and a method for producing the same. Also provided are a polyalkylene oxide composition having a volatile aldehyde amount reduced, having generation of odor and turbidity suppressed and being excellent in urethanization reactivity, and a method for producing such a polyalkylene oxide composition, as well as a polyurethane-forming composition containing the polyalkylene oxide composition. A divalent phosphazenium salt having a specific structure. Also, a polyalkylene oxide composition comprising a divalent phosphazenium salt having a specific structure and a polyalkylene oxide, a method for producing the same, and a polyurethane-forming composition containing the same.
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2.
公开(公告)号:US20240304802A1
公开(公告)日:2024-09-12
申请号:US18259076
申请日:2021-12-21
申请人: TOSOH CORPORATION
发明人: Naoto SUZUKI , Yasuhiro FUJII , Jun TANIGUCHI
CPC分类号: H01M4/505 , C01B25/45 , C01G45/1214 , H01M4/5825 , C01P2002/32 , C01P2004/61 , C01P2006/12 , C01P2006/40 , H01M2004/028
摘要: Provided is a lithium secondary battery having excellent charge-discharge cycle performance at high temperatures and having low resistance and high power. A spinel-type lithium manganese oxide including a phosphate, the spinel-type lithium manganese oxide being represented by chemical formula: Li1+XMn2−X−YMYO4 (where 0.02≤X≤0.20, 0.05≤Y≤0.30, and M represents Al or Mg), wherein the volume of pores having a size of 0.6 μm or less is 0.003 cm3/g or more and 0.2 cm3/g or less, and the relative standard deviation of size of secondary particles is 25% or more and 45% or less, a method for producing the spinel-type lithium manganese oxide and applications of the spinel-type lithium manganese oxide.
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3.
公开(公告)号:US20240279518A1
公开(公告)日:2024-08-22
申请号:US18567211
申请日:2022-06-08
申请人: TOSOH CORPORATION
发明人: Yuji SHINOZUKA
IPC分类号: C09J175/08 , C08G18/12 , C08G18/32
CPC分类号: C09J175/08 , C08G18/12 , C08G18/3212 , C08G18/329 , C08G2170/00
摘要: A urethane resin-forming composition including: a main agent (A); and a curing agent (B), in which the main agent (A) contains an isocyanate group-terminated prepolymer (A-1) which is a reaction product of a component (a) containing a polyol (a-1) having a number average molecular weight of 2,500 or more and a polyisocyanate (a-2), the curing agent (B) contains at least one diol (B-1) selected from the group consisting of an aliphatic diol and an alicyclic diol, and a diol (B-2) represented by Formula (1) below, and at least one of the component (a) and the curing agent (B) contains a polyfunctional component.
[In the formula, L is a trivalent group consisting of one or more atoms selected from the group consisting of a carbon atom, a hydrogen atom, a nitrogen atom, and an oxygen atom, and R is a group having at least one ring structure selected from the group consisting of an alicyclic structure, an aromatic ring, and a heterocyclic ring.]-
公开(公告)号:US20240279393A1
公开(公告)日:2024-08-22
申请号:US18439596
申请日:2024-02-12
申请人: TOSOH CORPORATION
发明人: Kohei HONDA
IPC分类号: C08G64/30 , C08G18/44 , C09D175/06
CPC分类号: C08G64/305 , C08G18/44 , C09D175/06 , C08G2150/00
摘要: A polycarbonate diol having a repeating unit (A) of a carbonate structure, and containing terminal hydroxyl groups, wherein
90 to 100 mol % of the repeating unit (A) is a repeating unit (B) of a 3-methylpentan-1,5-diyl group-containing carbonate structure and/or a repeating unit (C) of a 1,6-hexanediyl group-containing carbonate structure,
the polycarbonate diol contains a polycarbonate diol (D) represented by the following formula (D),
a number average molecular weight calculated from a hydroxyl value of the polycarbonate diol is 300 to 2800 g/mol, and
in an LC spectrum measured for the polycarbonate diol, when X0 represents the number of repeating units of the polycarbonate diol (D) corresponding to a peak of molecular weight closest to the above number average molecular weight, the number of consecutive peaks at each of which a peak area value ratio to an area value of the peak at which the number of repeating units is X0 is 0.90 to 1.10 is 2 to 7, including the peak at which the number of repeating units is X0,
wherein R1 represents —(CH2)6— or —CH2CH2CH(CH3)CH2CH2—.-
5.
公开(公告)号:US20240271022A1
公开(公告)日:2024-08-15
申请号:US18567334
申请日:2022-06-08
申请人: TOSOH CORPORATION
发明人: Yuji SHINOZUKA
CPC分类号: C09J175/04 , C08G18/10 , C08G18/3206 , C08G18/42 , C08G18/44 , C08G18/4854 , C08G18/7671
摘要: A urethane resin-forming composition including: a main agent (A); and a curing agent (B), in which the main agent (A) contains an isocyanate group-terminated prepolymer (A-1) which is a reaction product of a component (a) containing one or more polyols (a-1) selected from the group consisting of a polyether polyol (a-1-1) and a polycarbonate polyol (a-1-2) and a polyisocyanate (a-2), the curing agent (B) contains an alicyclic diol (B-1), and the urethane resin-forming composition forms a urethane resin having a urethane group concentration of 2,800 mmol/kg or more.
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公开(公告)号:US20240254335A1
公开(公告)日:2024-08-01
申请号:US18291077
申请日:2022-07-13
申请人: TOSOH CORPORATION
发明人: Nobuhiro YAMAMOTO , Naoki YAMANO
CPC分类号: C08L81/02 , C08K5/20 , C08K7/14 , C08L23/0869 , C08L23/26 , C08L91/06 , C08L2201/08
摘要: A polyarylene sulfide composition having excellent mechanical characteristics, acid resistance and heat/cold resistance is provided. A polyarylene sulfide composition comprising from 30 to 70 wt % of polyarylene sulfide (A), from 2 to 10 wt % of an ethylene polymer (B) and from 20 to 60 wt % of glass fiber (C), wherein the glass fiber (C) has a boron oxide content of at most 1.5 wt % and a fluorine content of at most 0.1 wt %.
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7.
公开(公告)号:US20240251665A1
公开(公告)日:2024-07-25
申请号:US18285084
申请日:2022-03-31
申请人: TOSOH CORPORATION
发明人: Masaya HIRANO , Naoki MATSUMOTO , Hirokazu SHINYA , Shintaro NOMURA , Hiroyuki KAWASHIMA , Kenji KOIKE
IPC分类号: H10K85/60 , C07D209/88 , C07D405/04 , C07D405/10 , C07D405/12 , C07D405/14 , C07D409/04 , C07D409/10 , C07D409/12 , C07D409/14 , C09K11/06 , H10K50/15 , H10K50/17 , H10K85/40
CPC分类号: H10K85/636 , C07D209/88 , C07D405/04 , C07D405/10 , C07D405/12 , C07D405/14 , C07D409/04 , C07D409/10 , C07D409/12 , C07D409/14 , C09K11/06 , H10K85/40 , H10K85/633 , C09K2211/1018 , H10K50/15 , H10K50/17 , H10K85/615 , H10K85/622 , H10K85/624 , H10K85/626 , H10K85/6572 , H10K85/6574 , H10K85/6576
摘要: There is provided a transverse current suppressing material that suppresses a transverse current of an organic electroluminescent element, a carbazole compound, a hole-injection layer containing the transverse current suppressing material and the carbazole compound and an organic electroluminescent element that has good drive voltage, luminous efficiency and durability and has a lower transverse current. A transverse current suppressing material for an organic electroluminescent element, represented by the formula (1) [In the formula (1), A is represented by the formula (2) or (3), and B is represented by the formula (4)].
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公开(公告)号:US12023659B2
公开(公告)日:2024-07-02
申请号:US17552941
申请日:2021-12-16
申请人: TOSOH CORPORATION
CPC分类号: B01J29/7015 , B01J29/763
摘要: CHA-type zeolite in which the molar ratio of silica to alumina is less than 13, and the content of sodium is 100 ppm or more and 2000 ppm or less is provided. Such a CHA-type zeolite is obtained by a manufacturing method including obtaining a crystallized product by crystallizing a composition which includes a structure-directing agent source containing at least N,N,N-trialkylcyclohexylammonium cation, an alumina source, a silica source, a sodium source, and water and in which the molar ratio of silica to alumina is 20 or less and in which the molar ratio of potassium to sodium is less than 0.05, removing N,N,N-trialkylcyclohexylammonium cation from the crystallized product, and contacting the crystallized product with an ammonium-salt-containing solution having an ammonium concentration of 1 mass percent or more.
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公开(公告)号:US20240175116A1
公开(公告)日:2024-05-30
申请号:US18552439
申请日:2022-03-25
申请人: TOSOH CORPORATION
发明人: Hiroyuki HARA , Masami MESUDA , Ayaka MASUDA
CPC分类号: C23C14/0682 , C23C14/3407
摘要: A Cr—Si film contains chromium (Cr) and silicon (Si). In the Cr—Si film, a composition range of the film is Cr/(Cr+Si)=0.25 to 0.75, and absolute values of TCR in increments of 10° C. in a temperature range of 40° C. to 150° C. are each 0 ppm/° C. or more and 100 ppm/° C. or less.
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公开(公告)号:US20240158660A1
公开(公告)日:2024-05-16
申请号:US18284359
申请日:2022-03-23
申请人: TOSOH CORPORATION
发明人: Yusuke NEZU , Shinya IMATOMI , Shimou CHINSON , Hiroyuki ITO
IPC分类号: C09D125/08 , C09D133/02
CPC分类号: C09D125/08 , C09D133/02
摘要: It is possible to provide a surface treatment agent containing a cell-adhesive polymer, by a surface treatment agent obtained by dissolving a water-insoluble polymer compound including constituents of (A) a monomer having a functional group exhibiting acidity and (B) a monomer having a HLB value (a Griffin's method) in a range of 0 to 5.0, in which a ratio of (A) is 10 to 50 mol %, and a solvent is an alcoholic solvent.
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