Molecular glass of spirofluorene derivative, preparation method thereof and use thereof in photo-etching
    8.
    发明授权
    Molecular glass of spirofluorene derivative, preparation method thereof and use thereof in photo-etching 有权
    螺芴衍生物的分子玻璃,其制备方法及其在光蚀刻中的应用

    公开(公告)号:US09290435B2

    公开(公告)日:2016-03-22

    申请号:US14762260

    申请日:2013-01-22

    摘要: Disclosed is a molecular glass of a spirofluorene derivative having a molecular structure as follows: formula (I), wherein each of R1-R12 is a hydrogen atom, a hydroxyl group, a methoxyl group or an acid-sensitive substituent; substituents R1˜R12 can be identical or different, but on the same benzene ring the substituents cannot all be hydrogen atoms. The molecular glass has a good solubility in various polar solvents, is suitable to be made into a film; meanwhile the molecular glass has a very high glass transition temperature and meets the requirements of the photolithography processing technology. Also disclosed is a preparation method of the above-mentioned molecular glass of a spirofluorene derivative. The synthetic process of the method is simple and suitable for industrialization. Further disclosed is the use of a photo-resist with the above-mentioned molecular glass as a main material in photo-etching, wherein the molecular glass of a spirofluorene derivative with hydroxyl groups (or partly with hydroxyl groups) on the periphery thereof can be used as a negative photo-resist, and the molecular glass with the hydroxyl groups on the periphery thereof protected (or partly protected) by an acid-sensitive substituent can be used as a positive photo-resist.

    摘要翻译: 公开了具有如下分子结构的螺芴衍生物的分子玻璃:式(I),其中R 1 -R 12是氢原子,羟基,甲氧基或酸敏感性取代基; 取代基R 1〜R 12可以相同或不同,但在相同的苯环上,取代基不能都是氢原子。 分子玻璃在各种极性溶剂中具有良好的溶解性,适于制成薄膜; 同时分子玻璃具有非常高的玻璃化转变温度,并且满足光刻加工技术的要求。 还公开了上述分子玻璃的螺芴衍生物的制备方法。 该方法的合成过程简单,适用于工业化。 进一步公开的是在光蚀刻中使用上述分子玻璃作为主要材料的光致抗蚀剂,其中具有在其周边具有羟基(或部分具有羟基)的螺芴衍生物的分子玻璃可以是 用作负光致抗蚀剂,并且通过酸敏感性取代基保护(或部分保护)其周边具有羟基的分子玻璃可以用作正光致抗蚀剂。

    LASER MICRO/NANO PROCESSING SYSTEM AND METHOD
    10.
    发明申请
    LASER MICRO/NANO PROCESSING SYSTEM AND METHOD 有权
    激光微/纳米加工系统和方法

    公开(公告)号:US20130183833A1

    公开(公告)日:2013-07-18

    申请号:US13824634

    申请日:2011-09-15

    摘要: A laser micro/nano processing system (100, 200, 300, 400) comprises: a laser light source used to provide a first laser beam having a first wavelength and a second laser beam having a second wavelength different from the first wavelength, with the pulse width of the first laser beam being in the range from a nanosecond to a femtosecond; an optical focusing assembly used to focus the first laser beam and the second laser beam to the same focal point; and a micro mobile platform (21) controlled by a computer. Also disclosed are a method for micro/nano-processing photosensitive materials with a laser and a method for fabricating a device with a micro/nano structure using laser two-photon direct writing technology. In the system and methods, spatial and temporal overlapping of two laser beams is utilized, so as to obtain a micro/nano structure with a processing resolution higher than that of a single laser beam, using an average power lower than that of a single laser beam.

    摘要翻译: 激光微/纳米处理系统(100,200,300,400)包括:激光源,用于提供具有第一波长的第一激光束和具有不同于第一波长的第二波长的第二激光束,其中 第一激光束的脉冲宽度在从纳秒到飞秒的范围内; 用于将第一激光束和第二激光束聚焦到同一焦点的光学聚焦组件; 和由计算机控制的微型移动平台(21)。 还公开了一种用于具有激光的微/纳米处理感光材料的方法和使用激光双光子直写技术制造具有微/纳米结构的器件的方法。 在系统和方法中,利用两个激光束的空间和时间重叠,以获得具有比单个激光束高的处理分辨率的微/纳米结构,使用比单个激光器的平均功率更低的平均功率 光束。