Optical patterning mask and method of fabricating display device using the same
    6.
    发明授权
    Optical patterning mask and method of fabricating display device using the same 有权
    光学图案掩模和使用其形成显示装置的方法

    公开(公告)号:US09397297B2

    公开(公告)日:2016-07-19

    申请号:US14621937

    申请日:2015-02-13

    Inventor: Young Gil Kwon

    CPC classification number: H01L51/0013 B41M5/42 B41M5/426 B41M5/48

    Abstract: An optical patterning mask, including a base substrate, a reflective layer disposed on the base substrate, the reflective layer including a first opening, a shadow pattern disposed on the base substrate and in the first opening, a thermal insulation layer disposed on the base substrate and covering the reflective layer and the shadow pattern, an absorption layer disposed on the thermal insulation layer, a bank layer disposed on the absorption layer, the bank layer including a second opening overlapping the first opening, a thermal conduction prevention pattern disposed on the absorption layer and overlapping the shadow pattern, and a transfer layer disposed on the absorption layer, the bank layer, and the thermal conduction prevention pattern.

    Abstract translation: 一种光学图案掩模,包括基底基板,设置在基底基板上的反射层,反射层包括第一开口,阴影图案,设置在基底基板上和第一开口中,设置在基底基板上的绝热层 并且覆盖反射层和阴影图案,设置在绝热层上的吸收层,设置在吸收层上的堤层,堤层包括与第一开口重叠的第二开口,布置在吸收层上的导热防止图案 并且重叠阴影图案,以及设置在吸收层,堤层和导热防止图案上的转印层。

    OPTICAL PATTERNING MASK AND METHOD FOR FABRICATING DISPLAY DEVICE USING THE SAME
    7.
    发明申请
    OPTICAL PATTERNING MASK AND METHOD FOR FABRICATING DISPLAY DEVICE USING THE SAME 有权
    光学图案掩模和使用其制造显示器件的方法

    公开(公告)号:US20160118630A1

    公开(公告)日:2016-04-28

    申请号:US14680054

    申请日:2015-04-06

    Abstract: The optical patterning mask had a protection layer on a light absorption layer. It prevents the light absorption layer from damaged by the cleaning gas when processing the used optical patterning mask for reuse. The protection layer may be made of the same material as bank layer or of material different from the bank layer. The bank layer defines the boundary of the area to be transferred in the transfer layer. The protection layer of the present invention can maintain longer the transfer efficiency of the optical patterning mask, even when the same mask is used repeatedly after cleaning, since the light absorption layer protected from cleaning process can maintain longer its heat conversion property.

    Abstract translation: 光学图案掩模在光吸收层上具有保护层。 当处理所使用的光学图案掩模以重新使用时,防止光吸收层被清洁气体损坏。 保护层可以由与堤层或不同于堤层的材料相同的材料制成。 银行层定义要在转移层中转移的区域的边界。 即使在清洁后重复使用相同的掩模,本发明的保护层可以保持更长的光学图案掩模的转印效率,因为防止清洁过程的光吸收层可以保持其热转换性能更长。

    DONOR SUBSTRATE FOR LASER INDUCED THERMAL IMAGING, METHOD OF LASER INDUCED THERMAL IMAGING AND METHOD OF MANUFACTURING AN ORGANIC LIGHT EMITTING DISPLAY DEVICE USING THE SAME
    10.
    发明申请
    DONOR SUBSTRATE FOR LASER INDUCED THERMAL IMAGING, METHOD OF LASER INDUCED THERMAL IMAGING AND METHOD OF MANUFACTURING AN ORGANIC LIGHT EMITTING DISPLAY DEVICE USING THE SAME 有权
    用于激光诱发热成像的激光器基板,激光感应热成像方法和使用其制造有机发光显示器件的方法

    公开(公告)号:US20140323007A1

    公开(公告)日:2014-10-30

    申请号:US14046103

    申请日:2013-10-04

    Inventor: Jung-Hoon YEON

    Abstract: A donor substrate, a method of laser induced thermal imaging, and a method of manufacturing an organic light emitting display device are disclosed. In the method of laser induced thermal imaging, a donor substrate is provided to include a base substrate, a light to heat conversion layer, a transfer layer and a functional layer. The functional layer includes a material radiating an infrared light. The donor substrate is laminated to an acceptor substrate. A laser beam is radiated into the donor substrate, thereby forming an organic layer pattern on the acceptor substrate from the transfer layer. A position of the organic layer pattern is observed using an infrared microscope. A laser beam position is adjusted and the donor substrate is separated from the acceptor substrate.

    Abstract translation: 公开了供体衬底,激光诱导热成像方法和制造有机发光显示装置的方法。 在激光诱导热成像的方法中,提供施主衬底以包括基底衬底,光热转换层,转移层和功能层。 功能层包括辐射红外光的材料。 将施主衬底层压到受主衬底上。 激光束被辐射到施主衬底中,从而在转移层上在受主衬底上形成有机层图案。 使用红外显微镜观察有机层图案的位置。 调整激光束位置,并且将供体衬底与受主衬底分离。

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