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102 条记录 (耗时 0.027 秒)

    APPARATUS FOR DUAL SPEED SPIN CHUCK
    2.
    发明申请
    APPARATUS FOR DUAL SPEED SPIN CHUCK 有权
    双速旋转卡的装置

    公开(公告)号：US20150037499A1

    公开(公告)日：2015-02-05

    申请号：US14445736

    申请日：2014-07-29

    申请人： Solid State Equipment LLC

    发明人： William Gilbert Breingan ,  James K. Anders ,  Herman Itzkowitz

    IPC分类号： H01L21/683 ,  B05C11/08 ,  B05C13/00 ,  B05D1/00

    CPC分类号： B05C13/00 ,  B05C1/08 ,  B05D1/005 ,  C23C14/505 ,  C23C16/4585 ,  C23C16/4588 ,  H01L21/6838 ,  H01L21/68792

    摘要： A spin chuck according to the present invention is provided and is configured to eliminate the wrap of chemical over the wafer edge. The dual speed wafer spin chuck apparatus acts to prevent liquids from affecting the backside of a wafer during processing. An outer ring is placed around the wafer with a narrow gap between the two such that drops of liquid on the surface of the wafer will touch the outer ring as they move to the outermost edge of the wafer. By spinning this outer ring at high speed, centrifugal force causes these drops to be pulled off of the wafer and flung radially outward, thus preventing the liquid from affecting the backside of the wafer,

    摘要翻译： 提供了根据本发明的旋转卡盘，并且被配置为消除化学品在晶片边缘上的包裹。 双速晶片旋转卡盘装置用于防止液体在加工期间影响晶片的背面。 在晶片周围放置一个外环，其间具有窄的间隙，使得当晶片表面移动到晶片的最外边缘时，晶片表面上的液滴将接触外环。 通过高速旋转该外圈，离心力使这些液滴从晶片上拉出并径向向外排出，从而防止液体影响晶片的背面，

    STABLE WAFER-CARRIER SYSTEM
    3.
    发明申请
    STABLE WAFER-CARRIER SYSTEM 有权
    稳定的载波系统

    公开(公告)号：US20110283941A1

    公开(公告)日：2011-11-24

    申请号：US12963445

    申请日：2010-12-08

    申请人： Yan Rozenzon ,  Robert T. Trujillo ,  Steven C. Beese

    发明人： Yan Rozenzon ,  Robert T. Trujillo ,  Steven C. Beese

    IPC分类号： C23C16/00 ,  B05C13/00

    CPC分类号： C23C16/4588 ,  C23C16/24 ,  C30B29/06 ,  C30B35/005

    摘要： One embodiment of the present invention provides a wafer-carrier system used in a deposition chamber for carrying wafers. The wafer-carrier system includes a base susceptor and a top susceptor nested inside the base susceptor with its wafer-mounting side facing the base susceptor's wafer-mounting side, thereby forming a substantially enclosed narrow channel. The base susceptor provides an upward support to the top susceptor.

    摘要翻译： 本发明的一个实施例提供了用于承载晶片的沉积室中使用的晶片载体系统。 晶片载体系统包括嵌入在基座内部的基座和顶部基座，其底部基座的晶片安装侧面向基座的晶片安装侧，从而形成基本封闭的窄通道。 基座为顶部感受器提供向上的支撑。

    CONVEYOR ASSEMBLY AND METHOD FOR CONVEYING A SUBSTRATE CARRIER
    4.
    发明申请
    CONVEYOR ASSEMBLY AND METHOD FOR CONVEYING A SUBSTRATE CARRIER 有权
    输送机组件和输送基板载体的方法

    公开(公告)号：US20110206485A1

    公开(公告)日：2011-08-25

    申请号：US13059890

    申请日：2009-08-21

    申请人： Eduard Renier Francisca Clerkx ,  Ernst Dullemeijer ,  Franciscus Cornelius Dings

    发明人： Eduard Renier Francisca Clerkx ,  Ernst Dullemeijer ,  Franciscus Cornelius Dings

    IPC分类号： B65G17/12 ,  B65G47/00

    CPC分类号： B65G47/646 ,  B65G47/644 ,  B65G47/645 ,  B65G49/064 ,  B65G2249/02 ,  C23C14/505 ,  C23C14/562 ,  C23C16/4588 ,  C23C16/545 ,  H01L21/67173 ,  H01L21/67271 ,  H01L21/67748 ,  Y10S414/139

    摘要： A conveyor assembly suitable for use in a substrate processing system includes: at least one substrate carrier having a substrate-carrying surface configured to support at least one substrate; a processing track; a return track; a drive system configured to drive the substrate carrier along the processing track and the return track; and at least one swivel unit configured to pivot the substrate carrier around a substantially horizontal axis from a first orientation into a second orientation, and/or vice versa. Also provided is a method for conveying a substrate carrier including: providing a substrate carrier; positioning the substrate carrier in a first orientation; conveying the substrate carrier along a first track; and rotating the substrate carrier around a substantially horizontal axis into a second orientation.

    摘要翻译： 适用于基板处理系统的输送机组件包括：至少一个基板载体，其具有构造成支撑至少一个基板的基板承载表面; 加工轨道 返回轨道 驱动系统，被配置为沿着所述处理轨道和所述返回轨道驱动所述衬底载体; 以及至少一个旋转单元，其构造成将基板载体围绕基本水平的轴线从第一取向枢转到第二取向，和/或反之亦然。 还提供了一种用于输送基板载体的方法，包括：提供基板载体; 将衬底载体定位在第一取向; 沿着第一轨道传送所述衬底载体; 以及将基底载体围绕基本上水平的轴线旋转成第二取向。

    Modified susceptor for barrel reactor
    5.
    发明授权
    Modified susceptor for barrel reactor 有权
    桶式反应器改良感受器

    公开(公告)号：US07462246B2

    公开(公告)日：2008-12-09

    申请号：US11107444

    申请日：2005-04-15

    申请人： Lance G. Hellwig

    发明人： Lance G. Hellwig

    IPC分类号： C23C16/00

    CPC分类号： C30B25/12 ,  C23C16/4588 ,  Y10S156/917

    摘要： A susceptor for supporting wafers during an chemical vapor deposition process. The susceptor has recesses and orifices disposed in the recesses extending to a central passage of the susceptor. The susceptor has exhaust openings disposed in the top of the susceptor to allow gas from the central passage of the susceptor to exit out the openings. A baffle plate covers the exhaust openings and a vertical space is created between the baffle plate and the top of the susceptor to allow gas to exit from the central passage to outside the susceptor. The bottom of the susceptor also has exhaust openings disposed therein. These openings allow gas from the central passage to exit the susceptor.

    摘要翻译： 用于在化学气相沉积工艺期间支撑晶片的感受体。 基座具有设置在延伸到基座的中心通道的凹部中的凹部和孔口。 基座具有设置在基座顶部的排气口，以允许来自基座的中心通道的气体从出口排出。 挡板覆盖排气口，并且在挡板和基座的顶部之间形成垂直空间，以允许气体从中心通道离开基座的外部。 基座的底部还具有设置在其中的排气口。 这些开口允许来自中央通道的气体离开基座。

    Susceptor with epitaxial growth control devices and epitaxial reactor using the same
    7.
    发明授权
    Susceptor with epitaxial growth control devices and epitaxial reactor using the same 失效
    具有外延生长控制装置和外延反应器的受体与其相同

    公开(公告)号：US07153368B2

    公开(公告)日：2006-12-26

    申请号：US10488343

    申请日：2002-09-05

    申请人： Franco Preti ,  Srinivas Yarlagadda

    发明人： Franco Preti ,  Srinivas Yarlagadda

    IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306

    CPC分类号： C23C16/45589 ,  C23C16/4588 ,  C30B25/12

    摘要： A susceptor (1) for epitaxial growth reactors comprises a body (2) having a lower base (3), an upper top (4) and some substantially flat side faces (5); the side faces are adapted to receive, in predetermined areas (6), substrates on which the epitaxial growth develops; body (2) is provided with edge side regions (7) defined by couples of adjacent side faces (5); along edge side regions (7) in the upper part of body (2) there are provided first ribs (8) adapted to control the flow of reaction gases along side faces (5); along edge side regions (7) in the lower part of body (2) there are provided second ribs (9) adapted to control the flow of reaction gases along side faces (5).

    摘要翻译： 用于外延生长反应器的感受体（1）包括具有下基部（3），上顶部（4）和一些基本平坦的侧面（5）的主体（2）。 侧面适于在预定区域（6）中接收外延生长所形成的衬底; 主体（2）设置有由相邻侧面（5）的耦合限定的边缘侧区域（7）; 沿着主体（2）的上部中的边缘侧区域（7）设置有适于控制沿着侧面（5）的反应气体流动的第一肋（8）。 沿着主体（2）的下部中的边缘侧区域（7）设置有适于控制沿侧面（5）的反应气体的流动的第二肋（9）。

    Barrel type susceptor
    8.
    发明申请
    Barrel type susceptor 失效
    桶形基座

    公开(公告)号：US20050160991A1

    公开(公告)日：2005-07-28

    申请号：US11017711

    申请日：2004-12-22

    申请人： Toshikazu Miyamoto ,  Tadashi Ohashi

    发明人： Toshikazu Miyamoto ,  Tadashi Ohashi

    IPC分类号： C23C16/458 ,  C23C16/00 ,  H01L21/205

    CPC分类号： C30B35/00 ,  C23C16/4581 ,  C23C16/4588 ,  C30B23/02 ,  C30B25/02

    摘要： The barrel type susceptor for use in the semiconductor epitaxial growth is characterized in that a face plate 5 of a susceptor main body 2 having the shape of a truncated cone is partitioned into two or more in a longitudinal direction thereof, each partition being provided with a wafer mounting concave portion 6a, 6b, 6c on which a wafer is laid, and the inclination angle θa, θb, θc of a bottom face 6a1, 6b1, 6c1 of the concave portion for each partition to the vertical line is gradually decreased in each partition from the upper part to the lower part.

    摘要翻译： 用于半导体外延生长的桶型感受体的特征在于，具有截头圆锥形状的基座主体2的面板5在其纵向被分隔成两个或更多个，每个隔板设置有 在其上放置晶片的晶片安装凹部6a，6b，6c以及底面6a，6b1，...的倾斜角度θa，tab， 每个分隔物的垂直线的凹部的直径的比例从上部到下部逐渐减小。

    Platform assembly and method
    9.
    发明申请
    Platform assembly and method 审中-公开
    平台装配和方法

    公开(公告)号：US20050126497A1

    公开(公告)日：2005-06-16

    申请号：US10955899

    申请日：2004-09-30

    申请人： Jerry Kidd ,  Danny Caudle

    发明人： Jerry Kidd ,  Danny Caudle

    IPC分类号： B05B13/02 ,  B05D3/12 ,  C23C14/50 ,  C23C16/00 ,  C23C16/458

    CPC分类号： C23C16/4588 ,  B05B13/0228 ,  B05B13/0242 ,  C23C14/505

    摘要： An exemplary platform assembly and method is provided to facilitate a uniform deposition of a depositant on substrates. The platform assembly can include a platform, satellite tables, and an actuator. The platform moves upon a support structure, while the satellite tables, supporting the substrates, rotate on the platform. The actuator moves the platform and satellite tables, presenting the substrate to the depositant dispenser. A resistance to movement of the platform forces a rotation of the satellite tables. Additionally, a method is provided that includes positioning a platform on a support structure and positioning the substrates on the satellite tables. The platform is then moved within a dispersion area of the depositant dispenser. A stationary gear, coupled to the support structure, resists motion of the platform, thereby forcing each of the plurality of satellite tables to rotate.

    摘要翻译： 提供了一种示例性的平台组件和方法，以便于沉积物在基底上的均匀沉积。 平台组件可以包括平台，卫星台和致动器。 平台在支撑结构上移动，而支撑基板的卫星台在平台上旋转。 执行器移动平台和卫星台，将基板呈现给定型机分配器。 平台的运动阻力迫使卫星台的旋转。 此外，提供了一种方法，其包括将平台定位在支撑结构上并将基板定位在卫星台上。 然后将平台移动到沉积物分配器的分散区域内。 耦合到支撑结构的固定齿轮抵抗平台的运动，从而迫使多个卫星表中的每一个旋转。