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    AN AQUEOUS BASIC ETCHING COMPOSITION FOR THE TREATMENT OF SURFACES OF METAL SUBSTRATES
    1.
    发明公开
    AN AQUEOUS BASIC ETCHING COMPOSITION FOR THE TREATMENT OF SURFACES OF METAL SUBSTRATES 审中-公开

    公开(公告)号：US20230220558A1

    公开(公告)日：2023-07-13

    申请号：US18000480

    申请日：2021-06-10

    Applicant: Atotech Deutschland GmbH & Co. KG

    Inventor： Lars KOHLMANN ,  Heiko BRUNNER

    IPC: C23F1/34 ,  C23F1/46

    CPC classification number: C23F1/34 ,  C23F1/46

    Abstract: An aqueous etching composition comprising:

    (a) functionalized urea, biuret and guanidine derivatives and/or salts thereof selected from compounds having formulae I or II:






    wherein

    X and Y are independently selected from oxygen, NRR′ and NR5,
    R, R′ and R5 are independently selected from R1, hydrogen, polyethylene glycols, aromatic compounds, and C1-C4 alkyl, wherein the aromatic compounds and C1-C4 alkyl optionally comprise at least one substituent selected as OR6,
    R6 is selected from hydrogen and C1-C4alkyl,
    X and Y can be identical or different;
    R1 and R2 are independently selected from hydrogen, alkyl compounds, amines, and nitrogen-comprising heteroaromatic compounds,
    R1 and R2 can be identical or different, with the proviso that R1 cannot be hydrogen,
    and with the proviso that in compounds having formula I R1 cannot be hydrogen or alkyl compound if X is oxygen;
    m is an integer from 1 to 4, and
    n is an integer from 0 to 8;
    wherein m and n can be identical or different;


    (b) an oxidizing agent; and
    wherein the composition comprises a pH from 7.1 to 14.

    WET ETCHING EQUIPMENT AND WET ETCHING METHOD
    4.
    发明申请
    WET ETCHING EQUIPMENT AND WET ETCHING METHOD 审中-公开

    公开(公告)号：US20180051378A1

    公开(公告)日：2018-02-22

    申请号：US15534587

    申请日：2016-05-25

    Applicant: BOE Technology Group Co., Ltd.

    Inventor： Dapeng Xue

    IPC: C23F1/08 ,  C23F1/46 ,  H01L21/67 ,  H01L21/677

    CPC classification number: C23F1/08 ,  C23F1/46 ,  H01L21/6708 ,  H01L21/67253 ,  H01L21/677

    Abstract: Embodiments of the present disclosure disclose a wet etching equipment and a wet etching method. The wet etching equipment includes a metal ion concentration adjusting device configured to adjust the concentration of metal ions in an etching solution, a sprinkler which is connected to the metal ion concentration adjusting device and configured to spray the etching solution. Embodiments of the present disclosure also disclose a wet etching method, comprising steps as follows: adjusting a concentration of metal ions in an etching solution so that an etching rate of a metal to be etched is kept stable; spraying the adjusted etching solution onto the metal to be etched.

    METHOD FOR ELECTROLYTIC RECYCLING AND REGENERATING ACIDIC CUPRIC CHLORIDE ETCHANTS
    6.
    发明申请
    METHOD FOR ELECTROLYTIC RECYCLING AND REGENERATING ACIDIC CUPRIC CHLORIDE ETCHANTS 审中-公开
    电解回收和再生酸性氯化铜蚀刻剂的方法

    公开(公告)号：US20170058408A1

    公开(公告)日：2017-03-02

    申请号：US15252189

    申请日：2016-08-30

    Applicant: Yiting YE

    Inventor： Yiting YE

    IPC: C25B1/26 ,  C25B15/08 ,  H05K3/00 ,  C25B1/22

    CPC classification number: C25B1/26 ,  C23F1/46 ,  C25B1/22 ,  C25B15/08 ,  C25C1/12 ,  H05K3/067 ,  Y02P10/212

    Abstract: A method for electrolytic recycling and regenerating acidic cupric chloride etchants, comprising: (1) employing an acidic cupric chloride etchant that contains iron ions in PCB etching, controlling the oxidation-reduction potential (ORP) of said acidic cupric chloride etchant within the range of 360-700 mV; (2) transferring an etchant waste of step (1) to an electrolysis tank and electrolysing said etchant waste; (3) the chlorine gas generated by electrolysis oxidizes the electrolyte in the electrolysis tank and thereby dissolved into the electrolyte, in the effect of the ORP of the electrolyte; (4) regenerating an etchant by oxidizing Fe(II) ions and Cu(I) ions in the electrolyte to Fe(III) ions and Cu(II) ions using the chlorine gas of step (3) that is dissolved into the electrolyte, and when the chlorine gas is fully dissolved into the electrolyte, the oxidizing step of the electrolyte is finished and an etchant is regenerated; (5) transferring the etchant regenerated in step (4) to an etching production line.

    Abstract translation: 一种用于电解再循环和再生酸性氯化铜蚀刻剂的方法，包括：（1）在PCB蚀刻中使用含有铁离子的酸性氯化铜蚀刻剂，将所述酸性氯化铜蚀刻剂的氧化还原电位（ORP）控制在 360-700 mV; （2）将步骤（1）的腐蚀剂废物转移到电解槽中并电解所述蚀刻剂废物; （3）通过电解产生的氯气在电解槽中的电解质氧化，从而溶解在电解质中，由于电解液的ORP; （4）使用溶解在电解液中的步骤（3）的氯气，将电解液中的Fe（II）离子和Cu（I）离子氧化成Fe（III）离子和Cu（II）离子）再生蚀刻剂， 并且当氯气完全溶解到电解质中时，电解质的氧化步骤结束并且蚀刻剂被再生; （5）将步骤（4）中再生的蚀刻剂转移到蚀刻生产线。

    AQUEOUS COMPOSITION FOR ETCHING OF COPPER AND COPPER ALLOYS
    7.
    发明申请
    AQUEOUS COMPOSITION FOR ETCHING OF COPPER AND COPPER ALLOYS 有权
    铜和铜合金蚀刻的水性组合物

    公开(公告)号：US20150307999A1

    公开(公告)日：2015-10-29

    申请号：US14646743

    申请日：2013-07-29

    Applicant: ATOTECH DEUTSCHLAND GMBH

    Inventor： Norbert LÜTZOW ,  Gabriela SCHMIDT ,  Dirk TEWS

    IPC: C23F1/18 ,  C23F1/46 ,  H05K3/06

    CPC classification number: C23F1/18 ,  C23F1/02 ,  C23F1/46 ,  H05K3/067 ,  H05K2203/0789

    Abstract: The present invention relates to an aqueous composition for and a process for etching copper and copper alloys applying said aqueous composition. The aqueous composition comprises a source for Fe3+ ions, at least one acid, at least one triazole or tetrazole derivative, and at least one etching additive selected from N-alkylated iminodipropionic acid, salts thereof, modified polyglycol ethers and quaternary ureylene polymers. The aqueous composition is particularly useful for making of fine structures in the manufacture of printed circuit boards, IC substrates and the like.

    Abstract translation: 本发明涉及一种用于蚀刻应用所述水性组合物的铜和铜合金的水性组合物和蚀刻方法。 水性组合物包含Fe 3+离子源，至少一种酸，至少一种三唑或四唑衍生物，以及至少一种选自N-烷基化亚氨基二丙酸，其盐，改性聚乙二醇醚和季戊烯聚合物的蚀刻添加剂。 含水组合物特别可用于制造印刷电路板，IC基板等中的精细结构。

    METHOD FOR THE TREATMENT AND REUSE OF A STRIPPER SOLUTION
    10.
    发明申请
    METHOD FOR THE TREATMENT AND REUSE OF A STRIPPER SOLUTION 审中-公开
    解决方案的治疗和再利用方法

    公开(公告)号：US20100193467A1

    公开(公告)日：2010-08-05

    申请号：US12595445

    申请日：2008-04-11

    Applicant: Anders Weckman ,  Juha Jokinen

    Inventor： Anders Weckman ,  Juha Jokinen

    IPC: H05K3/00 ,  B01D21/01

    CPC classification number: C02F1/02 ,  C02F1/5272 ,  C02F1/66 ,  C02F9/00 ,  C02F2101/20 ,  C02F2103/16 ,  C02F2103/346 ,  C02F2303/16 ,  C22B3/065 ,  C22B3/165 ,  C22B3/22 ,  C22B3/44 ,  C22B7/006 ,  C22B13/045 ,  C22B25/04 ,  C23F1/46 ,  Y02P10/234

    Abstract: In the method, the spent stripper solution for tin or a tin mixture is treated to precipitate dissolved or suspended metal compounds. On the one hand chemicals for reuse, and on the other hand metals such as copper, tin, lead and/or iron are recovered from the waste water streams. Efficiency of the precipitation is improved by heating of the stripping solution at elevated temperatures, and by the addition of a precipitating reagent. Once the precipitate is removed, the remaining liquid may be reused, typically as an admixture with a fresh solution. In the production method of a regenerated stripping solution for tin comprising at least one inorganic acid, ferric ions, at least one organic acid, and at least one organic additive, the stripping solution is heated at elevated temperatures, precipitating reagent is added, precipitated matter is separated and removed, and one or some of the acids or additives mentioned are added for the recovery of the desired tin stripping capacity.

    Abstract translation: 在该方法中，处理锡或锡混合物的废汽提器溶液以沉淀溶解或悬浮的金属化合物。 一方面是用于再利用的化学品，另一方面从废水流中回收诸如铜，锡，铅和/或铁的金属。 通过在升高的温度下加热汽提溶液并通过加入沉淀试剂来提高沉淀的效率。 一旦沉淀物被除去，剩余的液体可以重复使用，通常作为与新鲜溶液的混合物。 在包含至少一种无机酸，三价铁离子，至少一种有机酸和至少一种有机添加剂的锡的再生汽提溶液的制备方法中，将提取溶液在高温下加热，加入沉淀试剂，沉淀物 被分离和除去，并且加入所提及的一种或一些酸或添加剂用于回收所需的锡剥离能力。

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