公开(公告)号：US09520204B2

公开(公告)日：2016-12-13

申请号：US14140893

申请日：2013-12-26

申请人： Varian Semiconductor Equipment Associates, Inc.

发明人： Shengwu Chang

IPC分类号： H01J23/00 ,  G21K1/14 ,  H05H5/06 ,  H01J37/317 ,  H01L21/265 ,  H05H7/08

CPC分类号： G21K1/14 ,  H01J37/3171 ,  H01J2237/002 ,  H01J2237/0048 ,  H01J2237/047 ,  H01J2237/061 ,  H01J2237/082 ,  H01L21/265 ,  H05H5/063 ,  H05H2007/088

摘要： A cold stripper for a high-energy ion implanter system is provided. The cold stripper including a stripper tube having a hollow cavity, a first aperture in the stripper tube to admit an ion beam of positively charged ions into the hollow cavity and a second aperture in the stripper tube to discharge the ion beam from the hollow cavity, a gas pump coupled to the hollow cavity to introduce a gas into the hollow cavity, one or more cooling passages in the stripper tube, and a coolant pump coupled to the one or more cooling passages to circulate a coolant through the one or more cooling passages.

摘要翻译： 提供了一种用于高能离子注入机系统的冷汽提器。 所述冷汽提器包括具有中空腔的汽提管，所述汽提管中的第一孔，用于允许带正电荷的离子的离子束进入所述中空腔，并且所述汽提管中的第二孔用于从所述中空腔排出离子束， 耦合到所述中空腔的气泵以将气体引入所述中空腔，所述汽提管中的一个或多个冷却通道和联接到所述一个或多个冷却通道的冷却剂泵，以使冷却剂循环通过所述一个或多个冷却通道 。

公开(公告)号：US09069049B2

公开(公告)日：2015-06-30

申请号：US13919926

申请日：2013-06-17

申请人： Kaonetics Technologies, Inc.

发明人： James Cornwell

IPC分类号： G01V3/00 ,  G01R33/48 ,  G01R33/28

CPC分类号： G01R33/4808 ,  F41H13/0043 ,  G01R33/28 ,  G21K1/14 ,  G21K5/00 ,  H05H3/00

摘要： Directed-energy systems and methods are described for disrupting electronic circuits, especially those containing semiconductors. A directed-energy system can include a charged particle generator configured to generate plural energized particles and a charge transformer configured to receive the plural energized particles that include charged particles and to output energized particles that include particles having substantially zero charge. The charged particle generator can be configured to direct the plural energized particles through the charge transformer in a predefined direction. A method for disrupting electronic circuits can include generating plural energized particles, directing the plural energized particles to an incident surface of a charge transformer and transforming the plural energized particles within the charge transformer. The transformed particles can be at substantially zero charge. The method can further include generating a wavefront at an exit surface of the charge transformer including the transformed particles and impinging an electronic circuit with the wavefront.

摘要翻译： 描述了用于扰乱电子电路的定向能量系统和方法，特别是那些包含半导体的电子电路。 定向能系统可以包括被配置为产生多个通电粒子的带电粒子发生器和被配置为接收包括带电粒子的多个带电粒子的电荷变换器，并输出包括具有基本零电荷的粒子的激励粒子。 带电粒子发生器可以被配置成沿预定方向引导多个通电的粒子穿过电荷变换器。 破坏电子电路的方法可以包括产生多个通电粒子，将多个通电粒子引导到电荷变换器的入射表面，并将电荷变换器内的多个通电粒子转化。 转化的颗粒可以基本上为零电荷。 该方法还可以包括在电荷变换器的出口表面处生成波前，其包括经变换的粒子并且与波前相撞的电子电路。

公开(公告)号：US08461554B1

公开(公告)日：2013-06-11

申请号：US13313078

申请日：2011-12-07

申请人： Peter F. Kurunczi ,  Christopher J. Leavitt ,  Daniel Distaso ,  Timothy J. Miller

发明人： Peter F. Kurunczi ,  Christopher J. Leavitt ,  Daniel Distaso ,  Timothy J. Miller

IPC分类号： H01J3/14

CPC分类号： H01J37/32146 ,  G21K1/14 ,  H01J37/026 ,  H01J37/3171 ,  H01J37/32412 ,  H01J37/32422 ,  H01J2237/0044

摘要： A processing system may include a plasma source for providing a plasma and a workpiece holder arranged to receive ions from the plasma. The processing system may further include a pulsed bias circuit electrically coupled to the plasma source and operable to switch a bias voltage supplied to the plasma source between a high voltage state in which the plasma source is biased positively with respect to ground and a low voltage state in which the plasma source is biased negatively with respect to the ground.

摘要翻译： 处理系统可以包括用于提供等离子体的等离子体源和布置成接收来自等离子体的离子的工件夹持器。 处理系统还可以包括电耦合到等离子体源的脉冲偏置电路，并且可操作以在提供给等离子体源的高电压状态之间切换偏置电压，其中等离子体源相对于地面被正偏置，而低电压状态 其中等离子体源相对于地面被负偏压。

公开(公告)号：US20070228294A1

公开(公告)日：2007-10-04

申请号：US11597324

申请日：2005-05-24

申请人： Hiroyuki Ito ,  Noriyuki Sakudo ,  Yuichiro Sasaki ,  Bunji Mizuno

发明人： Hiroyuki Ito ,  Noriyuki Sakudo ,  Yuichiro Sasaki ,  Bunji Mizuno

IPC分类号： G21K5/00 ,  H01J7/24

CPC分类号： H01J37/3171 ,  G21K1/14 ,  H01J37/026 ,  H01J2237/0044 ,  H01L21/26513 ,  H05H1/46

摘要： Disclosed is a charge neutralizing device which is capable of being applied to a substrate 13 having a large area and in which electrons having low energy of 5 eV or less, and preferably 2 eV, are supplied so that charge due to ion implantation and damage by the electrons are avoided with respect to a cusp device. The charge neutralizing device includes a microwave generating unit, a plasma generating unit that generates electron plasma using a microwave generated from the microwave generating unit, and a contact unit that brings the electron plasma generated from the plasma generating unit into contact with a beam plasma region including an ion beam.

摘要翻译： 公开了一种电荷中和装置，其能够施加到具有大面积的基板13，并且其中提供具有5eV或更小，优选为2eV的低能量的电子，使得由于离子注入和损坏而产生的电荷 相对于尖尖装置避免了电子。 电荷中和装置包括微波发生单元，使用由微波发生单元产生的微波产生电子等离子体的等离子体产生单元，以及将等离子体发生单元产生的电子等离子体与射束等离子体区域接触的接触单元 包括离子束。

公开(公告)号：US20030104207A1

公开(公告)日：2003-06-05

申请号：US10301566

申请日：2002-11-22

申请人： HIGH ENERGY ACCELERATOR RESEARCH ORGANIZATION.

发明人： Yoshio Arakida

IPC分类号： B32B009/00

CPC分类号： H05H6/00 ,  G21K1/14 ,  H05H7/00 ,  Y10T428/24967 ,  Y10T428/30

摘要： A foil is formed on a given substrate, then, peeled off of the substrate and floated on the water surface charged in a tank. The surface level of the water is decreased to contact the foil to a folding plate of a jug substrate and thus, fold the foil at the folding plate in two. The two surfaces of the foil opposing each other are laminated along a foil forming-supporting plate within a laminating region. The thus laminated foil is dried and annealed except the area in the vicinity of the foil forming-supporting plate, and then, cut along the folding plate, a foil acceptor and a supporting plate, to provide a stripping foil which can be supported by itself.

摘要翻译： 在给定的基板上形成箔片，然后从衬底上剥离并漂浮在装在槽中的水面上。 水的表面水平降低以将箔接触到水壶基底的折叠板，因此在折叠板上将箔折叠成两个。 彼此相对的箔的两个表面沿着层压区域内的箔形成支撑板层压。 将如此层压的箔干燥和退火，除了箔成形支撑板附近的区域，然后沿着折叠板切割箔接收器和支撑板，以提供可以自身支撑的剥离箔 。

公开(公告)号：US20020033446A1

公开(公告)日：2002-03-21

申请号：US09805237

申请日：2001-03-14

发明人： Satoshi Ichimura ,  Katsutoshi Tsuchiya ,  Tadashi Sato ,  Yoshihiko Nagamine ,  Yoshiya Higuchi

IPC分类号： H05H003/02

CPC分类号： H05H3/02 ,  G21K1/14

摘要： A neutral beam processing apparatus and method uses a neutral beam having an enlarged diameter and an increased capacity with suppressed divergence. The charged particles of the neutral beam are removed and the variations in energy are reduced. In particular, an ion beam is led from a plasma production cell and neutralized in a neutralization cell to be converted to a neutral beam, and an object to be processed is disposed in a process cell that is irradiated with the neutral beam. A multi-aperture electrode and a permanent magnet line are used for separating charged particles from the neutral beam. By an interaction between an electron cyclotron magnetic field generated by the permanent magnet line and microwaves introduced from a waveguide, a plasma and a flat space potential is generated in the neutralization cell. The neutral beam is obtained by converting the ion beam in the flat space potential.

摘要翻译： 中性束处理装置和方法使用具有扩大的直径和增加的容量并且抑制发散的中性束。 中性束的带电粒子被去除并且能量的变化减小。 特别地，将离子束从等离子体生成单元引出，并在中和单元中进行中和以转换成中性光束，将被处理物体配置在照射了中性光束的处理单元中。 多孔电极和永久磁铁线用于从中性线分离带电粒子。 通过由永久磁铁线产生的电子回旋加速器磁场与从波导引入的微波之间的相互作用，在中和电池中产生等离子体和平坦空间电位。 通过将平坦空间电位的离子束转换得到中性光束。

公开(公告)号：US5596478A

公开(公告)日：1997-01-21

申请号：US185829

申请日：1994-01-24

申请人： Tadahiro Ohmi ,  Hitoshi Inaba

发明人： Tadahiro Ohmi ,  Hitoshi Inaba

IPC分类号： C23C14/58 ,  C23C16/56 ,  G02F1/1333 ,  G21K1/14 ,  H01L21/02 ,  H01L21/265 ,  H01L21/677 ,  H05F3/06

CPC分类号： H05F3/06 ,  G21K1/14

摘要： An apparatus which can neutralize charge bodies such as processed substrates for semiconductor device and for flat display, free from electromagnetic noise, impurity contamination, and residual potentials. To process in a prescribed way a wafer(5) to be processed, the wafer(5) is, for example, moved from a pretreatment chamber(2) to a low pressure reaction chamber(3). In this case, a gas, which does not react on the wafer, such as nitrogen and argon, is introduced into the pretreatment chamber(2), and is kept under a predetermined pressure by a vacuum pump(15). Then, ultraviolet rays are projected in the pretreatment chamber(2) from an ultraviolet rays lamp(11) constituting a means for generating neutralization charge, and positive and negative floating charged particles(electrons and positive ions) are generated by exiting the atmosphere in the chamber(2). Since the charges are removed by projecting the ultraviolet rays from the outside of a case(1) and the case(2) and moreover in a non-contact way, no electromagnetic noise is generated and the residual potentials are vanished too.

摘要翻译： PCT No.PCT / JP92 / 00948 Sec。 371日期：1994年1月24日 102（e）日期1994年1月24日PCT提交1992年7月24日PCT公布。 出版物WO93 / 02467 日期：1993年2月4日，一种可以中和电荷体的装置，例如半导体器件的处理衬底和平面显示器，没有电磁噪声，杂质污染和残留电位。 为了以规定的方式处理要处理的晶片（5），晶片（5）例如从预处理室（2）移动到低压反应室（3）。 在这种情况下，将不与晶圆反应的气体（例如氮气和氩气）引入预处理室（2），并通过真空泵（15）保持在预定压力下。 然后，紫外线从构成产生中和电荷的装置的紫外线灯（11）投射到预处理室（2）中，并且通过离开空气中的气氛而产生正，负浮动带电粒子（电子和正离子） 室（2）。 由于通过从壳体（1）和壳体（2）的外部投射紫外线而且以非接触方式移除电荷，因此不会产生电磁噪声并且剩余电位也消失。

公开(公告)号：US5543615A

公开(公告)日：1996-08-06

申请号：US371775

申请日：1995-01-12

申请人： Mutsumi Saito ,  Tomoyuki Yahiro ,  Masahiro Hatakeyama

发明人： Mutsumi Saito ,  Tomoyuki Yahiro ,  Masahiro Hatakeyama

IPC分类号： G21K1/14 ,  H05H3/02

CPC分类号： G21K1/14 ,  H05H3/02

摘要： A beam charge exchanging apparatus causes the charges of charged particles in a fast particle beam to be exchanged with charges of a gas or other fluid. The apparatus includes; a gas/fluid container disposed in a vacuum and having holes which allow the fast particle beam to pass through the container, a source of gas or other fluid, and a nozzle for introducing the gas into the container. The source and the nozzle are designed to introduce a high speed gas/fluid into the container so that the fast particle beam will collide with the high speed gas/fluid in the container and the charges thereof will be exchanged such that the fast particle beam is converted into a neutral particle beam. The apparatus may further include elements for detecting the quantity of neutral particles resulting from the charge exchange by measuring the quantity of generated ionized gas as an electric current.

摘要翻译： 光束电荷交换装置使得快速粒子束中的带电粒子的电荷与气体或其它流体的电荷交换。 该装置包括： 设置在真空中并具有允许快速粒子束通过容器，气体源或其它流体的孔和用于将气体引入容器的喷嘴的气体/流体容器。 源和喷嘴被设计成将高速气体/流体引入容器中，使得快速粒子束将与容器中的高速气体/流体碰撞，并且其电荷将被更换，使得快速粒子束 转换为中性粒子束。 该装置还可以包括用于通过测量所产生的电离气体的量作为电流来检测由电荷交换产生的中性粒子的量的元件。

公开(公告)号：US5007348A

公开(公告)日：1991-04-16

申请号：US96294

申请日：1987-09-08

申请人： George T. Pinson

发明人： George T. Pinson

IPC分类号： G21K1/14

CPC分类号： G21K1/14

摘要： An electrically charged spherical projectile for use in acceleration devices such as betatrons, cyclotrons, linear accelerators and similar devices. The spherical projectile having a large hollow or low mass filled spherical body which can be electrically charged and perform the same functions as an electron or ion.

摘要翻译： 一种用于加速装置的充电球形射弹，如贝塔通管，回旋加速器，线性加速器和类似装置。 球形抛射体具有大的中空或低质量填充的球形体，其可以带电并且执行与电子或离子相同的功能。

公开(公告)号：US4804837A

公开(公告)日：1989-02-14

申请号：US142365

申请日：1988-01-11

申请人： Marvin Farley

发明人： Marvin Farley

IPC分类号： H01J37/317 ,  G21K1/14 ,  H01J37/02 ,  H01L21/265 ,  H01S1/00

CPC分类号： H01J37/026 ,  G21K1/14 ,  H01J2237/31701

摘要： An ion beam neutralizer. High energy electrons are directed through an ion beam neutralizing zone or region containing an ionizable gas. As the high energy electrons collide with the gas molecules, they ionize the gas molecules and produce low energy electrons which are trapped by a positively charged ion beam. As high energy electrons pass out of the neutralizing zone they are deflected back to the neutralizing zone by a cylindrical conductor biased to deflect the high energy electrons and an accelerating grid for accelerating the electrons back through the beam neutralizing zone.