Method of observing and method of working diamond stylus for working of atomic force microscope
    2.
    发明授权
    Method of observing and method of working diamond stylus for working of atomic force microscope 失效
    使用原子力显微镜工作的钻石笔的观察方法和方法

    公开(公告)号:US07804067B2

    公开(公告)日:2010-09-28

    申请号:US11951768

    申请日:2007-12-06

    申请人: Osamu Takaoka

    发明人: Osamu Takaoka

    摘要: When a characterization of a tip of a diamond stylus for working is needed, the tip of the diamond stylus for working used is observed by a high resolution scanning electron microscope of a high acceleration voltage under a steam atmosphere. When the tip of the diamond stylus for working is worn or when a shape of the tip of the stylus needs to be changed, the tip of the diamond stylus for working is worked by selectively irradiating an electron beam only to a necessary region by increasing an amount of steam and an amount of a current of the electron beam. When a working chip is strongly adhered to the diamond stylus for working and needs to be removed, the electron beam is selectively irradiated only to the working chip adhered to the tip of the diamond stylus for working to be removed under a xenon fluoride atmosphere.

    摘要翻译: 当需要用于工作的金刚石触针的尖端的表征时,用于工作的金刚石触针的尖端通过高蒸汽气氛下的高加速电压的高分辨率扫描电子显微镜观察。 当用于工作的金刚石触针的尖端被磨损时或者当需要改变触笔尖端的形状时,通过选择性地将电子束照射到所需区域来加工用于加工的金刚石触针的尖端, 蒸汽量和电子束的电流量。 当工作芯片牢固地粘附到用于工作的金刚石触针并且需要去除时,电子束被选择性地仅照射到粘附到金刚石触针的尖端的工作芯片上,以在氙氟化物气氛下去除。

    Micromachined electron or ion-beam source and secondary pickup for scanning probe microscopy or object modification
    4.
    发明授权
    Micromachined electron or ion-beam source and secondary pickup for scanning probe microscopy or object modification 有权
    用于扫描探针显微镜或物体修改的微加工电子或离子束源和辅助拾取器

    公开(公告)号:US07960695B1

    公开(公告)日:2011-06-14

    申请号:US11383356

    申请日:2006-05-15

    申请人: Victor B. Kley

    发明人: Victor B. Kley

    IPC分类号: G01N13/16

    摘要: An e-beam or ion beam imaging and exposure system is built into the end of an AFM cantilever which images using the scanning capabilities built into the AFM. In one embodiment, a boron doped diamond cold cathode is formed into the cantilever with an associated accelerating electrode and secondary electron collection electrode. The assembly is brought within a few nanometers of the object to be imaged or exposed using the AFM. One or more gas channels built into the cantilever assembly provide a positive pressure of inert gas to prevent oxidative erosion of the cold cathode and can bleed any surface charge build up on the sample surface. After secondaries are collected the cantilever is moved to the next area to be exposed.

    摘要翻译: 电子束或离子束成像和曝光系统内置在AFM悬臂的末端,使用内置于AFM中的扫描功能的图像。 在一个实施例中,硼掺杂的金刚石冷阴极与相关联的加速电极和二次电子收集电极形成为悬臂。 使用AFM将组件置于要成像或暴露的物体的几纳米内。 内置在悬臂组件中的一个或多个气体通道提供惰性气体的正压力,以防止冷阴极的氧化侵蚀,并且可能导致在样品表面上积累的任何表面电荷。 收集次级后,将悬臂移至下一个要暴露的区域。

    Inspection system and inspection method
    5.
    发明申请
    Inspection system and inspection method 有权
    检验制度和检验方法

    公开(公告)号:US20080073533A1

    公开(公告)日:2008-03-27

    申请号:US11703154

    申请日:2007-02-07

    IPC分类号: G21K7/00

    摘要: There is a need for inspecting a heightwise variation in a sample. A holder holds a sample. A charge control unit charges the sample held by the holder. A retarding power supply applies a voltage to the sample held by the holder. An electro-optic system radiates an electron beam to the sample applied with a voltage by the retarding power supply and images a mirror electron returning near the surface of the sample. An image processing unit processes a mirror image resulting from imaging the mirror electron. The image processing unit outputs information corresponding to a difference between mirror images, i.e., a mirror image acquired by imaging the mirror electron and a mirror image for a prepared standard preparation, as a heightwise variation in a sample.

    摘要翻译: 需要检查样品的高度变化。 持有人持有样本。 收费控制单元收取由持有人持有的样本。 延迟电源对由保持器保持的样品施加电压。 电光系统通过延迟电源将电子束辐射到施加有电压的样品,并对在样品表面附近返回的镜电子进行成像。 图像处理单元处理由镜电子成像产生的镜像。 图像处理单元输出与镜像相对应的信息,即通过将镜像电子成像获得的镜像和准备的标准品的镜像作为样品的高度变化。

    Method and system for surface or cross-sectional processing and observation
    6.
    发明申请
    Method and system for surface or cross-sectional processing and observation 审中-公开
    用于表面或横截面加工和观察的方法和系统

    公开(公告)号:US20040154744A1

    公开(公告)日:2004-08-12

    申请号:US10759354

    申请日:2004-01-16

    IPC分类号: C23F001/00

    摘要: A system for surface or cross-sectional processing and observation and a method of surface or cross-sectional processing and observation using the system. The system has a unit for processing a sample surface to expose a target surface or cross section and a scanning probe microscope unit for observing the exposed surface or cross section. According to the system and method, a scanning probe microscope capable of providing different kinds of information is used to form at least one target surface or cross section in a sample surface and to observe the target surface or cross section. This offers the following advantages: a spatial resolution comparable to that of a transmission electron microscope can be achieved; and electric, magnetic, and mechanical information for a target sample plane, which couldn't be obtained by the known method, can be monitored in a shorter operating time.

    摘要翻译: 一种用于表面或横截面加工和观察的系统,以及使用该系统进行表面或横截面加工和观察的方法。 该系统具有用于处理样品表面以暴露目标表面或横截面的单元和用于观察暴露表面或横截面的扫描探针显微镜单元。 根据该系统和方法,可以使用能够提供不同种类的信息的扫描探针显微镜在样品表面中形成至少一个目标表面或横截面并观察目标表面或横截面。 这提供了以下优点:可以实现与透射电子显微镜相当的空间分辨率; 并且可以在更短的操作时间内监视通过已知方法无法获得的目标样品平面的电,磁和机械信息。

    Scanning particle microscope and method for determining a position change of a particle beam of the scanning particle microscope
    8.
    发明授权
    Scanning particle microscope and method for determining a position change of a particle beam of the scanning particle microscope 有权
    扫描粒子显微镜和扫描粒子显微镜的粒子束位置变化的测定方法

    公开(公告)号:US09336983B2

    公开(公告)日:2016-05-10

    申请号:US14755264

    申请日:2015-06-30

    IPC分类号: H01J37/00 H01J37/26 H01J37/28

    摘要: The invention refers to a scanning particle microscope comprising: (a) at least one reference object which is fixedly arranged at an output of the scanning particle microscope for a particle beam so that the reference object can at least partially be imaged by use of the electron beam; (b) at least one scanning unit operable to scan a particle beam of the scanning particle microscope across at least one portion of the reference object; and (c) at least one setting unit operable to change at least one setting of the scanning particle microscope.

    摘要翻译: 本发明涉及一种扫描粒子显微镜,包括:(a)至少一个参考对象,其固定地布置在用于粒子束的扫描粒子显微镜的输出处,使得参考对象可以至少部分地通过使用电子 光束; (b)至少一个扫描单元,其可操作以跨所述参考物体的至少一部分扫描所述扫描粒子显微镜的粒子束; 和(c)至少一个设置单元,其可操作以改变扫描粒子显微镜的至少一个设置。

    PROBE-BASED DATA COLLECTION SYSTEM WITH ADAPTIVE MODE OF PROBING
    9.
    发明申请
    PROBE-BASED DATA COLLECTION SYSTEM WITH ADAPTIVE MODE OF PROBING 有权
    基于探测的数据采集系统具有自适应的探测模式

    公开(公告)号:US20150168444A1

    公开(公告)日:2015-06-18

    申请号:US14108286

    申请日:2013-12-16

    申请人: DCG Systems, Inc.

    IPC分类号: G01Q10/04 G01Q30/02

    CPC分类号: G01Q10/06 H01J2237/2583

    摘要: A system for analyzing a sample is described. The system for analyzing a sample includes a probe and a controller circuit. The controller circuit configured to control a movement of the probe to at least a first position and a second position on the sample based on navigation data. In response to the movement of the probe, the controller circuit is configured to adjust a force of the probe on the sample at the first position from a first force value to a second force value and the force of the probe on the sample from a third force value to a fourth force value at said second position on the sample. And, the controller circuit is configured to acquire sample data with the probe at the first position on the sample.

    摘要翻译: 描述用于分析样品的系统。 用于分析样品的系统包括探针和控制器电路。 所述控制器电路被配置为基于导航数据来控制所述探针到所述样本上的至少第一位置和第二位置的移动。 响应于探针的移动,控制器电路被配置为将第一位置处的样品上的探针的力从第一力值调节到第二力值,并且探针从第三位置到样品上的力 在样品的所述第二位置处的力值达到第四力值。 并且,控制器电路被配置为在样品的第一位置处用探针获取样本数据。

    Inspection system and inspection method
    10.
    发明授权
    Inspection system and inspection method 有权
    检验制度和检验方法

    公开(公告)号:US07755776B2

    公开(公告)日:2010-07-13

    申请号:US11703154

    申请日:2007-02-07

    IPC分类号: G01B11/28

    摘要: There is a need for inspecting a heightwise variation in a sample. A holder holds a sample. A charge control unit charges the sample held by the holder. A retarding power supply applies a voltage to the sample held by the holder. An electro-optic system radiates an electron beam to the sample applied with a voltage by the retarding power supply and images a mirror electron returning near the surface of the sample. An image processing unit processes a mirror image resulting from imaging the mirror electron. The image processing unit outputs information corresponding to a difference between mirror images, i.e., a mirror image acquired by imaging the mirror electron and a mirror image for a prepared standard preparation, as a heightwise variation in a sample.

    摘要翻译: 需要检查样品的高度变化。 持有人持有样本。 收费控制单元收取由持有人持有的样本。 延迟电源对由保持器保持的样品施加电压。 电光系统通过延迟电源将电子束辐射到施加有电压的样品,并对在样品表面附近返回的镜电子进行成像。 图像处理单元处理由镜电子成像产生的镜像。 图像处理单元输出与镜像相对应的信息,即通过将镜像电子成像获得的镜像和准备的标准品的镜像作为样品的高度变化。