公开(公告)号：US20180169287A1

公开(公告)日：2018-06-21

申请号：US15894153

申请日：2018-02-12

申请人： Relyon Plasma GmbH ,  EPCOS AG

发明人： Stefan Nettesheim ,  Dominik Burger ,  Georg Kuegerl ,  Markus Puff

IPC分类号： A61L9/12 ,  A61L9/22 ,  A61L9/04 ,  B01D53/66

CPC分类号： A61L9/122 ,  A61L9/015 ,  A61L9/046 ,  A61L9/22 ,  A61L2209/132 ,  A61L2209/14 ,  A61L2209/16 ,  A61L2209/212 ,  A61L2209/22 ,  B01D53/66 ,  B60H3/0078 ,  B60H3/0092 ,  F24F3/16 ,  F24F2003/1685 ,  H05H1/2475 ,  H05H2001/2481

摘要： The invention relates to an air-conditioning device for a space to be air-conditioned. The air-conditioning device has a housing including an air supply and an air discharge. In the housing, a flow path is formed between the air supply and the air discharge. In the flow path, at least one heat exchanger, a blower, and a means for generating an excited gas are provided. Furthermore, a surface coating is provided in the flow path, which is configured for the catalytic decomposition of the ozone content of the excited gas, and which is arranged downstream of the means for generating the excited gas.

公开(公告)号：US09414478B2

公开(公告)日：2016-08-09

申请号：US14096128

申请日：2013-12-04

申请人： International Technology Center

发明人： Brian D. Schultz ,  William M. Hooke ,  Michael J. Kelly

IPC分类号： H05H1/24 ,  H05H1/46

CPC分类号： H05H1/2406 ,  H05H1/2475 ,  H05H2001/2412 ,  H05H2001/4682

摘要： A plasma generating system. A pair of electrodes are spaced apart by an electrode gap. A source of a gas adapted to place the gas in the electrode gap. A power generating circuit is coupled to the electrodes to generate an electric field across the electrodes so as to initiate a plasma discharge within the electrode gap. The power generating circuit has adequate capacity to maintain a sufficient electric field across the gap during the plasma discharge to allow a plasma impedance to self-tune to the plasma generating system. This abstract is not to be considered limiting, since other embodiments may deviate from the features described in this abstract.

摘要翻译： 等离子体发生系统。 一对电极通过电极间隙间隔开。 适于将气体置于电极间隙中的气体源。 功率产生电路耦合到电极以在电极之间产生电场，以便在电极间隙内引发等离子体放电。 功率产生电路具有足够的容量以在等离子体放电期间在间隙上保持足够的电场，以允许等离子体阻抗自调谐到等离子体发生系统。 该摘要不被认为是限制性的，因为其他实施例可能偏离本摘要中描述的特征。

公开(公告)号：US20160129142A1

公开(公告)日：2016-05-12

申请号：US14996886

申请日：2016-01-15

申请人： Relyon Plasma GmbH

发明人： Stefan Nettesheim

IPC分类号： A61L2/14 ,  H01J37/32 ,  H05H1/24

CPC分类号： A61L2/14 ,  A61L9/22 ,  A61L2202/11 ,  A61L2202/25 ,  A61L2209/132 ,  H01J37/32807 ,  H01J37/32816 ,  H05H1/2475 ,  H05H2001/2481

摘要： Disclosed is a system for reducing germs by means of plasma. To this end, a piezoelectric transformer is associated with a dielectric film. The peripheral edge of the dielectric film encloses an area to be sterilized, a cavity being formed thereby. A high-voltage end of the piezoelectric transformer is facing a side of the dielectric film facing away from the cavity. The plasma is ignited within the cavity.

摘要翻译： 公开了一种通过等离子体还原细菌的系统。 为此，压电变压器与电介质膜相关联。 电介质膜的外围边缘封闭要消毒的区域，由此形成空腔。 压电变压器的高压端面向绝缘膜的背离空腔的一侧。 等离子体在腔内点燃。

公开(公告)号：US20160128173A1

公开(公告)日：2016-05-05

申请号：US14929192

申请日：2015-10-30

申请人： CALIFORNIA INSTITUTE OF TECHNOLOGY

发明人： Morteza Gharib ,  Francisco Pereira ,  Sean A. Mendoza

IPC分类号： H05H1/24 ,  H01T19/00

CPC分类号： H05H1/24 ,  H01T19/00 ,  H05H1/2475 ,  H05H2001/2481

摘要： A toroidal plasma is generated without voltage input. It can be produced using a pressurized water jet directed at a non-conductive, dielectric plate. Systems and methods employing the setup are described in which energy is generated and optionally harvested in addition to corona light.

摘要翻译： 产生无电压输入的环形等离子体。 它可以使用指向非导电的电介质板的加压水射流产生。 描述了采用该装置的系统和方法，其中产生能量并且除了电晕光之外任选收获。

公开(公告)号：US20130264309A1

公开(公告)日：2013-10-10

申请号：US13440884

申请日：2012-04-05

申请人： Ian J. Kenworthy ,  Daniel A. Brown ,  Cliff E. La Croix ,  Josh A. Cormier

发明人： Ian J. Kenworthy ,  Daniel A. Brown ,  Cliff E. La Croix ,  Josh A. Cormier

IPC分类号： H05H1/24 ,  B44C1/22

CPC分类号： H01J37/32 ,  H01J37/32798 ,  H05H1/2475 ,  H05H2001/2481 ,  H05H2001/2487

摘要： Methods and apparatus for processing a substrate using plasma are disclosed. The apparatus includes a plasma processing system having a process gas supply arrangement for supplying a process gas into an interior region of said chamber and a plasma source configured for generating said plasma at least from said process gas. The apparatus also includes an acoustic energy generator arrangement configured to apply acoustic energy to at least one of a chamber component and said substrate, wherein said acoustic energy generator generates said acoustic energy in the range of 10 Hz to 1 MHz using at least one of a piezoelectric transducing, mechanical coupling vibration, wafer backside gas pulsing, pulsing of said process gas, pressure wave pulsing, and electromagnetic coupling.

摘要翻译： 公开了使用等离子体处理衬底的方法和装置。 该装置包括等离子体处理系统，其具有用于将处理气体供应到所述室的内部区域中的处理气体供应装置和至少从所述处理气体产生所述等离子体的等离子体源。 该装置还包括声能发生器装置，其配置成将声能施加到腔室部件和所述衬底中的至少一个，其中所述声能发生器使用以下中的至少一个来产生在10Hz至1MHz的范围内的所述声能： 压电传感，机械耦合振动，晶片背面气体脉冲，所述工艺气体的脉冲，压力波脉冲和电磁耦合。

公开(公告)号：US20040022945A1

公开(公告)日：2004-02-05

申请号：US10381690

申请日：2003-03-25

发明人： Andrew Goodwin ,  Patrick Merlin ,  Jas Pal Badyal ,  Luke Ward

IPC分类号： H05H001/24

CPC分类号： B05D1/62 ,  B05B5/00 ,  B05B17/0623 ,  B05D1/10 ,  C23C16/4486 ,  C23C16/503 ,  H05H1/2475 ,  H05H2001/2481 ,  H05H2240/10

摘要： A method for forming a coating on a substrate using an atmospheric pressure plasma discharge. The method comprises introducing an atomized liquid and/or solid coating-forming material into an atmospheric pressure plasma discharge and/or an ionized gas stream resulting therefrom, and exposing the substrate to the atomized coating-forming material. The application also described a method for polymerizing a polymer forming material, and further to apparatus for forming a coating on a substrate.

摘要翻译： 使用大气压等离子体放电在基板上形成涂层的方法。 该方法包括将雾化的液体和/或固体涂层形成材料引入到由其产生的大气压等离子体放电和/或电离气流中，并将基底暴露于雾化涂层形成材料。 本申请还描述了聚合物形成材料的聚合方法，还描述了在基材上形成涂层的装置。

公开(公告)号：US09455127B2

公开(公告)日：2016-09-27

申请号：US14681365

申请日：2015-04-08

申请人： Northwestern University

发明人： Kumar Pallav ,  Rajiv Malhotra ,  Ishan Saxena ,  Kornel Ehmann ,  Jian Cao

IPC分类号： H01J37/32 ,  H01J37/14 ,  H01J37/30 ,  B23K26/00 ,  H05H1/24 ,  H01J37/302

CPC分类号： H01J37/32339 ,  B23K26/00 ,  H01J37/14 ,  H01J37/302 ,  H01J37/3266 ,  H01J37/32669 ,  H01J37/32715 ,  H01J37/32926 ,  H01J2237/334 ,  H05H1/2475

摘要： A system for laser-induced plasma micromachining of a work-piece includes a dielectric fluid, a dielectric fluid supply device, a laser, a processor, and a memory. The dielectric fluid supply device is arranged to hold a work-piece in the dielectric fluid or to direct the dielectric fluid onto the work-piece. The laser is arranged to emit a pulsed laser-beam. The processor is in electronic communication with the laser. The memory is in electronic communication with the processor. The memory includes programming code for execution by the processor. The programming code is programmed to direct the laser to deliver the pulsed laser-beam into the dielectric fluid to create a plasma generated at a focal point of the pulsed laser-beam in the dielectric fluid to micromachine, using the plasma, the work-piece disposed adjacent to the focal point.

摘要翻译： 用于工件的激光诱导等离子体微加工的系统包括介质流体，介电流体供应装置，激光器，处理器和存储器。 介电流体供应装置被布置成将工件保持在电介质流体中或将介电流体引导到工件上。 激光器被布置成发射脉冲激光束。 处理器与激光器进行电子通信。 存储器与处理器进行电子通信。 存储器包括用于由处理器执行的编程代码。 编程代码被编程为引导激光器将脉冲激光束传送到电介质流体中，以使用等离子体将工件中的脉冲激光束的介电流体中的脉冲激光束的焦点产生到微机械 设置在焦点附近。

公开(公告)号：US20150294840A1

公开(公告)日：2015-10-15

申请号：US14681365

申请日：2015-04-08

申请人： Northwestern University

发明人： Kumar Pallav ,  Rajiv Malhotra ,  Ishan Saxena ,  Kornel Ehmann ,  Jian Cao

IPC分类号： H01J37/32 ,  H05H1/46

CPC分类号： H01J37/32339 ,  B23K26/00 ,  H01J37/14 ,  H01J37/302 ,  H01J37/3266 ,  H01J37/32669 ,  H01J37/32715 ,  H01J37/32926 ,  H01J2237/334 ,  H05H1/2475

摘要： A system for laser-induced plasma micromachining of a work-piece includes a dielectric fluid, a dielectric fluid supply device, a laser, a processor, and a memory. The dielectric fluid supply device is arranged to hold a work-piece in the dielectric fluid or to direct the dielectric fluid onto the work-piece. The laser is arranged to emit a pulsed laser-beam. The processor is in electronic communication with the laser. The memory is in electronic communication with the processor. The memory includes programming code for execution by the processor. The programming code is programmed to direct the laser to deliver the pulsed laser-beam into the dielectric fluid to create a plasma generated at a focal point of the pulsed laser-beam in the dielectric fluid to micromachine, using the plasma, the work-piece disposed adjacent to the focal point.

摘要翻译： 用于工件的激光诱导等离子体微加工的系统包括介质流体，介电流体供应装置，激光器，处理器和存储器。 介电流体供应装置被布置成将工件保持在电介质流体中或将介电流体引导到工件上。 激光器被布置成发射脉冲激光束。 处理器与激光器进行电子通信。 存储器与处理器进行电子通信。 存储器包括用于由处理器执行的编程代码。 编程代码被编程为引导激光器将脉冲激光束传送到电介质流体中，以使用等离子体将工件中的脉冲激光束的介电流体中的脉冲激光束的焦点产生到微机械 设置在焦点附近。

公开(公告)号：US08226642B2

公开(公告)日：2012-07-24

申请号：US12191799

申请日：2008-08-14

申请人： Gene H. Arts

发明人： Gene H. Arts

IPC分类号： A61B18/04

CPC分类号： A61B18/042 ,  A61B2018/122 ,  H05H1/2475

摘要： Disclosed is an ignition system for initiating a plasma arc in an electrosurgical system. The system includes a source of high frequency electrical energy having a terminal of active potential and a terminal of return potential a base having a distal end from which a plasma arc emanates, an active electrode operatively coupled with the base and electrically in circuit with the terminal of active potential. The ignition system may have a piezoelectric device electrically coupled to the active electrode to create at least one high voltage spark when the system is initially activated. Alternately, the ignition system may include a heater or heating device of heating the active electrode and producing free electrons to assist in the initiation of the plasma arc.

摘要翻译： 公开了一种用于在电外科系统中起始等离子弧的点火系统。 该系统包括具有有效电位端子和返回电位端子的高频电能源，具有等离子弧发射的远端的基极，与基极操作耦合并与端子电连接的有源电极 的积极潜力。 点火系统可以具有电耦合到有源电极的压电器件，以在系统初始激活时产生至少一个高电压火花。 或者，点火系统可以包括加热器或加热装置，其加热有源电极并产生自由电子以辅助等离子体电弧的启动。

公开(公告)号：US20110048251A1

公开(公告)日：2011-03-03

申请号：US12599782

申请日：2008-05-13

申请人： Alexander Bardenshtein ,  Henrik Bindslev ,  Niels Krebs ,  Yukihiro Kusano

发明人： Alexander Bardenshtein ,  Henrik Bindslev ,  Niels Krebs ,  Yukihiro Kusano

IPC分类号： H01J7/24 ,  B01J12/00 ,  A23L3/26

CPC分类号： H01J37/32321 ,  C23C16/4415 ,  H05H1/2475 ,  H05H2001/2493 ,  Y10T428/31

摘要： This invention relates to enhancing a gas-phase reaction in a plasma comprising: creating plasma (104) by at least one plasma source (106), and wherein that the method further comprises: generating ultrasonic high intensity and high power acoustic waves (102) having a predetermined amount of acoustic energy by at least one ultrasonic high intensity and high power gas-jet acoustic wave generator (101), where said ultrasonic high intensity and high power acoustic waves are directed to propagate towards said plasma (104) so that at least a part of said predetermined amount of acoustic energy is absorbed into said plasma (104), and where a sound pressure level of said generated ultrasonic high intensity and high power acoustic waves (102) is at least substantially 140 dB and where an acoustic power of said generated ultrasonic high intensity and high power acoustic waves (102) is at least substantially 100 W. In this way, a high sound intensity and power are obtained that efficiently enhances a gas-phase reaction in the plasma, which enhances the plasma process, e.g. enabling more efficient ozone or hydrogen generation using plasma in relation to reaction speed and/or obtained concentration of the generated compound. Other processes including plasma like exhaust gas cleaning, pollution control, odor removal, fuel conversion, sterilization, and oxidation can also be enhanced.

摘要翻译： 本发明涉及增强等离子体中的气相反应，包括：通过至少一个等离子体源（106）产生等离子体（104），并且其中所述方法还包括：产生超声波高强度和高功率声波（102） 通过至少一个超声波高强度和高功率气体 - 弹性波发生器（101）具有预定量的声能，其中所述超声波高强度和高功率声波被引导朝向所述等离子体（104）传播，使得在 所述预定量的声能的至少一部分被吸收到所述等离子体（104）中，并且其中所述产生的超声波高强度和高功率声波（102）的声压级至少基本上为140dB，并且其中声功率 所述产生的超声波高强度和高功率声波（102）至少基本上为100W。以这种方式，获得高声音强度和功率，其有效地增强 在等离子体中产生气相反应，这增强了等离子体工艺，例如， 使得能够使用等离子体相对于所产生的化合物的反应速度和/或获得的浓度产生更有效的臭氧或氢气产生。 还可以提高包括等离子体在内的其它方法，例如废气净化，污染控制，除臭，燃料转化，灭菌和氧化。