利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

332 条记录 (耗时 0.022 秒)

    METHOD FOR RECOVERING GERMANIUM
    1.
    发明公开
    METHOD FOR RECOVERING GERMANIUM 审中-公开

    公开(公告)号：US20240344177A1

    公开(公告)日：2024-10-17

    申请号：US18755816

    申请日：2024-06-27

    申请人： SUMITOMO ELECTRIC INDUSTRIES, LTD.

    发明人： Toshimi HABASAKI ,  Kiichi KIMURA ,  Masanori SHIMURA

    IPC分类号： C22B41/00 ,  B01D53/38 ,  B01D53/78

    CPC分类号： C22B41/00 ,  B01D53/38 ,  B01D53/78 ,  B01D2257/55 ,  B01D2258/0241

    摘要： A method for recovering germanium from exhaust gas, includes: a first step of bringing the exhaust gas into contact with circulating water to move germanium; a second step of supplying the circulating water and a soluble iron salt to a reception tank; a third step of neutralizing the circulating water; and a fourth step of settling a precipitate in the circulating water. The first step to the fourth step are set as one cycle and are repeatedly executed in two or more cycles. In the second step of a second or subsequent cycle, at least a part of the precipitate obtained as the soluble iron salt in the fourth step is injected into the reception tank. The precipitate is taken out after executing the first step to the fourth step in a predetermined number of cycles.

    TRAP FILTER SYSTEM FOR SEMICONDUCTOR EQUIPMENT
    5.
    发明申请
    TRAP FILTER SYSTEM FOR SEMICONDUCTOR EQUIPMENT 有权

    公开(公告)号：US20220112598A1

    公开(公告)日：2022-04-14

    申请号：US17557051

    申请日：2021-12-21

    申请人： Intel Corporation

    发明人： Subramani IYER ,  Kaushal SINGH

    IPC分类号： C23C16/44 ,  H01L21/67 ,  B01D53/82 ,  B01D53/38

    摘要： The present disclosure is directed to a trap filter system having a plurality of filters, the plurality of filters having filtering materials to remove contaminants from a flow of gas effluents generated by a semiconductor processing tool and a bypass mechanism configured to selectively direct or shut off the flow of gas effluents to one or more of the plurality of filters while the semiconductor processing tool remains in operation. Each of the plurality of filters is removable and replaceable when the filtering material is unable to effectuate the removal of contaminants.

    SEMICONDUCTOR PROCESSING SYSTEM
    7.
    发明申请
    SEMICONDUCTOR PROCESSING SYSTEM 审中-公开

    公开(公告)号：US20190282948A1

    公开(公告)日：2019-09-19

    申请号：US16071356

    申请日：2017-01-25

    申请人： Imad Mahawili

    发明人： Imad Mahawili

    IPC分类号： B01D53/00 ,  B01D53/38 ,  B01D53/78 ,  B01D53/75

    摘要： A semiconductor processing system includes a semiconductor processing chamber, a scrubber, an exhaust line in fluid communication with the chamber and the scrubber for delivering exhaust from the chamber to the scrubber, and a steam generation device in fluid communication with the exhaust line for injecting steam into the exhaust line.