公开(公告)号：US20250058347A1

公开(公告)日：2025-02-20

申请号：US18807631

申请日：2024-08-16

Applicant: Schwäbische Werkzeugmaschinen GmbH

Inventor： Hartmut ROCKER

IPC: B05C13/00 ,  B05C9/14 ,  B65G47/34

Abstract: A loading device for a coating system with a holding device which includes a rack-like frame and a carrier made of a rod-like or wire-like continuous material. On which a workpiece can be arranged, with at least one detection device which includes a detection means, by which at least the dimensions of the frame and of the workpiece can be detected, and which includes a control unit, by which the dimensions of the hook-like holding section and of a minimum distance between two hook-like holding sections on the carrier for contact-free arrangement of the workpiece and by which the total length of the continuous material for forming the carrier can be determined. With a provisioning device which interacts functionally with the detection device, by which the carrier can be produced, which provides a continuous material carrier, which provides the continuous material forming the carrier, which provides a deformation unit.

公开(公告)号：US20240419077A1

公开(公告)日：2024-12-19

申请号：US18740673

申请日：2024-06-12

Applicant: Kioxia Corporation

Inventor： Tomoya AKAZAWA

IPC: G03F7/16 ,  B05C5/02 ,  B05C13/00 ,  H01L21/66

Abstract: According to one embodiment, a coating processing apparatus includes a rotary table being rotatable while holding a substrate on which a coating film is to be formed; a first discharge part discharging a first coating liquid to a first discharge position that is a central portion of the substrate to form a first liquid film; a second discharge part discharging a second coating liquid to a second discharge position outside the first discharge position of the substrate to form a second liquid film; an imaging device configured to image contours of the first and second liquid films spreading outside the substrate by rotation of the substrate; and a control device configured to control at least one of a rotation speed of the substrate and the second discharge position based on an imaging result by the imaging device so that a distance between the contours falls within a predetermined range.

公开(公告)号：US20240173738A1

公开(公告)日：2024-05-30

申请号：US18502487

申请日：2023-11-06

Applicant: SEMES CO., LTD.

Inventor： Yong Jun KIM ,  Tae-keun KIM ,  Junhee CHOI ,  Kang Sul KIM ,  Kyeong Min LEE

IPC: B05C5/00 ,  B05C13/00

CPC classification number: B05C5/001 ,  B05C13/00 ,  H01L21/02057

Abstract: Provided is a substrate processing apparatus and substrate processing method capable of allowing a liquid chemical to penetrate deeply into patterns of a substrate, the substrate processing apparatus including a housing for forming a treatment space where a substrate is processed, a substrate supporter mounted in the treatment space to rotate about a rotational axis, and provided to support the substrate, a liquid chemical supplier provided above the substrate supporter to eject a liquid chemical toward an upper surface of the substrate supported by the substrate supporter, and an ejector provided at a side of the treatment space to eject a heat transfer medium with a temperature different from the temperature of the liquid chemical onto the substrate.

公开(公告)号：US20240112945A1

公开(公告)日：2024-04-04

申请号：US18539507

申请日：2023-12-14

Applicant: Applied Materials, Inc.

Inventor： Anhthu NGO ,  Zuoming ZHU ,  Balasubramanian RAMACHANDRAN ,  Paul BRILLHART ,  Edric TONG ,  Anzhong CHANG ,  Kin Pong LO ,  Kartik SHAH ,  Schubert S. CHU ,  Zhepeng CONG ,  James Francis MACK ,  Nyi O. MYO ,  Kevin Joseph BAUTISTA ,  Xuebin LI ,  Yi-Chiau HUANG ,  Zhiyuan YE

IPC: H01L21/687 ,  B05C13/00 ,  B05C13/02 ,  C30B25/12 ,  H01L21/673

CPC classification number: H01L21/68735 ,  B05C13/00 ,  B05C13/02 ,  C30B25/12 ,  H01L21/67326 ,  H01L21/6875 ,  H01L21/68785 ,  C23C16/4585

Abstract: In one embodiment, a susceptor for thermal processing is provided. The susceptor includes an outer rim surrounding and coupled to an inner dish, the outer rim having an inner edge and an outer edge. The susceptor further includes one or more structures for reducing a contacting surface area between a substrate and the susceptor when the substrate is supported by the susceptor. At least one of the one or more structures is coupled to the inner dish proximate the inner edge of the outer rim.

公开(公告)号：US11742231B2

公开(公告)日：2023-08-29

申请号：US16657841

申请日：2019-10-18

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Hsuan-Chih Chu ,  Wen-Hao Cheng ,  Yen-Yu Chen ,  Yi-Ming Dai

IPC: C23C14/00 ,  C23C14/54 ,  H01L21/673 ,  H01L21/67 ,  H01L21/66 ,  H01L21/687 ,  C23C14/50 ,  B25B11/00 ,  C30B25/12 ,  B25J11/00 ,  B29C64/241 ,  B25J18/04 ,  B25F5/02 ,  H01J37/20 ,  B05C13/00

CPC classification number: H01L21/673 ,  B05C13/00 ,  B25B11/00 ,  B25F5/02 ,  B25J11/0075 ,  B25J18/04 ,  B29C64/241 ,  C23C14/00 ,  C23C14/505 ,  C23C14/541 ,  C30B25/12 ,  H01J37/20 ,  H01L21/67098 ,  H01L21/67103 ,  H01L21/67115 ,  H01L21/67248 ,  H01L21/68764 ,  H01L21/68785 ,  H01L21/68792 ,  H01L22/12 ,  F16C2322/39 ,  H01J2237/20207 ,  H05B2203/002 ,  H05B2203/003 ,  H05B2203/037 ,  Y10S269/901

Abstract: The present disclosure provides a flexible workpiece pedestal capable of tilting a workpiece support surface. The workpiece pedestal further includes a heater mounted on the workpiece support surface. The heater includes a plurality of heating sources such as heating coils. The plurality of heating sources in the heater allows heating the workpiece at different temperatures for different zones of the workpiece. For example, the workpiece can have a central zone heated by a first heating coil, a first outer ring zone that is outside of the central zone heated by a second heating coil, a second outer ring zone that is outside of the first outer ring zone heated by a third heating coil. By using the tunable heating feature and the tilting feature of the workpiece pedestal, the present disclosure can reduce or eliminate the shadowing effect problem of the related workpiece pedestal in the art.

公开(公告)号：US11738520B2

公开(公告)日：2023-08-29

申请号：US17494571

申请日：2021-10-05

Applicant: The Boeing Company

Inventor： Gary E. Georgeson ,  Marc J. Piehl ,  Joseph L. Hafenrichter

IPC: B29C65/54 ,  B05C11/10 ,  B05C13/00 ,  B25J9/04

CPC classification number: B29C65/542 ,  B05C11/1044 ,  B05C13/00 ,  B25J9/042

Abstract: An end effector, for adhesively attaching a first part to a second part, comprises a support and a first nozzle, coupled to the support and movable relative to the support, and a second nozzle, coupled to the support and movable relative to the support. The first nozzle comprises a first-nozzle body, comprising a first-nozzle-body outlet port and a first-nozzle separator plate, extending from the first-nozzle body. The second nozzle comprises a second-nozzle body, comprising a second-nozzle-body inlet port and a second-nozzle separator plate, extending from the second-nozzle body. The end effector further comprises a roller, coupled to the support, rotatable relative to the support about a roller axis, and located between the first nozzle and the second nozzle.

公开(公告)号：US11707755B2

公开(公告)日：2023-07-25

申请号：US17408854

申请日：2021-08-23

Applicant: Tyco Electronics (Shanghai) Co. Ltd. ,  TE Connectivity Services GmbH ,  Kunshan League Automechanism Co., Ltd.

Inventor： Rong Zhang ,  Roberto Francisco-Yi Lu ,  Dandan Zhang ,  Lvhai Hu ,  Haidong Wu ,  Yuting He

IPC: B05B13/02 ,  B25J11/00 ,  B25J9/00 ,  B25J5/02 ,  B05C15/00 ,  B65G23/32 ,  B05C5/02 ,  B05C13/00 ,  B65G19/02

CPC classification number: B05B13/0228 ,  B05C5/02 ,  B05C13/00 ,  B05C15/00 ,  B25J5/02 ,  B25J9/0093 ,  B25J11/0075 ,  B65G19/02 ,  B65G23/32

Abstract: A painting system includes a conveying mechanism adapted to convey a workpiece to be painted to a painting station, a holding and rotating mechanism mounted at the painting station and adapted to hold and rotate the workpiece, and a robot having a nozzle adapted to spray a paint on the workpiece held by the holding and rotating mechanism. The robot is configured to spray the paint onto the workpiece while the holding and rotating mechanism rotates the workpiece, spraying a layer of the paint on an outer surface of the workpiece.

公开(公告)号：US20230163315A1

公开(公告)日：2023-05-25

申请号：US18096051

申请日：2023-01-12

Applicant: UCHICAGO ARGONNE, LLC

Inventor： Jae Hyung Park ,  Deborah J. Myers

IPC: H01M4/88 ,  B05B1/02 ,  B05C11/10 ,  B05C13/00

CPC classification number: H01M4/8828 ,  B05B1/02 ,  B05C11/1013 ,  B05C13/00 ,  H01M4/881 ,  B05C11/1034 ,  H01M2008/1095

Abstract: Systems for creating electrodes for polymer electrolyte membrane fuel cells include an XY stage having a heated vacuum table physically coupled to the XY stage. The vacuum table has a working face with a plurality of channels formed therein to communicate vacuum pressure from a port coupled to a vacuum source to the channels. A sheet of perforated heat-conductive material has staggered holes configured to evenly distribute the vacuum pressure from the channels through the perforated sheet. A heat-conductive wire mesh is placed over the perforated sheet, and has openings smaller than the staggered holes such that a membrane material placed on the wire mesh is not deformed by the vacuum pressure. A nanopipette or micropipette coupled to a pump is configured to deposit electrode ink onto an exposed surface of the membrane material as the controller device causes the XY stage to move the vacuum table to control deposition of the electrode ink onto the surface of the membrane material.

公开(公告)号：US20230120608A1

公开(公告)日：2023-04-20

申请号：US17965100

申请日：2022-10-13

Applicant: SEMES CO., LTD.

Inventor： Won Sik SON ,  Se Hoon OH ,  Jin Kyu KIM ,  In Ki JUNG ,  Jeong Hyup YU

IPC: B05D1/00 ,  B05C13/00 ,  B05C5/00

Abstract: Provided is an apparatus for treating a substrate including: a processing vessel having a processing space; a support unit for supporting the substrate in the processing space and rotating the substrate; a liquid supply unit for supplying a processing liquid to the substrate; and a heating unit for heating the substrate, wherein the support unit includes: a spin chuck; a driver for rotating the spin chuck; a chuck pin installed on the spin chuck to be rotated together with the spin chuck; and a chuck pin moving unit for moving the chuck pin between a contact position wherein the chuck pin is in contact with a side portion of the substrate and an open position wherein the chuck pin is spaced apart from the side portion of the substrate.

公开(公告)号：US20230084378A1

公开(公告)日：2023-03-16

申请号：US17941852

申请日：2022-09-09

Applicant: Signature Brands, LLC

Inventor： Sean MORAN ,  Thomas Thiemann ,  Charles Hodges ,  Joshua Gordon

IPC: B05C19/04 ,  B05C9/02 ,  B05C13/00 ,  B05C15/00 ,  B05D1/00

Abstract: A material deposition device for decorating an object. The device has a housing as a structural framework, an object holder, and a container releasably coupled to the housing. The housing has an object support for supporting the object to be decorated. The container creates a volumetric enclosure with the housing. The device is configured to deposit decoration materials onto the object.