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公开(公告)号：US20250041903A1
公开(公告)日：2025-02-06
申请号：US18787881
申请日：2024-07-29
Applicant: Probe Innovation, Inc.
Inventor： Akiko IWANA , Tadashi ROKKAKU , Takanori FUJIWARA
IPC: B08B1/14
Abstract: An object is to provide a cleaning sheet of which aim is to clean dusts of a pad adhered to a top part of a probe pin provided to an electronic testing of a semiconductor and that makes cleaning having a function for lowering a contact resistance between the probe and the electrode pad. Bubbles or air-layers in a sponge sheet consisted of melanin resin or urethane rubber is replaced with gel or polishing gel mixed with polishing powders having sizes not more than several tens of micrometers.
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公开(公告)号：US20250031921A1
公开(公告)日：2025-01-30
申请号：US18669036
申请日：2024-05-20
Applicant: Hobot Technology Inc.
Inventor： CHI-MOU CHAO , HSIN-HUI WU , CHIA-CHIN LIN
Abstract: Provided is a window cleaning machine including a body, air extracting module, first cleaning device, second cleaning device, walking module disposed near the body, and driving device connected to the first and second cleaning devices to cause a reciprocating motion thereof. The body defines a primary suction space. The air extracting module is disposed on the body and is in communication with the primary suction space. The first and second cleaning devices are each in contact with a pane surface while performing a cleaning operation. The first cleaning device defines a first subsidiary space in communication with the primary suction space. The second cleaning device defines a second subsidiary space in communication with the primary suction space. The walking module is disposed outside the first and second subsidiary spaces. The window cleaning machine undergoes the reciprocating motion across a non-horizontal pane surface while clinging firmly thereto by suction.
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公开(公告)号：US20250001463A1
公开(公告)日：2025-01-02
申请号：US18292791
申请日：2022-07-28
Inventor： Giorgia Sciutto , Chiara Gualandi , Francesca Ramacciotti , Maria Letizia Focarete , Silvia Prati , Rocco Mazzeo
IPC: B08B1/14 , B08B3/08 , B44D7/00 , C11D7/50 , C11D17/04 , D04H1/4334 , D04H1/4382 , D04H1/56 , D04H1/728 , D06M13/232 , D06M101/34
Abstract: It is described a method for cleaning surfaces of an item of historical-artistic interest comprising a step of applying a wipe (1), comprising a membrane of non-woven fabric (2) soaked with a solvent, to a surface layer to be removed of said item of historical-artistic interest; it is also described a wipe (1) for cleaning surfaces of an item of historical-artistic interest, in particular a painting work, adapted to carry out said method, and a kit (10) comprising a plurality of wipes (1).
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公开(公告)号：US20240402219A1
公开(公告)日：2024-12-05
申请号：US18678598
申请日：2024-05-30
Applicant: Wayne Cooper Smith
Inventor： Wayne Cooper Smith
Abstract: A cleaning element and a method for utilizing the cleaning element within a semiconductor testing procedure may improve the efficiency of testing semiconductor wafers or chips by eliminating the need for personnel to manually and visually inspect cleaning elements when worn out. The cleaning element may be impregnated with conductive particles that lower the conductivity of the cleaning element to a degree which can be measured by the same probe card which tests the wafers. As the cleaning element is worn by usage in cleaning the probe tips, the conductivity will increase. The testing process using the probe card will periodically pause testing procedure, both to be cleaned by the cleaning element, and also to test the conductivity of the cleaning element.
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5.发明公开
公开(公告)号：US20240351078A1
公开(公告)日：2024-10-24
申请号：US18683735
申请日：2022-08-19
Applicant: EBARA CORPORATION
Inventor： Naoyuki HANDA , Satomi HAMADA
Abstract: A substrate cleaning apparatus that brings a cleaning tool into sliding contact with a substrate surface while rotating the substrate to perform scrub-cleaning includes a cleaning liquid supply unit that ejects cleaning liquid onto the surface of the substrate to perform a rinsing process of the substrate after scrub-cleaning, in which a temperature of the cleaning liquid in the rinsing process is set to 0° C. to 20° C. The cleaning liquid supply unit includes a first cleaning liquid supply unit that supplies the cleaning liquid toward the vicinity of the center of the substrate and a second cleaning liquid supply unit that supplies the cleaning liquid in a spray form toward a region between the center and an edge of the substrate, and a first ejection angle by the first cleaning liquid supply unit is smaller than a second ejection angle by the second cleaning liquid supply unit.
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公开(公告)号：US20240181744A1
公开(公告)日：2024-06-06
申请号：US18441464
申请日：2024-02-14
Applicant: THE CLOROX COMPANY
Inventor： Nikhil P. DANI
CPC classification number: B32B5/26 , B32B5/022 , B32B5/06 , C11D17/049 , B08B1/143 , B32B2250/20 , B32B2260/023 , B32B2262/0253 , B32B2262/14 , B32B2432/00
Abstract: Methods for manufacturing wipes including melamine entangled into a nonwoven, and associated articles of manufacture. Such a method may include providing a melamine sheet (e.g., contiguous, rather than discrete melamine particles), providing first and second nonwoven sheets, and positioning the melamine sheet between the first and second nonwoven sheets. The sandwich structure is hydroentangled at high pressure to force the melamine material to become entangled into the nonwoven material, to a degree that a portion of the melamine is actually exposed on the exterior face(s) of the wipe, which are generally provided by the nonwoven sheets. Such a wipe exhibits the drapability of a wipe, with the scrubbing benefits (e.g., very effective cleaning of baseboards, crayon off walls, etc.) of melamine, with greater durability than existing melamine cleaning articles, which tend to quickly crumble during use.
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公开(公告)号：US12002688B2
公开(公告)日：2024-06-04
申请号：US18328626
申请日：2023-06-02
Applicant: EBARA CORPORATION
Inventor： Haiyang Xu , Mitsuhiko Inaba
CPC classification number: H01L21/67046 , B08B1/143 , B08B1/145 , B08B1/32 , B24B37/04 , B24B37/34 , H01L21/02096 , H01L21/67219
Abstract: A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.
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公开(公告)号：US11975366B2
公开(公告)日：2024-05-07
申请号：US17987173
申请日：2022-11-15
Applicant: The Clorox Company
Inventor： Ashish K. Jha , Nikhil P. Dani , David R. Scheuing , Nancy A. Falk , Bryan K. Parrish
CPC classification number: B08B1/143 , C11D17/049 , A47L13/20
Abstract: A pre-loaded cleaning substrate, and related systems and methods for picking up particles with an aspect ratio (L/D) greater than 300 (e.g., hair), or greater than 1200 (e.g., particularly long hairs). The substrate (e.g., a nonwoven) may include only a single layer of material. The pre-loaded substrate is loaded (e.g., during manufacture) with a cleaning composition. The fibers of the substrate may have an average diameter less than 15 μm, the substrate may have an air permeability of 35 ft3/min to 75 ft3/min, and the liquid cleaning composition may have a surface tension of less than about 50 dynes/cm. Together, the combination of the particular substrate and cleaning composition may facilitate markedly improved ability to pick up high L/D aspect ratio particle debris (e.g., such as hair), while retaining such particles (e.g., providing hair retention index values of at least 20).
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公开(公告)号：US20250049273A1
公开(公告)日：2025-02-13
申请号：US18795062
申请日：2024-08-05
Applicant: SHENZHEN ONEJ TECHNOLOGY CO., LTD
Inventor： LI-GUO DING , MING GAO
Abstract: A window cleaning robot includes a main body including a top shell and a bottom shell. The top shell and the bottom shell define an internal space of the main body and the bottom shell includes a plurality of air inlets. At least two driving mechanisms are disposed between the two driving mechanisms. An air pump is disposed in the internal space and configured to extract air, through the inlets of the bottom shell, between the two driving mechanisms to create negative pressure to form a vacuum area located between the two driving mechanisms. An accommodating portion is configured to accommodate the air pump and an air tube, disposed in the internal space, includes an air inlet end coupled to an opening of the accommodating portion and an air outlet end coupled to an air exhaust opening toward the driving mechanism. The air inlet end of the air tube is configured to receive the extracted air and the extracted air is then exhausted toward the driving mechanism via the air tube and the air exhaust opening.
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公开(公告)号：US12220729B2
公开(公告)日：2025-02-11
申请号：US18167541
申请日：2023-02-10
Applicant: KICTeam, Inc.
Inventor： John Condon , Joshua Lee Larsen
IPC: B08B1/14 , A47L13/16 , B32B5/02 , B32B5/18 , B32B5/24 , B32B7/027 , B32B27/08 , B32B37/10 , B65G45/10
Abstract: This document describes cleaning tools, methods of manufacturing cleaning tools, and methods of using cleaning tools, for cleaning a media transport device. The cleaning tool may include a cleaning card comprising a first core layer, as well as a first cleaning layer attached to the first core layer. The first core layer and the first cleaning layer form (a) a cleaning element having a first thickness and in which the core layer is in a relaxed state, and (b) an intermediate area that has a second thickness that is less than the first thickness and in which the core layer is in a compressed state.
