Sputtering target and method for producing sputtering target

    公开(公告)号:US12234544B2

    公开(公告)日:2025-02-25

    申请号:US18026437

    申请日:2022-06-10

    Abstract: A sputtering target comprised of a plurality of members including a target material and a base material, wherein the plurality of members includes a first member and a second member laminated to each other, wherein the first member contains Al, and the second member contains Cu, wherein at least one of the first member and the second member contains Mg, wherein the sputtering target includes an alloy layer containing Al and Cu between the first member and the second member, the alloy layer being in contact with the first member and the second member, and wherein the alloy layer further includes an Mg-containing layer containing 5.0 at % or more of Mg in at least a part of the alloy layer.

    METHOD FOR WELDING GAMMA STRENGTHENED SUPERALLOYS AND OTHER CRACK-PRONE MATERIALS

    公开(公告)号:US20240207975A1

    公开(公告)日:2024-06-27

    申请号:US18288326

    申请日:2022-04-26

    Applicant: Optomec, Inc.

    CPC classification number: B23K26/32 B23K2103/26

    Abstract: Methods for welding materials such as superalloys, hard-facing materials, and aluminides that are difficult to weld without cracking. Instead of welding one layer at a time on the weld surface like existing methods, the weld comprises stacks of weld beads that are first built up vertically to a desired weld height. After a first stack is produced, the weld surface is translated relative to the filler material source and a second adjacent stack is produced. The process is repeated, traversing the weld surface. The stacks are preferably deposited at an angle to the filler material deposition direction. By building the thickness of the weld first, the heat of welding is preferably concentrated into a sufficiently small area on the weld surface so that weld pre-heating is not required, and each portion of the weld and weld surface undergoes only one heating and cooling cycle, reducing cracking.

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