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    METHOD AND A SYSTEM FOR CHARACTERISING STRUCTURES THROUGH A SUBSTRATE
    1.
    发明公开
    METHOD AND A SYSTEM FOR CHARACTERISING STRUCTURES THROUGH A SUBSTRATE 审中-公开

    公开(公告)号：US20240281955A1

    公开(公告)日：2024-08-22

    申请号：US18651957

    申请日：2024-05-01

    申请人： UNITY SEMICONDUCTOR

    发明人： Wolfgang Alexander IFF ,  Alain COURTEVILLE

    IPC分类号： G06T7/00 ,  B81C99/00 ,  G01B11/22 ,  G06T7/521 ,  G06T7/60

    CPC分类号： G06T7/0004 ,  B81C99/003 ,  G01B11/22 ,  G06T7/521 ,  G06T7/60 ,  G06T2207/30148

    摘要： A method for characterizing structures etched in a substrate, such as a wafer is disclosed. A bottom of the structure is embedded in the substrate, the substrate having a top side in which the structures are etched and a bottom side opposite to the top side. The method includes the following steps: illuminating the bottom of at least one structure with an illumination beam issued from a light source emitting light with a wavelength adapted to be transmitted through the substrate, acquiring, with an imaging device positioned on the bottom side of said substrate, at least one image of a bottom of the at least one structure through the substrate, and measuring at least one data, called lateral data, relating to a lateral dimension of the bottom of the at least one HAR structure from the at least one acquired image. A system implementing such a method is also disclosed.

    Plate
    5.
    发明授权
    Plate 有权

    公开(公告)号：US11970681B2

    公开(公告)日：2024-04-30

    申请号：US17261466

    申请日：2019-07-02

    申请人： Ushio Denki Kabushiki Kaisha

    发明人： Daisuke Nomoto ,  Makoto Yamanaka

    IPC分类号： B01L3/00 ,  B81B1/00 ,  B81C99/00 ,  C12M1/00 ,  C12M1/32 ,  C12M3/06

    CPC分类号： C12M23/16 ,  B81B1/006 ,  B81C99/007 ,  C12M23/12 ,  C12M23/50 ,  B81B2201/05 ,  B81B2203/0338

    摘要： To provide a plate with which, although the plate has a plurality of microchannels or a microchannel in which a plurality of branch channels are formed, when a sample flowing through a microchannel is observed by a microscope, it is possible to easily identify the position of the microchannel or the branch channel under observation without reducing the magnification of the microscope.
    A plate having a microchannel therein includes an identification mark for identifying a position of the microchannel in a plane direction of the plate. When the microchannel includes a plurality of mutually independent microchannels, the identification mark is preferably formed for each microchannel. When the microchannel includes a source channel communicating with an injection port through which a sample is injected and a plurality of branch channels communicating with the source channel, the identification mark is preferably formed for each of the source channel and the branch channels.

    SELF-PACKING THREE-ARM THERMAL SCANNING PROBE FOR MICRO-NANO MANUFACTURING
    7.
    发明公开
    SELF-PACKING THREE-ARM THERMAL SCANNING PROBE FOR MICRO-NANO MANUFACTURING 审中-公开

    公开(公告)号：US20240002220A1

    公开(公告)日：2024-01-04

    申请号：US17767904

    申请日：2021-06-18

    申请人： ZHEJIANG UNIVERSITY

    发明人： Huan HU ,  Renwei MAO

    IPC分类号： B81C99/00 ,  G01Q80/00 ,  G01Q70/10 ,  G01Q70/14

    CPC分类号： B81C99/0025 ,  G01Q80/00 ,  G01Q70/10 ,  G01Q70/14

    摘要： The present disclosure discloses a self-packing three-arm thermal scanning probe for micro-nano manufacturing, comprising: a three-arm cantilever beam, metal contact pads, a nichrome heating electrode for printing, a nichrome heating electrode for transportation, and a polymer storage area. The present disclosure is manufactured by conventional micro-nano machining processes such as lithography and wet etching. In the present disclosure, a gradient density design of heating electrodes is used to generated continuous change of temperature gradients, thus realizing continuous transportation of a printing material from a storage area to a tip area, which realizes self-packing. The present disclosure can be seamlessly integrated with a CMOS process, and a printed material can be completely eliminated by means of commonly used acetone or oxygen plasma in the CMOS process, without contamination; furthermore, the micro-nano machining method of the present disclosure only requires an atomic force microscope whose cost is very low.

    HYDRODYNAMIC AND GRAVITY FOCUSING APPARATUS AND METHOD OF FORMING AND SHAPING MICROFLUIDIC DEVICES
    10.
    发明公开
    HYDRODYNAMIC AND GRAVITY FOCUSING APPARATUS AND METHOD OF FORMING AND SHAPING MICROFLUIDIC DEVICES 审中-公开

    公开(公告)号：US20230249965A1

    公开(公告)日：2023-08-10

    申请号：US17960120

    申请日：2022-10-04

    申请人： HUMMINGBIRD NANO, INC.

    发明人： Eleanor Augusta Derbyshire

    IPC分类号： B81C99/00 ,  B29C48/335 ,  B29C48/00

    CPC分类号： B81C99/0015 ,  B29C48/338 ,  B29C48/022 ,  B81C2900/02

    摘要： A curable sheath fluid and a core fluid are simultaneously introduced from a hydrodynamic nozzle to form a co-flowing extrusion, depositing at least a portion of the co-flowing extrusion on a material bed, and causing relative motion between the hydrodynamic nozzle and the material bed to form an extruded shape. The method comprises curing part or all of the external curable fluid. The method may introduce co-flowing extrusion to pressure to remove the internal core fluid from the external curable fluid, and may receive the core fluid into the fluid drain system. The extruded shapes may form a tube or plurality of tubes in a bundle or porous substrate. The ability to form concentric tubes and complex shapes provides a means forming high strength materials controlled release materials, and self-repair materials.