公开(公告)号：US20240308956A1

公开(公告)日：2024-09-19

申请号：US18229038

申请日：2023-08-01

申请人： Lawrence Livermore National Security, LLC

发明人： Natalia P. Zaitseva ,  Michael Joseph Ford ,  M Leslie Carman

IPC分类号： C07C309/17 ,  C08K5/00 ,  C08K5/42 ,  C09K11/02

CPC分类号： C07C309/17 ,  C08K5/0041 ,  C08K5/42 ,  C09K11/025

摘要： A lithium (Li)-containing compound is a lipophilic Li salt, and each molecule of the lipophilic Li salt has at least one lipophilic endgroup. In addition, a scintillator material includes an organic liquid and a lipophilic Li salt, where the lipophilic Li salt is solubilized in the organic liquid. The scintillator material includes at least one fluorescent dye, the dye being effective to provide scintillation upon exposure to radiation. The scintillator material exhibits an optical response signature for thermal neutrons that is different than an optical response signature for fast neutrons.

公开(公告)号：US11958859B2

公开(公告)日：2024-04-16

申请号：US16964804

申请日：2019-01-24

申请人： Florida Gulf Coast University Board of Trustees

发明人： Gregory R. Boyce

IPC分类号： C07D491/048 ,  A23G4/08 ,  A61K8/06 ,  C07C57/44 ,  C07C309/17

CPC分类号： C07D491/048 ,  A23G4/08 ,  A61K8/06 ,  C07C57/44 ,  C07C309/17

摘要： A pro-fragrance delivery system based on a vitamin scaffold and a fragrant alcohol. The vitamin scaffold may be a vitamer of vitamin B6 or derivatives thereof. The pro-fragrance releases the fragrant alcohol by action of water at neutral pH.

公开(公告)号：US11947258B2

公开(公告)日：2024-04-02

申请号：US18174316

申请日：2023-02-24

申请人： ROHM AND HAAS ELECTRONIC MATERIALS LLC

发明人： Emad Aqad ,  James W. Thackeray ,  James F. Cameron

IPC分类号： G03F7/004 ,  C07C303/32 ,  C07C309/06 ,  C07C309/07 ,  C07C309/12 ,  C07C309/17 ,  C07C309/20 ,  C07C309/23 ,  C07C309/42 ,  C08F222/18 ,  C08F222/24 ,  C08F224/00 ,  C08F228/02 ,  G03F7/039 ,  G03F7/30

CPC分类号： G03F7/0045 ,  C07C303/32 ,  C07C309/06 ,  C07C309/07 ,  C07C309/12 ,  C07C309/17 ,  C07C309/20 ,  C07C309/23 ,  C07C309/42 ,  C08F224/00 ,  G03F7/0397 ,  C08F224/00 ,  C08F220/1809 ,  C08F220/24 ,  C08F220/382

摘要： A monomer has the structure




wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

公开(公告)号：US11661398B2

公开(公告)日：2023-05-30

申请号：US16652949

申请日：2018-10-02

申请人： Scientist of Fortune, S.A.

发明人： Tilmann Künzl ,  Sven Panke ,  Philippe Marlière

IPC分类号： C07C309/17 ,  C12N9/10

CPC分类号： C07C309/17 ,  C12N9/104 ,  C12Y203/02002

摘要： The present invention relates to a cellular transport system for bringing a sulfonic acid construct which carries a cargo into a cell and releasing the cargo in the cell's cytoplasm, the cellular transport system comprising: (i) a sulfonate transporter located in the cytoplasm membrane of the cell wherein said sulfonate transporter is capable of transporting said sulfonic acid construct across the cytoplasm membrane into the cytoplasm; (ii) a γ-glutamyl transferase (GGT; EC 2.3.2.2) which is modified to be located in the cytoplasm of the cell, wherein said γ-glutamyl transferase is capable of hydrolyzing said sulfonic acid construct so as to release the cargo. Moreover, the present invention relates to the use of a cellular transport system for bringing a sulfonic acid construct which contains a cargo into a cell and releasing the cargo in the cell's cytoplasm. Further, the present invention relates to a γ-glutamyl transferase for hydrolyzing a sulfonic acid construct which contains a cargo.

公开(公告)号：US11467490B2

公开(公告)日：2022-10-11

申请号：US17166303

申请日：2021-02-03

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Tatsuro Masuyama ,  Yukako Anryu ,  Koji Ichikawa

IPC分类号： G03F7/004 ,  C08F212/14 ,  C08F220/18 ,  C07C309/06 ,  C07C309/17 ,  C07C381/12 ,  C07D307/00 ,  C07D321/10 ,  C07D327/04

摘要： Disclosed are a salt represented by formula (I), and an acid generator and a resist composition which include the same: wherein R1 represents a fluorine atom or a fluorinated alkyl group; R2, R3 and R4 each represent a halogen atom, a fluorinated alkyl group or a hydrocarbon group; m2 and m3 represent an integer of 0 to 4; m4 represents an integer of 0 to 5; Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; L1 represents a saturated hydrocarbon group, —CH2- included in the group may be replaced by —O— or —CO—, and a hydrogen atom included in the group may be substituted with a fluorine atom or a hydroxy group; Y1 represents a methyl group which may have a substituent or an alicyclic hydrocarbon group which may have a substituent.

公开(公告)号：US20210389667A9

公开(公告)日：2021-12-16

申请号：US17081000

申请日：2020-10-27

申请人： JSR CORPORATION

发明人： Katsuaki NISHIKORI ,  Kazuya KIRIYAMA ,  Takuhiro TANIGUCHI ,  Ken MARUYAMA

IPC分类号： G03F7/004 ,  G03F7/039 ,  C08F220/18 ,  C07D317/70 ,  C07C381/12 ,  C07C309/17 ,  C07D327/04 ,  C07C309/12 ,  C07C65/10 ,  C07C59/115 ,  C07C69/63 ,  C07C65/05

摘要： A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R1, R2, and R3 represents a fluorine atom or the like; and R4 and R5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R6s represents a fluorine atom or the like; and R8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms.

公开(公告)号：US20210356862A1

公开(公告)日：2021-11-18

申请号：US17307091

申请日：2021-05-04

申请人： FUJIFILM Corporation

发明人： Masafumi KOJIMA ,  Minoru UEMURA ,  Akihiro KANEKO ,  Akiyoshi GOTO ,  Kei YAMAMOTO

IPC分类号： G03F7/004 ,  C07C381/12 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C311/48 ,  C07D333/46 ,  C07D327/06 ,  C07C25/18

摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes a compound represented by General Formula (I) and an acid-decomposable resin. M1+A−-L-B−M2+  (I)

公开(公告)号：US20200095198A1

公开(公告)日：2020-03-26

申请号：US16467377

申请日：2017-12-12

申请人： L. BRÜGGEMANN GMBH & CO. KG

发明人： Josef BERGHOFER ,  Stefan MARK ,  Tamara BITTLINGMAYER ,  Jessica SCHREIWEIS

IPC分类号： C07C309/17 ,  C08F220/06

摘要： A sulfonic acid salt composition includes compounds of formula (I), wherein n is 1 or 2, R1 is H or C1-C6 alkyl, R2 is COOM, SO3M or CH(OH)SO2-OM, each M is an equivalent of a multivalent metal, preferably magnesium, calcium, aluminum, zinc and combinations thereof. The molar ratio of a compound wherein n is 1 to a compound wherein n is 2 is below 0.1. The sulfonic acid salt composition is useful for color stabilization of non-living organic matter such as from lacquers, paints, powder-coatings, and polymers in particular water-absorbent polymers.

公开(公告)号：US20190285983A1

公开(公告)日：2019-09-19

申请号：US16424986

申请日：2019-05-29

申请人： JSR CORPORATION

发明人： Katsuaki NISHIKORI

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C381/12 ,  C07C309/17 ,  C07D317/38 ,  C07D307/12 ,  C07D307/33 ,  C07D333/46

摘要： A radiation-sensitive resin composition includes a resin including a structural unit having an acid-dissociable group, an onium salt compound represented by formula (1), and a solvent.R1 is a hydrogen atom or a monovalent group provided that the monovalent group is not a fluoro group or a monovalent organic group containing a fluorine atom. X1 and X2 are each independently a single bond, —O—, —S— or —NR′— wherein R′ is a hydrogen atom or a monovalent hydrocarbon group. In a case where X1 is —NR′—, R2 is a monovalent organic group or a hydrogen atom. In a case where X2 is —NR′—, R3 is a monovalent organic group or a hydrogen atom. In a case where neither X1 nor X2 is —NR′—, R2 and R3 are each independently a monovalent organic group.

公开(公告)号：US10359700B2

公开(公告)日：2019-07-23

申请号：US14714812

申请日：2015-05-18

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Yukako Anryu ,  Satoshi Yamamoto ,  Koji Ichikawa

IPC分类号： G03F7/039 ,  G03F7/004 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38 ,  C07C309/17 ,  C07D411/06 ,  C07D295/26 ,  C07D339/08 ,  C07D321/00 ,  C07D417/06 ,  C07D307/33 ,  C07D321/10 ,  C07D319/08 ,  C07D327/06

摘要： A salt represented by formula (I): in which X represents an oxygen atom, a sulfur atom or —N(SO2R5)—; R5 represents a C1-C12 alkyl group which can have a fluorine atom and in which a methylene group can be replaced by an oxygen atom or a carbonyl group, a C3-C12 cycloalkyl group which can have a fluorine atom, or a C6-C12 aromatic hydrocarbon group which can have a fluorine atom; Ar represents a C6-C36 aromatic hydrocarbon group which can have a substituent or a C4-C36 heteroaromatic hydrocarbon group which can have a substituent; R1 and R2 each independently represent a hydrogen atom, a hydroxy group, or a C1-C12 hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group; “m” and “n” each independently represent 1 or 2; R3 and R4 each independently represent a hydrogen atom or a C1-C12 hydrocarbon group, R3 and R4 may be bonded to form a ring, or R3 or R4 may form a ring together with Ar; and A− represents an organic anion which has an acid-labile group, an organic anion which has a base-labile group, or an organic anion which has an acid-labile group and a base-labile group.