Senolytic Compositions And Uses Thereof

    公开(公告)号:US20210299154A1

    公开(公告)日:2021-09-30

    申请号:US17307047

    申请日:2021-05-04

    摘要: Provided herein are senolytic agents for selectively killing senescent cells that are associated with numerous pathologies and diseases, including age-related pathologies and diseases. As disclosed herein, senescent cell-associated diseases and disorders may be treated or prevented by administering at least one senolytic agent or pharmaceutical compositions thereof. The senescent cell-associated diseases or disorders treated or prevented by the methods described herein include, but are not limited to, cardiovascular diseases or disorders, cardiovascular diseases and disorders associated with arteriosclerosis, such as atherosclerosis, idiopathic pulmonary fibrosis (IPF), chronic obstructive pulmonary disease (COPD), osteoarthritis, inflammatory diseases or disorders, autoimmune diseases or disorders, pulmonary diseases or disorders, neurological diseases or disorders, dermatological diseases or disorders, chemotherapeutic side effects, radiotherapy side effects, metastasis and metabolic diseases.

    Self-assembly composition for pattern formation and pattern forming method

    公开(公告)号:US11117996B2

    公开(公告)日:2021-09-14

    申请号:US16303285

    申请日:2017-02-27

    摘要: It is an object of the present invention to provide a self-assembly composition for pattern formation having a wide range of applicable pattern size and being capable of forming a favorable phase-separated structure. The present invention relates to a self-assembly composition for pattern formation, which comprises a block copolymer comprising a polymerization unit (a) having at least one selected from a structure represented by the following formula (103) and a structure represented by the following formula (104), and a polymerization unit (b) having a structure represented by the following formula (105), wherein the content rate of a sugar moiety in the block copolymer is 3% by mass or more and 80% by mass or less based on the total mass of the block copolymer:

    SELF-ASSEMBLY COMPOSITION FOR PATTERN FORMATION AND PATTERN FORMING METHOD

    公开(公告)号:US20210147603A1

    公开(公告)日:2021-05-20

    申请号:US17164278

    申请日:2021-02-01

    摘要: It is an object of the present invention to provide a self-assembly composition for pattern formation having a wide range of applicable pattern size and being capable of forming a favorable phase-separated structure. The present invention relates to a self-assembly composition for pattern formation, which comprises a block copolymer comprising a polymerization unit (a) having at least one selected from a structure represented by the following formula (103) and a structure represented by the following formula (104), and a polymerization unit (b) having a structure represented by the following formula (105), wherein the content rate of a sugar moiety in the block copolymer is 3% by mass or more and 80% by mass or less based on the total mass of the block copolymer: