公开(公告)号：US20240361690A1

公开(公告)日：2024-10-31

申请号：US18635999

申请日：2024-04-15

申请人： SHIN-ETSU CHEMICAL CO., LTD.

发明人： Jun HATAKEYAMA ,  Yutaro OTOMO ,  Tomomi WATANABE ,  Kazuhiro KATAYAMA

IPC分类号： G03F7/039 ,  C07C25/18 ,  C07C69/54 ,  C07C69/78 ,  C07C69/88 ,  C07C309/73 ,  C07C381/12 ,  C07D333/76 ,  C08F212/14 ,  C08F220/18 ,  C08F220/22

CPC分类号： G03F7/039 ,  C07C25/18 ,  C07C69/54 ,  C07C69/78 ,  C07C69/88 ,  C07C309/73 ,  C07C381/12 ,  C07D333/76 ,  C08F212/24 ,  C08F220/1806 ,  C08F220/1807 ,  C08F220/22

摘要： The present invention is a resist material containing a repeating unit-a containing a sulfonium salt or iodonium salt of a monovalent aromatic carboxylic acid that is iodinated, is substituted or unsubstituted, and is bonded to a polymer main chain via an ester bond. This provides: a resist material having higher sensitivity and higher resolution than conventional positive resist materials, small edge roughness and size variation, and excellent pattern profile after exposure; a resist composition containing the resist material; a patterning process; and a monomer to be an ingredient for the resist material.

公开(公告)号：US12129442B2

公开(公告)日：2024-10-29

申请号：US17569172

申请日：2022-01-05

申请人： The Lubrizol Corporation

发明人： James H. Bush ,  David M. Nickerson ,  Rochelle L. Kovach ,  Jayasooriya Sujith Perera ,  Elizabeth A. Schiferl ,  Kevin J. Hughes ,  Kamalakumari K. Salem

IPC分类号： C10L1/196 ,  C08F220/18 ,  C10L1/198 ,  C10L1/222

CPC分类号： C10L1/1963 ,  C08F220/1804 ,  C10L1/1983 ,  C10L1/2222 ,  C10L2200/0446 ,  C10L2230/082

摘要： There is disclosed an antifoam component which includes at least one poly(acrylate) copolymer for use in a fuel. Poly(acrylate) polymers prepared by polymerizing a (meth)acrylate monomer comprising C1 to C30 alkyl esters of (meth)acrylic acid (“multifunctional monomer”) are also disclosed. Other poly(acrylate) polymers prepared by polymerizing (i) a (meth)acrylate monomer comprising C1 to C4 alkyl esters of (meth)acrylic acid (“solubility monomer”); (ii) a (meth)acrylate monomer comprising C5 to C12 alkyl esters of (meth)acrylic acid (“surface tension monomer”); and (iii) optionally at least one additional monomer comprising a solubility monomer, a surface tension monomer, a monomer comprising C1 to C30 alkyl esters of (meth)acrylic acid (“multifunctional monomer”), or combinations thereof are also disclosed.

公开(公告)号：US12116432B2

公开(公告)日：2024-10-15

申请号：US17782276

申请日：2020-12-10

申请人： Nitto Shinko Corporation

发明人： Ryuji Kawamura ,  Hirofumi Fujii ,  Satoshi Okuda

IPC分类号： C08F2/50 ,  C08F136/06 ,  C08F220/18 ,  C08F220/20 ,  C08G18/24 ,  C08G18/62 ,  C08G18/73

CPC分类号： C08F2/50 ,  C08F136/06 ,  C08F220/1811 ,  C08F220/20 ,  C08G18/246 ,  C08G18/6208 ,  C08G18/73

摘要： Provided is a curable composition including: a curable oligomer having, in its molecule, a branched polyolefin structure and a (meth)acryloyl group; a saturated cycloalkyl (meth)acrylate monomer having, in its molecule, a saturated cyclic hydrocarbon structure and a (meth)acryloyl group; and a saturated chain alkyl (meth)acrylate monomer having, in its molecule, a saturated chain hydrocarbon structure and a (meth)acryloyl group.

公开(公告)号：US12116431B2

公开(公告)日：2024-10-15

申请号：US17571572

申请日：2022-01-10

申请人： Industrial Technology Research Institute

发明人： Pei-Chi Chien ,  Ping-Chen Chen ,  Yaw-Ting Wu ,  Ching-Sung Chen

IPC分类号： C08F2/50 ,  B29C64/129 ,  B29C64/165 ,  B33Y10/00 ,  B33Y70/00 ,  C08F2/38 ,  C08F220/18 ,  C08F220/34 ,  C08K5/5397 ,  C08K7/22 ,  B33Y80/00

CPC分类号： C08F2/50 ,  B29C64/129 ,  B29C64/165 ,  B33Y10/00 ,  B33Y70/00 ,  C08F2/38 ,  C08F220/1811 ,  C08F220/343 ,  C08K5/5397 ,  C08K7/22 ,  B33Y80/00 ,  C08K2201/003

摘要： A light-curing resin composition, a three-dimensional object containing the same, and a manufacturing method of the three-dimensional object are provided. The light-curing resin composition includes a photoinitiator, an acrylic oligomer, an acrylic monomer, and expandable particles with hollow spherical shell structures. The acrylic monomer is a monofunctional monomer, a difunctional monomer, or a combination thereof.

公开(公告)号：US20240337937A1

公开(公告)日：2024-10-10

申请号：US18575649

申请日：2022-08-01

申请人： TOKYO OHKA KOGYO CO., LTD.

发明人： Hiroki KATO ,  Tetsuo FUJINAMI ,  Shuichi ISHII

IPC分类号： G03F7/039 ,  C08F212/14 ,  C08F220/18 ,  G03F7/004 ,  G03F7/038

CPC分类号： G03F7/039 ,  C08F212/22 ,  C08F212/24 ,  C08F220/1806 ,  G03F7/0045 ,  G03F7/038

摘要： A resist composition including a resin component having a constitutional unit represented by General Formula (a0-1) and a compound represented by General Formula (d0-1). In General Formula (a0-1), R0 represents a hydrogen atom, an alkyl group, a halogen atom, or a halogenated alkyl group; Vax0 represents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group; Va0 represents a divalent hydrocarbon group; na0 represents an integer of 0 to 2; and Ra00 represents an acid dissociable group. In General Formula (d0-1), X0 represents a bromine atom or an iodine atom; Rm represents a hydroxy group, an alkyl group, a fluorine atom, or a chlorine atom; nd1 represents an integer of 1 to 5; nd2 represents an integer of 0 to 4; Yd0 represents a divalent linking group or a single bond; Mm+ represents an m-valent organic cation; and m represents an integer of 1 or greater

公开(公告)号：US12111574B2

公开(公告)日：2024-10-08

申请号：US17547044

申请日：2021-12-09

申请人： TOKYO OHKA KOGYO CO., LTD.

发明人： Takuya Ikeda

IPC分类号： G03F7/039 ,  C07C69/54 ,  C08F212/14 ,  C08F220/18 ,  G03F7/004 ,  G03F7/038

CPC分类号： G03F7/039 ,  C07C69/54 ,  C08F212/24 ,  C08F220/1805 ,  C08F220/1806 ,  C08F220/1807 ,  C08F220/1808 ,  C08F220/1811 ,  G03F7/0045 ,  G03F7/038

摘要： A resist composition containing a polymeric compound having a constitutional unit (a01) derived from a compound represented by General Formula (a0-1). In the formula, W01 represents a polymerizable group-containing group, Ra01 represents a linear or branched hydrocarbon group, and Ra02 and Ra03 each independently represents a hydrocarbon group which may have a substituent

公开(公告)号：US20240327611A1

公开(公告)日：2024-10-03

申请号：US18741386

申请日：2024-06-12

申请人： DAIKIN INDUSTRIES, LTD.

发明人： Yuko SHIOTANI ,  Mayumi IIDA ,  Marina AIHARA ,  Yoshito TANAKA ,  Masahiro HIGASHI ,  Kanako TAKAHASHI ,  Norimasa UESUGI

IPC分类号： C08K5/20 ,  C08F220/18

CPC分类号： C08K5/20 ,  C08F220/1807 ,  C08K2201/00 ,  C08K2201/005

摘要： The present disclosure provides organic fine particles and a slip-resistance agent composition which are capable of providing excellent slip-resistance to a base material. Said organic fine particles contain a polymer having a repeating unit formed of: (I) a hydrophobic monomer that has a single ethylenically unsaturated double bond and at least one branched or cyclic hydrocarbon group having 3-40 carbon atoms; and, if necessary, (II) a cross-linking monomer having at least two ethylenically unsaturated double bonds. Said slip-resistance agent composition contains (A) the organic fine particles and (B) an aqueous medium.

公开(公告)号：US12105416B2

公开(公告)日：2024-10-01

申请号：US17160936

申请日：2021-01-28

申请人： CANON KABUSHIKI KAISHA

发明人： Fen Wan ,  Weijun Liu

IPC分类号： G03F7/00 ,  B05D3/06 ,  C08F2/50 ,  C08F220/18 ,  C08K5/02 ,  C08K5/3445 ,  G03F7/028

CPC分类号： G03F7/0002 ,  B05D3/067 ,  C08F2/50 ,  C08F220/1807 ,  C08F220/1811 ,  C08K5/02 ,  C08K5/3445 ,  G03F7/028

摘要： A photocurable composition can comprise a polymerizable material, an organic ionic compound and a photoinitiator, wherein an amount of the organic ionic compound may be not greater than 1.5 wt %, the organic ionic compound comprises an organic cation, and a conductivity of the photocurable composition can be at least 20 μS/cm. The photocurable composition can have an improved drop spreading and merging of drops in comparison to the same composition but not including the organic ionic compound.

公开(公告)号：US20240318007A1

公开(公告)日：2024-09-26

申请号：US18272582

申请日：2022-01-17

申请人： EVONIK OPERATIONS GMBH

发明人： Yili WU ,  Erwin PENG ,  Soumya SARKAR ,  Dinesh Kumar BASKER ,  Peter ALTENBUCHNER ,  Ma Monica Carlos DELA CRUZ

IPC分类号： C09D4/00 ,  B29C64/112 ,  B29C64/30 ,  B29K67/00 ,  B29K75/00 ,  B29K105/00 ,  B29K105/16 ,  B33Y10/00 ,  B33Y40/20 ,  B33Y70/00 ,  C08F220/18 ,  C08F220/28 ,  C08F222/10 ,  C09D133/06 ,  C09D133/14 ,  C09D135/02

CPC分类号： C09D4/00 ,  B33Y70/00 ,  C08F220/1809 ,  C08F220/281 ,  C08F220/282 ,  C08F222/1061 ,  C09D133/062 ,  C09D133/14 ,  C09D135/02 ,  B29C64/112 ,  B29C64/30 ,  B29K2023/04 ,  B29K2067/00 ,  B29K2075/00 ,  B29K2105/0002 ,  B29K2105/0088 ,  B29K2105/0094 ,  B29K2105/16 ,  B29K2995/0077 ,  B29K2995/0089 ,  B33Y10/00 ,  B33Y40/20

摘要： A liquid, radiation curable composition with a viscosity of 4000 cps or lower comprising component a) 20 to 60 weight percent of one or more oligomer(s), pre-polymer(s) or polymer(s) containing a plurality of ester linkages in the backbone, at least one or more urethane groups and at least two ethylenic unsaturated groups which can form polymeric crosslink networks with the other components in the composition in the presence of radicals, anions, nucleophiles or combination thereof, component b) 30 to 90 weight percent of one or more monomer(s) containing one ethylenic unsaturated group capable of forming polymeric crosslink networks with the other components in the composition in presence of radicals, anions, nucleophiles or combination thereof, component c) 0.01 to 10 weight percent of one or more photoinitiator(s) capable of producing radicals when irradiated with actinic radiation and component d) 0 to 40 weight percent of one or more additive(s) selected from the group consisting of filler(s), pigment(s), thermal stabilizer(s), UV light stabilizer(s), UV light absorber(s), radical inhibitor(s) or oligomer(s) as processing aid, said oligomers are different from the oligomers in component a).

公开(公告)号：US20240317903A1

公开(公告)日：2024-09-26

申请号：US18578651

申请日：2022-07-06

申请人： SPECIALTY OPERATIONS FRANCE

发明人： David James Wilson ,  Arnaud Cadix ,  Hajeeth Thankappan

IPC分类号： C08F2/08 ,  C08F2/38 ,  C08F220/18 ,  C08F293/00

CPC分类号： C08F2/08 ,  C08F2/38 ,  C08F220/1812 ,  C08F293/005 ,  C08F2400/02 ,  C08F2438/03

摘要： The present invention relates to the preparation of block copolymers which are particularly useful as a rheology agent, and which are suitable, inter alia, for oil extraction, which comprises a step of radical polymerization in which the following are brought into contact, in an oily medium:



monomers dissolved in the oily medium;
monomers which are insoluble in the oily medium, in the form of a micellar solution;
at least one radical polymerization initiator; and
preferably at least one radical polymerization control agent.




The invention also relates to the polymers obtained by this process and the use thereof as surfactants or dispersants.