Flexible coating composition
    2.
    发明授权

    公开(公告)号:US12091494B2

    公开(公告)日:2024-09-17

    申请号:US17745635

    申请日:2022-05-16

    申请人: SWIMC LLC

    发明人: Anthony J. Tye

    摘要: The present disclosure describes polymers and improved resin systems having flexibility, low water uptake, good adhesion, chemical resistance, and/or weatherability at extreme negative temperatures, such as temperatures down to about −40° C. or below and even temperatures down to about −60° C. The systems herein, in approaches, include a polymer or resin system for an epoxy component of an epoxy/amine system including an epoxy and/or acetoacetoxy functionalized flexible block copolymer that has a base hydrophobic polyol block or core, optional flexible monomeric blocks, and epoxy, acetoacetoxy, or both functional endcaps.

    POLYMER, LEVELING AGENT AND PREPARATION METHOD THEREOF, ELECTROPLATING SOLUTION, AND ELECTROPLATING METHOD

    公开(公告)号:US20240254277A1

    公开(公告)日:2024-08-01

    申请号:US18620558

    申请日:2024-03-28

    IPC分类号: C08G59/22 C08G59/50 C25D3/38

    摘要: This application discloses a polymer, a leveling agent, and preparation methods thereof, an electroplating solution, and an electroplating method, and pertains to the field of electroplating technologies. The polymer includes a plurality of repeating units, and the repeating unit includes: a binary epoxy compound residual group and a nitrogen-containing group. The binary epoxy compound residual group is a residue formed after an epoxy bond of a binary epoxy compound is ring-opened. The nitrogen-containing group includes: an alkyl group, and a dimethylamine group and a nitrogen-containing heterocyclic group that are respectively connected to two ends of the alkyl group, where the dimethylamine group is further connected to the binary epoxy compound residual group through a single bond. The polymer is conducive to obtaining a high-coplanarity plating at a high current density, and is especially suitable for being used as a leveling agent in an electroplating solution.

    Schiff base oligomers
    10.
    发明授权

    公开(公告)号:US11713374B2

    公开(公告)日:2023-08-01

    申请号:US17191024

    申请日:2021-03-03

    CPC分类号: C08G75/00

    摘要: Aspects of the present disclosure relate to Schiff base oligomers and uses thereof. In at least one aspect, an oligomer is represented by Formula (I) wherein each instance of R4, R5, R6, R7, R8, R10, R11, R12, R13, and R14 is independently selected from the group consisting of hydrogen, alkyl, cycloalkyl, alkoxyl, aryloxyl, ether, and heterocyclyl. Each instance of R9 of Formula (I) is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heterocyclyl, and ether. Each instance of R28 and R29 of Formula (I) is independently selected from the group consisting of hydrogen, alkyl, and aryl. Each instance of R33 of Formula (I) is independently selected from the group consisting of alkyl, cycloalkyl, aryl, heterocyclyl, and a bond. Each instance of R41 of Formula (I) is independently —NH— or a bond and each instance of R40 is independently —NH— or —NH—NH—.