COMPOSITION FOR SEMICONDUCTOR PROCESSING AND PROCESSING METHOD

    公开(公告)号:US20240150677A1

    公开(公告)日:2024-05-09

    申请号:US18457365

    申请日:2023-08-29

    申请人: JSR Corporation

    发明人: Hiroyuki Tano

    摘要: A composition for semiconductor processing according to the disclosure contains (A) a compound represented by the following general formula (1), (B) a compound represented by the following general formula (2), (C) a compound having at least one functional group selected from the group consisting of an amino group and a salt thereof (excluding a compound having a carboxyl group and a nitrogen-containing heterocyclic compound) and (D) a liquid medium, and, when the content of the (A) component is indicated by MA [mass %] and the content of the (B) component is indicated by MB [mass %], MA/MB is 1.0×102 to 1.0×106.


    RO(CH2)2O(CH2)2OH  (1)



    ROH  (2)

    (In the formula (1) and the formula (2), R's represent the same hydrocarbon group.)