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公开(公告)号：US20240337986A1
公开(公告)日：2024-10-10
申请号：US18747167
申请日：2024-06-18
申请人： Apple Inc.
发明人： Jozef M. Matlak , Brian S. Tryon , Lijie Bao , Maruwada Sukanya Sharma , Shiva K. Mandepudi , Sonja R. Postak
CPC分类号： G04G17/08 , C23C14/0015 , C23C14/025 , C23C14/0641 , C23C14/0664 , C23C14/35 , C23C28/34
摘要： An electronic device may include conductive structures such as conductive housing structures. A high-brightness, visible-light-reflecting coating may be formed on the conductive structures. The coating may have adhesion and transition layers and an uppermost coloring layer on the adhesion and transition layers. At least the uppermost coloring layer may be deposited using a high impulse magnetron sputtering (HiPIMS) process. The uppermost coloring layer may include a TiCrN film, a TiCrCN film, a TiCN film, or a metal nitride film that contains Ti, Zr, Hf, or Cr. The coating may exhibit a high-brightness gold color.
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公开(公告)号：US12100579B2
公开(公告)日：2024-09-24
申请号：US16951805
申请日：2020-11-18
发明人： Abhishek Chowdhury , Edwin C. Suarez , Harisha Sathyanarayana , Nataraj Bhaskar Rao , Siqing Lu
CPC分类号： H01J37/32642 , C23C14/3407 , C23C14/35 , C23C14/50 , C23C16/4585 , H01J37/32715 , H01J2237/20235 , H01J2237/332
摘要： Embodiments of process kits for use in a process chamber are provided herein. In some embodiments, a process kit for use in a process chamber includes: a deposition ring including a first portion having an first inner ledge and a second portion having a second inner ledge, wherein in a first position, the first portion is spaced from the second portion, and wherein in a second position, the second portion is configured to engage the first portion so that the first inner ledge is aligned with the second inner ledge along a common plane to form a clamping surface.
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公开(公告)号：US12075898B2
公开(公告)日：2024-09-03
申请号：US16969095
申请日：2019-04-10
申请人： LG CHEM, LTD.
发明人： Yong Chan Kim , Ki Hwan Kim , Nansra Heo , Jeong Woo Shon , Pilsung Jo
IPC分类号： A45D33/18 , A45D34/00 , A45D40/00 , B29C45/00 , B29C45/26 , B32B3/30 , B32B7/023 , B32B15/08 , B32B27/06 , B44F1/02 , B44F1/08 , C01B21/082 , C08J7/04 , G02B5/00 , G02B5/22 , B29C45/16 , B29K101/00 , B65D1/02 , C23C14/00
CPC分类号： A45D33/18 , A45D34/00 , A45D40/00 , B29C45/0001 , B29C45/26 , B32B3/30 , B32B7/023 , B32B15/08 , B32B27/06 , B44F1/02 , B44F1/08 , C01B21/0825 , C08J7/0423 , G02B5/003 , G02B5/223 , A45D2034/007 , A45D2040/0012 , A45D2200/053 , B29C45/1679 , B29K2101/00 , B29K2901/12 , B29K2995/002 , B32B2255/28 , B32B2307/4026 , B32B2307/416 , B32B2439/40 , B32B2451/00 , B65D1/0207 , C08J2367/02 , C23C14/0036
摘要： The present application relates to a decorative member including a color developing layer including a light reflective layer and a light absorbing layer provided on the light reflective layer; and a substrate provided on one surface of the color developing layer, wherein the light absorbing layer includes a copper oxide (CuaOx).
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4.发明公开公开(公告)号：US20240274728A1
公开(公告)日：2024-08-15
申请号：US18439921
申请日：2024-02-13
发明人： Cheng-Hsing Tsou , Wei-Hao Cheng , Pei-Yuan Ni
IPC分类号： H01L31/0216 , C23C14/00 , G02B5/20
CPC分类号： H01L31/0216 , C23C14/0036 , G02B5/208
摘要： The present invention discloses an optical bandpass filter structure targeting an arbitrary combination of the spectral ranges of R (red), G (green), B (blue) and IR (infrared) light, which comprises a substrate that is a wafer-based semiconductor sensing element, and a filter layer that is formed on one side of the substrate. The filter layer includes a plurality of basic units organized as a two-dimensional array, in which each of the basic units is composed of a plurality of pixel filter films fabricated by a vacuum coating method.
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公开(公告)号：US12048900B2
公开(公告)日：2024-07-30
申请号：US16643356
申请日：2018-09-07
发明人： Shougo Higashi , Keisuke Shigetoh , Atsushi Beniya , Nobuhiko Muramoto , Kazutaka Nishikawa , Shin Tajima , Ryoji Asahi
IPC分类号： B01D69/12 , B01D67/00 , B01D69/10 , B01D71/02 , B01J35/59 , B82Y30/00 , B82Y40/00 , C23C14/00 , C23C14/20 , C25B1/04 , C25B9/73 , D04H1/4209 , F24S70/25
CPC分类号： B01D69/12 , B01D67/00043 , B01D69/1071 , B01D71/0215 , B01D71/0221 , B01D71/0223 , B01D71/02231 , B01D71/02232 , B01D71/024 , B01J35/59 , C25B1/04 , C25B9/73 , D04H1/4209 , B01D2325/0283 , B01D2325/10 , B82Y30/00 , B82Y40/00 , C23C14/0005 , C23C14/20 , F24S70/25
摘要： An inorganic structure body has a free-standing structure including a fibrous member and/or a shell. The fibrous member and/or the shell include a metal and/or an inorganic material and have a three-dimensionally continuous configuration. The free-standing structure may have a structure that is based on a nonwoven fabric or a porous membrane used as a substrate.
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公开(公告)号：US20240209493A1
公开(公告)日：2024-06-27
申请号：US18557430
申请日：2022-03-21
发明人： Christophe Heau , Maxime Villard
IPC分类号： C23C14/34 , C23C14/00 , C23C14/02 , C23C14/06 , C23C14/35 , C23C14/50 , G21C3/07 , G21C21/02 , H01J37/32 , H01J37/34
CPC分类号： C23C14/345 , C23C14/0036 , C23C14/025 , C23C14/0641 , C23C14/357 , C23C14/505 , G21C3/07 , G21C21/02 , H01J37/3244 , H01J37/3405 , H01J37/3426 , H01J2237/332
摘要： The invention relates to a method for depositing a chromium-based material from a target onto a metal substrate, by continuous magnetron sputtering, using a plasma generated in a gas.
According to the invention:
the ratio between the flow of gaseous ions directed toward the substrate and the flow of neutral chromium atoms directed toward the substrate is adjusted to between 0.5 and 1.7; and
a bias voltage of between −50V and −100V is applied to the substrates.-
公开(公告)号：US12018398B2
公开(公告)日：2024-06-25
申请号：US17379406
申请日：2021-07-19
申请人： Kohler Co.
发明人： Sarfaraz Moh , Gary N. Clarke
IPC分类号： C25D5/00 , B05D1/32 , B05D5/06 , C23C2/04 , C23C4/01 , C23C4/02 , C23C4/06 , C23C4/08 , C23C4/18 , C23C14/00 , C23C14/04 , C23C14/06 , C23C14/16 , C23C14/58 , C23C16/00 , C23C16/04 , C23C16/06 , C23C24/04 , C23C24/08 , C23C28/02 , C23C30/00 , C25D5/02 , C25D5/10 , C25D7/00 , B44C1/00 , E03C1/04
CPC分类号： C25D5/627 , B05D1/327 , B05D5/066 , B05D5/068 , C23C2/04 , C23C4/01 , C23C4/02 , C23C4/06 , C23C4/08 , C23C4/18 , C23C14/0015 , C23C14/044 , C23C14/0623 , C23C14/0647 , C23C14/16 , C23C14/165 , C23C14/5873 , C23C16/006 , C23C16/042 , C23C16/06 , C23C24/04 , C23C24/08 , C23C28/02 , C23C28/021 , C23C28/023 , C23C28/028 , C23C30/00 , C25D5/022 , C25D5/10 , C25D7/00 , B44C1/00 , E03C1/0404
摘要： A plumbing fixture having a multi-color appearance includes a first portion including a first finish having a first appearance and a second portion including a second portion having a second appearance that differs from the first appearance. The plumbing fixture further includes a transition region between the first portion and the second portion, wherein the appearance of the third region is graduated from the first appearance to the second appearance between a first end of the transition region adjacent the first portion and a second end of the transition region adjacent the second portion. The plumbing fixture has an ombré appearance as a result of the graduated transition between the first portion and the second portion.
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公开(公告)号：US20240158954A1
公开(公告)日：2024-05-16
申请号：US17772972
申请日：2020-10-27
发明人： Yuya TSUCHIDA , Yuya SUEMOTO , Yoshihiro UEOKA , Masami MESUDA , Hideto KURAMOCHI , Takahiro NAGATA , Liwen SANG , Toyohiro CHIKYOW
IPC分类号： C30B29/68 , C23C14/00 , C23C14/02 , C23C14/06 , C23C14/34 , C23C14/35 , C30B23/02 , C30B25/06 , C30B25/18 , C30B29/40 , H01L21/02 , H01L29/20 , H01L29/205 , H01L33/32 , H01S5/02
CPC分类号： C30B29/68 , C23C14/0036 , C23C14/021 , C23C14/0617 , C23C14/3407 , C23C14/35 , C30B23/025 , C30B25/06 , C30B25/186 , C30B29/403 , C30B29/406 , H01L21/02381 , H01L21/0254 , H01L21/02631 , H01L21/02661 , H01L29/2003 , H01L29/205 , H01L33/32 , H01S5/021
摘要： The present invention provides: a multilayer film structure which has high crystallinity and planarity; and a method for producing this multilayer film structure. This multilayer film structure is provided with: an Si (111) substrate; a first thin film that is arranged on the Si (111) substrate, while being formed of a nitride material and/or aluminum; and a second thin film that is arranged on the first thin film, while being formed of a nitride material. An amorphous layer having a thickness of 0 nm or more but less than 1.0 nm are present on the Si (111) substrate; and the full width at half maximum (FWHM) of a rocking curve of the (0002) plane at the surface of this multilayer film structure is 1.50° or less.
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公开(公告)号：US11971564B2
公开(公告)日：2024-04-30
申请号：US16768289
申请日：2018-07-04
申请人： LG CHEM, LTD.
发明人： Pilsung Jo , Song Ho Jang , Yong Chan Kim , Jeong Woo Shon , Jin Suk Song , Ki Hwan Kim
IPC分类号： C03C17/245 , A45C11/00 , B44F1/04 , B44F1/08 , C23C14/00 , C23C14/18 , C23C14/20 , C23C14/34 , G02B5/08 , G02B5/26 , B44C3/02
CPC分类号： G02B5/26 , A45C11/00 , B44F1/045 , B44F1/08 , C03C17/245 , C23C14/0036 , C23C14/185 , C23C14/205 , C23C14/34 , G02B5/085 , A45C2011/002 , B44C3/02 , C03C2217/72 , C03C2218/11 , C03C2218/155
摘要： A decoration element is described. The decoration element includes a light reflective layer; a light absorbing layer provided on the light reflective layer; and a color developing layer comprising a color film, wherein the color developing layer is provided: on a surface of the light reflective layer opposite to a surface of the light reflective layer facing the light absorbing layer; between the light reflective layer and the light absorbing layer; or on a surface of the light absorbing layer opposite to a surface of the light absorbing layer facing the light reflective layer.
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公开(公告)号：US20240124969A1
公开(公告)日：2024-04-18
申请号：US18537504
申请日：2023-12-12
发明人： Nai-Wen PI , Jinxin FU , Kang LUO , Ludovic GODET
CPC分类号： C23C14/48 , C03C23/0095 , C23C14/0031 , C23C14/021 , C23C14/5873 , G02B6/10
摘要： Embodiments described herein provide for optical devices with methods of forming optical device substrates having at least one area of increased refractive index or scratch resistance. One method includes disposing an etch material on a discrete area of an optical device substrate or an optical device layer, disposing a diffusion material in the discrete area, and removing excess diffusion material to form an optical material in the optical device substrate or the optical device layer having a refractive index greater than or equal to 2.0 or a hardness greater than or equal to 5.5 Mohs.
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