METHOD FOR MANUFACTURING WICK
    3.
    发明公开

    公开(公告)号:US20240316639A1

    公开(公告)日:2024-09-26

    申请号:US18736877

    申请日:2024-06-07

    摘要: Provided is a method for manufacturing a wick, which facilitates control over capillarity of the wick. A method for manufacturing a wick according to the present invention includes: a step of supplying material powder containing metal powder onto a base; a step of heating the material powder on the base to obtain a sintered compact; and a step of rolling the sintered compact. In this situation, when the material powder supplied onto the base is heated to form the sintered compact, the sheet-shaped sintered compact can be formed. Further, when the sintered compact is rolled, a void ratio of the sintered compact can be controlled after forming the sintered compact, thereby controlling the capillarity of the wick 1.

    VAPOR CHAMBER SYSTEM
    5.
    发明公开

    公开(公告)号:US20240302108A1

    公开(公告)日:2024-09-12

    申请号:US18668253

    申请日:2024-05-20

    发明人: Shwin-Chung Wong

    IPC分类号: F28D15/04 F28D15/02 H05K7/20

    摘要: A vapor chamber system, includes a heat source and a vapor chamber device. The vapor chamber device includes a first casing, a second casing, a second capillary structure and a third capillary structure. The first casing includes a first plate, and a first capillary structure. The second casing is stacked on the first casing. The second capillary structure is disposed between the first capillary structure and the supporting posts of the second casing. The third capillary structure is disposed at a zone of the inner surface of the first plate, the zone is within a projection of the heat source projected onto the inner surface, and an area of the zone is smaller than an area of the projection of the heat source.

    Vapor chamber
    6.
    发明授权

    公开(公告)号:US12072152B2

    公开(公告)日:2024-08-27

    申请号:US18241073

    申请日:2023-08-31

    IPC分类号: F28D15/02 F28D15/04

    CPC分类号: F28D15/0233 F28D15/046

    摘要: This disclosure relates to a vapor chamber configured to accommodate a cooling fluid. The vapor chamber includes a first cover, a second cover, a first capillary structure, and a second capillary structure. The second cover and the first cover are attached to each other to form a chamber therebetween. The chamber is configured to accommodate the cooling fluid. The first capillary structure is located in the chamber and stacked on the first cover. The second capillary structure is located in the chamber and stacked on the first capillary structure. The second capillary structure is different from the first capillary structure. A projection of the second capillary structure onto the first cover is smaller than a projection of the first capillary structure onto the first cover.

    THERMAL MANAGEMENT APPARATUS AND METHOD
    10.
    发明公开

    公开(公告)号:US20240255229A1

    公开(公告)日:2024-08-01

    申请号:US18104582

    申请日:2023-02-01

    IPC分类号: F28D15/04 F28D15/02

    摘要: Aspects of the disclosure are directed to thermal management. In accordance with one aspect, an apparatus includes a metal mesh layer; a porous metal powder layer coupled to the metal mesh layer; and a metal substrate coupled to the porous metal powder layer. In accordance with one aspect, a method includes introducing a working fluid from a condenser structure into a boiler structure to generate a vaporized fluid; transporting the vaporized fluid through a hybrid wick structure coupled to the boiler structure to generate a pressurized fluid; and injecting the pressurized fluid into the condenser structure to convert the pressurized fluid into a condensed fluid.