公开(公告)号：US11289362B2

公开(公告)日：2022-03-29

申请号：US16779967

申请日：2020-02-03

申请人： NIKON CORPORATION

发明人： Go Ichinose ,  Taisuke Ibe

IPC分类号： G03B27/52 ,  H01L21/683 ,  H01L21/687 ,  B25J11/00 ,  G03F7/20

摘要： In a carrier system, a chuck unit is used to hold a placed wafer from above, and vertical-motion pins use suction to hold the wafer from below. Then, the chuck unit and the vertical-motion pins are subsequently lowered until a bottom surface of the wafer comes into contact with a wafer table. During the lowering, the holding force exerted by the chuck unit and the arrangement of chuck members are optimally adjusted such that, as a result of the restraint of the wafer by the chuck unit and the vertical-motion pins, localized surplus-restraint is imparted to the wafer, and warping does not occur.

公开(公告)号：US11169451B2

公开(公告)日：2021-11-09

申请号：US16846431

申请日：2020-04-13

申请人： FUJIFILM Corporation

发明人： Yoshihisa Usami ,  Shinichiro Sonoda ,  Hirotoshi Yoshizawa

IPC分类号： G03F7/20 ,  G02B5/28 ,  G03F7/004 ,  G03B17/52 ,  G03B27/52 ,  G03B27/32

摘要： An image exposure device includes an image display device having pixels that emit light having a plurality of wavelengths; a photosensitive recording medium support portion that supports a photosensitive recording medium for recording an image of the image display device; a collimation portion that is disposed between the image display device and the photosensitive recording medium support portion and makes radiation light including the light having a plurality of wavelengths radiated from the pixels into first transmitted light radiated within a range of a first radiation angle narrower than a radiation angle of the radiation light; and a dichroic filter that is disposed between the collimation portion and the photosensitive recording medium support portion, and makes the first transmitted light including the light having a plurality of wavelengths into second transmitted light radiated within a range of a second radiation angle equal to or smaller than the first radiation angle.

公开(公告)号：USRE48668E1

公开(公告)日：2021-08-03

申请号：US15711901

申请日：2017-09-21

申请人： ASML NETHERLANDS B.V.

发明人： Thibault Simon Mathieu Laurent ,  Gerardus Adrianus Antonius Maria Kusters ,  Johan Gertrudis Cornelis Kunnen ,  Sander Catharina Reinier Derks

IPC分类号： G03B27/52 ,  G01K13/00 ,  G03F7/20 ,  G03B27/42

摘要： A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20° C. in at least one direction.

公开(公告)号：US11048173B2

公开(公告)日：2021-06-29

申请号：US16849353

申请日：2020-04-15

申请人： Carl Zeiss SMT GmbH

发明人： Florian Baumer

IPC分类号： G03B27/52 ,  G03B27/54 ,  G03B27/58 ,  G03F7/20

摘要： A method for restoring an illumination system installed in an EUV apparatus is provided.

公开(公告)号：US20210088912A1

公开(公告)日：2021-03-25

申请号：US17112278

申请日：2020-12-04

申请人： ASML NETHERLANDS B.V.

发明人： Cornelius Maria ROPS ,  Walter Theodorus Matheus STALS ,  David BESSEMS ,  Giovanni Luca GATTOBIGIO ,  Victor Manuel BLANCO CARBALLO ,  Erik Henricus Egidius Catharina EUMMELEN ,  Ronald VAN DER HAM ,  Frederik Antonius VAN DER ZANDEN ,  Wilhelmus Antonius WERNAART

IPC分类号： G03F7/20 ,  B01D19/00 ,  G03B27/52

摘要： A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.

公开(公告)号：US10788755B2

公开(公告)日：2020-09-29

申请号：US16229102

申请日：2018-12-21

申请人： ASML NETHERLANDS B.V.

发明人： Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Helmar Van Santen

IPC分类号： G03B27/52 ,  G03F7/20

摘要： A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

公开(公告)号：US10698309B2

公开(公告)日：2020-06-30

申请号：US16423920

申请日：2019-05-28

申请人： Primax Electronics Ltd.

发明人： Yun-Yi Lin ,  Mu-Jung Wang

IPC分类号： G03B27/54 ,  G03B27/52

摘要： A light source module of a photo printer includes a first micro light source, a second micro light source, a rod lens array and a microlens. The first micro light source emits a first light beam. The second micro light source emits a second light beam. The rod lens array is arranged between the first micro light source, the second micro light source and a film paper. The microlens is arranged between the first micro light source, the second micro light source and the rod lens array. The microlens is used for converging the projection angles of the first light beams and the second light beam. The microlens has an optical axis. The second micro light source is arranged along the optical axis. The first micro light source is arranged beside a first side of the optical axis.

公开(公告)号：US20200166851A1

公开(公告)日：2020-05-28

申请号：US16778635

申请日：2020-01-31

申请人： ASML Netherlands B.V.

发明人： Cornelius Maria ROPS ,  Walter Theodorus Matheus STALS ,  David BESSEMS ,  Giovanni Luca GATTOBIGIO ,  Victor Manuel BLANCO CARBALLO ,  Erik Henricus Egidius Catharina EUMMELEN ,  Ronald VAN DER HAM ,  Frederik Antonius VAN DER ZANDEN ,  Wilhelmus Antonius WERNAART

IPC分类号： G03F7/20 ,  B01D19/00 ,  G03B27/52

摘要： A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.

公开(公告)号：US10586728B2

公开(公告)日：2020-03-10

申请号：US16268034

申请日：2019-02-05

申请人： NIKON CORPORATION

发明人： Go Ichinose ,  Taisuke Ibe

IPC分类号： G03B27/52 ,  H01L21/683 ,  H01L21/687 ,  B25J11/00 ,  G03F7/20

摘要： In a carrier system, a chuck unit is used to hold a placed wafer from above, and vertical-motion pins use suction to hold the wafer from below. Then, the chuck unit and the vertical-motion pins are subsequently lowered until a bottom surface of the wafer comes into contact with a wafer table. During the lowering, the holding force exerted by the chuck unit and the arrangement of chuck members are optimally adjusted such that, as a result of the restraint of the wafer by the chuck unit and the vertical-motion pins, localized surplus-restraint is imparted to the wafer, and warping does not occur.

公开(公告)号：US10585363B2

公开(公告)日：2020-03-10

申请号：US15575069

申请日：2016-03-14

申请人： ASML Netherlands B.V.

发明人： Simon Gijsbert Josephus Mathijssen ,  Arie Jeffrey Den Boef ,  Alessandro Polo ,  Patricius Aloysius Jacobus Tinnemans ,  Adrianus Johannes Hendrikus Schellekens ,  Elahe Yeganegi Dastgerdi ,  Willem Marie Julia Marcel Coene ,  Erik Willem Bogaart ,  Simon Reinald Huisman

IPC分类号： G03B27/52 ,  G03B27/68 ,  G03F9/00 ,  G03F7/20

摘要： An alignment system, method and lithographic apparatus are provided for determining the position of an alignment mark, the alignment system comprising a first system configured to produce two overlapping images of the alignment mark that are rotated by around 180 degrees with respect to one another, and a second system configured to determine the position of the alignment mark from a spatial distribution of an intensity of the two overlapping images.