公开(公告)号：US08443513B2

公开(公告)日：2013-05-21

申请号：US12895576

申请日：2010-09-30

申请人： Seiki Ishida ,  Yukiyoshi Saito

发明人： Seiki Ishida ,  Yukiyoshi Saito

IPC分类号： G03D5/04 ,  G03D5/00 ,  G03B27/32

CPC分类号： H01L21/67184 ,  H01L21/67051 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67742 ,  Y10T29/53313 ,  Y10T29/53365 ,  Y10T29/534

摘要： Disclosed is a substrate processing apparatus which can achieve an improvement in throughput and suppress the reduction in the operation rate of the entire apparatus even when a problem occurs. In the disclosed apparatus, at the rear end of a substrate loading block including a loading/unloading arm for transferring a wafer to a carrier, a first, a second, and a third processing blocks are disposed in that order. In the substrate loading block, transfer stages are provide for transferring a wafer from the loading/unloading arm to the first processing block, for transferring a wafer to the second processing block, and for transferring a wafer to the third processing block so that the wafer on the transfer stage is directly carried to the second processing block by a first direct carrying mechanism, and to the third processing block by a second direct carrying mechanism.

摘要翻译： 公开了即使发生问题，也能够实现吞吐量的提高并且抑制整个装置的操作速率的降低的基板处理装置。 在所公开的装置中，在包括用于将晶片传送到载体的装载/卸载臂的基板装载块的后端处，按照该顺序设置第一，第二和第三处理块。 在基板装载块中，提供传送级用于将晶片从装载/卸载臂传送到第一处理块，用于将晶片传送到第二处理块，以及将晶片传送到第三处理块，使得晶片 通过第一直接承载机构将第二处理块直接传送到第二处理块，并通过第二直接传送机构传送到第三处理块。

公开(公告)号：US20120057861A1

公开(公告)日：2012-03-08

申请号：US13219955

申请日：2011-08-29

申请人： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida

发明人： Nobuaki Matsuoka ,  Akira Miyata ,  Shinichi Hayashi ,  Suguru Enokida

IPC分类号： G03D5/04

CPC分类号： H01L21/6715 ,  G03F7/16 ,  G03F7/3021 ,  H01L21/67178 ,  H01L21/67184

摘要： In one embodiment, a coating and developing apparatus is provided with a processing block including a liquid processing block disposed on the carrier block side and a heating processing block disposed on the interface block side. The liquid processing block includes a first unit block, a second unit block, and one or more of developing unit blocks overlying or underlying a stack of the first unit block and the second unit block. The first unit block includes antireflection film-forming modules and resist film-forming modules disposed on both sides of the transport passage thereof. The second unit block includes upper film-forming modules and hardening modules disposed on both sides of the transport passage thereof.

摘要翻译： 在一个实施例中，涂覆和显影装置设置有处理块，其包括设置在承载块侧的液体处理块和设置在界面块侧上的加热处理块。 液体处理块包括第一单元块，第二单元块以及覆盖在第一单元块和第二单元块的堆叠之下或下面的一个或多个显影单元块。 第一单元块包括设置在其输送通道两侧的防反射膜形成模块和抗蚀剂膜形成模块。 第二单元块包括设置在其输送通道两侧的上成膜模块和硬化模块。

公开(公告)号：US07955011B2

公开(公告)日：2011-06-07

申请号：US11733441

申请日：2007-04-10

申请人： Nobuaki Matsuoka ,  Yasushi Hayashida ,  Shinichi Hayashi

发明人： Nobuaki Matsuoka ,  Yasushi Hayashida ,  Shinichi Hayashi

IPC分类号： G03D5/04

CPC分类号： H01L21/67745 ,  H01L21/67178

摘要： A coating and developing apparatus is provided which requires a smaller occupation space even when it incorporates a substrate inspection unit, while eliminating a disadvantageous layout. A coating film forming part B3 including a plurality of process units and transfer mechanisms A3 and A4, and a developing part B1 including a plurality of process units 31 and a transfer mechanism A1 are vertically arranged in a process block S2. There are disposed in the process block S2 on a side of a carrier block S1, a plurality of vertically arranged transfer units TRS for transferring a substrate W between the same and transfer mechanisms for the respective parts, and a vertically movable transfer mechanism D1 for the transfer unit for transferring a substrate between these transfer units. At least one of the coating film forming part and the developing part includes a substrate inspection unit 43 for inspecting a substrate transferred by the transfer mechanism for the corresponding part.

摘要翻译： 提供了一种涂覆和显影装置，即使当其包含基板检查单元时也需要较小的占用空间，同时消除不利的布局。 包括多个处理单元和转印机构A3和A4的涂膜形成部分B3和包括多个处理单元31和转印机构A1的显影部分B1垂直地布置在处理块S2中。 在载体块S1的一侧设置有处理块S2，多个垂直设置的传送单元TRS，用于将基板W传送到相应部件的传送机构和用于各部件的传送机构之间， 转印单元，用于在这些转印单元之间转印衬底。 涂膜形成部和显影部中的至少一个包括用于检查由相应部分的转印机构转印的基板的基板检查单元43。

公开(公告)号：US20090199870A1

公开(公告)日：2009-08-13

申请号：US12425611

申请日：2009-04-17

申请人： Brett Robert Dickerson ,  Timothy Robert Hall ,  Robert R. Sheperd, II ,  Diana Patricia Foltz ,  Michael Steven Misura

发明人： Brett Robert Dickerson ,  Timothy Robert Hall ,  Robert R. Sheperd, II ,  Diana Patricia Foltz ,  Michael Steven Misura

IPC分类号： B08B1/02 ,  G03D5/04

CPC分类号： B08B1/02 ,  B08B1/04 ,  B08B11/04 ,  C03C23/0075

摘要： A glass sheet washing machine with a broken glass removal system includes a support, a liquid container or reservoir, a pump, a liquid applicator, and a liquid permeable member. The support supports a glass sheet being washed. The liquid reservoir is positioned below the support. The pump is coupled to the liquid reservoir. The liquid applicator is coupled to the pump. The liquid applicator applies the liquid from the liquid reservoir to wash the glass sheet. Excess liquid falls into the reservoir. The liquid permeable member is positioned between the support and the liquid reservoir to catch pieces of glass to inhibit the pieces of broken glass from falling into the liquid reservoir and is moved to remove the pieces from the glass washing machine.

摘要翻译： 具有破碎玻璃去除系统的玻璃板洗衣机包括支撑件，液体容器或储存器，泵，液体施加器和液体可渗透构件。 支撑件支撑被洗涤的玻璃板。 液体储存器位于支撑件下方。 泵联接到液体储存器。 液体施加器联接到泵。 液体施加器从液体储存器施加液体以洗涤玻璃板。 过多的液体掉入水箱。 液体可渗透构件位于支撑件和液体储存器之间以捕获玻璃片，以阻止碎玻璃碎片落入液体储存器中并移动以从玻璃洗衣机中移除碎片。

公开(公告)号：US20050238350A1

公开(公告)日：2005-10-27

申请号：US11111141

申请日：2005-04-20

申请人： Wen-Cheng Hsu ,  Ching-Lung Wang ,  Yu-Ying Chan ,  Tseng-Kuei Tseng

发明人： Wen-Cheng Hsu ,  Ching-Lung Wang ,  Yu-Ying Chan ,  Tseng-Kuei Tseng

IPC分类号： G03D5/04 ,  G03D9/00 ,  G03F7/00 ,  G03F7/20 ,  G03F7/30 ,  G03F7/32

CPC分类号： G03F7/32 ,  G03D5/04 ,  G03F7/0007 ,  G03F7/30 ,  G03F7/322

摘要： An apparatus (3) for removing developing solution from a substrate (30) includes a working table (36) for placing the substrate, a supporting frame (33) positioned on the working table, a gas dispensing nozzle (31) mounted on the supporting frame, and a water dispensing nozzle (32) mounted on the supporting frame. The apparatus can remove the residual developing solution from the substrate and needs not to lift the substrate. The substrate is safely processed and the working time is improved.

摘要翻译： 一种用于从基板（30）去除显影液的装置（3），包括：放置基板的工作台（36），位于工作台上的支撑框架（33），安装在支撑件上的气体分配喷嘴 框架和安装在支撑框架上的水分配喷嘴（32）。 该装置可以从基板上除去残留的显影液，并且不需要提起基板。 基板被安全处理，工作时间得到改善。

公开(公告)号：US20050180745A1

公开(公告)日：2005-08-18

申请号：US10780305

申请日：2004-02-17

申请人： Ralph Piccinino ,  Daniel Pagano

发明人： Ralph Piccinino ,  Daniel Pagano

IPC分类号： G03C3/00 ,  G03D3/08 ,  G03D5/00 ,  G03D5/04

CPC分类号： G03D5/04

摘要： The present invention relates to a photographic processor and a method of processing photographic material. The photographic processor is adapted to achieve a high speed processing of photographic material by utilizing the combination of a vacuum platen and a stacker arrangement that is adapted to hold the media for a time necessary to process and/or dry the media. The system of the present invention permits media to be fed to a first vacuum platen where a first solution is applied. The platen is adapted transport the media to a first vertical stacker arrangement, which holds the media for a desired processing time for the first solution. The media can then be pushed through a stop solution, if needed, and onto a second vacuum platen where a second solution can be applied. The media is then delivered to second vertical stacker arrangement that is designed to assure the proper amount of processing time for the second solution.

摘要翻译： 本发明涉及一种照相处理器和一种处理照相材料的方法。 照相处理器适于通过利用真空压板和堆叠器装置的组合来实现照相材料的高速处理，该组合适于将介质保持在处理和/或干燥介质所需的时间。 本发明的系统允许将介质供给到施加第一溶液的第一真空压板。 压板适于将介质输送到第一垂直堆叠器装置，其将介质保持用于第一解决方案的期望处理时间。 然后，如果需要，可以将介质推入停止溶液，并且可以将第二溶液施加到第二真空压板上。 然后将介质输送到第二垂直堆叠器布置，其被设计为确保第二解决方案的适当的处理时间量。

公开(公告)号：US20050175336A1

公开(公告)日：2005-08-11

申请号：US10776747

申请日：2004-02-11

申请人： Kosta Selinidis ,  Paul Winberg ,  Joseph Gault

发明人： Kosta Selinidis ,  Paul Winberg ,  Joseph Gault

IPC分类号： G03D5/04 ,  G03D13/00 ,  G03D13/02

CPC分类号： G03D5/04 ,  G03D13/02

摘要： A digital film processing system and film processing solution or development cartridge are disclosed. The cartridge comprises a housing and a chamber for storing a film processing fluid. The cartridge may also include an applicator nozzle for coating the processing solution onto undeveloped film. The system includes a cleaning and capping device or arrangement that is adapted to clean and seal an opening of the applicator nozzle.

摘要翻译： 公开了一种数字胶片处理系统和胶片处理解决方案或显影盒。 盒包括壳体和用于存储膜处理流体的室。 墨盒还可以包括用于将处理溶液涂覆到未显影的薄膜上的涂抹器喷嘴。 该系统包括适于清洁和密封施用喷嘴的开口的清洁和封盖装置或装置。

公开(公告)号：US06913404B2

公开(公告)日：2005-07-05

申请号：US10378062

申请日：2003-03-03

申请人： Richard A. Patterson ,  Joseph B. Gault ,  John J. Straigis ,  William D. Mapel ,  Michael R. Thering ,  G. Gregory Mooty ,  Patrick W. Lea ,  Kosta S. Selinidis ,  Steven K. Brown ,  Homero Saldana ,  Eric C. Segerstrom ,  Stacy S. Cook ,  Leland A. Lester

发明人： Richard A. Patterson ,  Joseph B. Gault ,  John J. Straigis ,  William D. Mapel ,  Michael R. Thering ,  G. Gregory Mooty ,  Patrick W. Lea ,  Kosta S. Selinidis ,  Steven K. Brown ,  Homero Saldana ,  Eric C. Segerstrom ,  Stacy S. Cook ,  Leland A. Lester

IPC分类号： G03D5/04 ,  G03B27/46 ,  G03D5/06 ,  H04N1/00 ,  G03D3/02 ,  G03D5/00

CPC分类号： H04N1/00259 ,  G03D5/06 ,  H04N1/00249 ,  H04N1/00267

摘要： A digital film processing system and film processing solution cartridge are disclosed. The cartridge comprises a housing and a chamber for storing a film processing fluid. The processing solution may be contained within a flexible bladder within the chamber. The cartridge may also include an integral applicator for coating the processing solution onto undeveloped film. The cartridge is generally removeably attached to the film processing system, but may also be refillable.

摘要翻译： 公开了一种数字胶片处理系统和胶片处理液盒。 盒包括壳体和用于存储膜处理流体的室。 处理溶液可以包含在腔室内的柔性囊内。 盒还可以包括用于将处理溶液涂覆到未显影的膜上的整体施用器。 盒通常可移除地附接到胶片处理系统，但是也可以是可再填充的。

公开(公告)号：US20050061625A1

公开(公告)日：2005-03-24

申请号：US10978731

申请日：2004-11-02

申请人： Ryoei Nozawa ,  Akinori Kimura ,  Shinichi Matsuda ,  Takayuki Iwamoto ,  So Konno ,  Toshihiro Suya ,  Hideto Yamamoto ,  Miyuki Endou

发明人： Ryoei Nozawa ,  Akinori Kimura ,  Shinichi Matsuda ,  Takayuki Iwamoto ,  So Konno ,  Toshihiro Suya ,  Hideto Yamamoto ,  Miyuki Endou

IPC分类号： G03D5/04 ,  B65G37/00

CPC分类号： G03D5/04

摘要： A photosensitive material processing device for processing a photosensitive material with a processing liquid while conveying the photosensitive material by a roller pair. A driving device for providing a rotation drive to the roller pair. A drive controlling device that gradually raises voltage of the electric power at the time of starting the rotation drive of the roller pair.

摘要翻译： 一种感光材料处理装置，用于在通过辊对输送感光材料的同时用处理液处理感光材料。 一种用于向辊对提供旋转驱动的驱动装置。 驱动控制装置，其在开始辊对的旋转驱动时逐渐升高电力的电压。

公开(公告)号：US6102588A

公开(公告)日：2000-08-15

申请号：US795836

申请日：1996-02-08

申请人： Bartholomeus Verlinden ,  Patrick Van den Bergen

发明人： Bartholomeus Verlinden ,  Patrick Van den Bergen

IPC分类号： G03D3/00 ,  G03D3/13 ,  G03D5/04 ,  G03D3/08 ,  G03D3/02

CPC分类号： G03D5/04 ,  G03D3/132

摘要： An apparatus for the processing of photographic sheet material comprises a plurality of treatment cells (12.sup.1, 12.sup.2, 12.sup.3) mounted one beside another to define a substantially horizontal sheet material path (14). Each cell comprises a housing (16) having a sheet material inlet (18) and a sheet material outlet (20) each being closed by a rotatable path-defining roller (28) biased into contact with a reaction surface (26) to form a nip (30) there-between through which the sheet material path (14) extends. The apparatus is characterized by sealing means (33) to seal each path-defining roller (28) to the housing (16) and means (36) to define a static liquid level (S) above the nip plane (P).

摘要翻译： 用于处理照相片材的装置包括多个处理单元（121,122,123），该处理单元彼此安装以限定基本上水平的片材路径（14）。 每个单元包括具有片材入口（18）和片材出口（20）的壳体（16），每个单元由可偏转与反应表面（26）接触的可旋转路径限定辊（28）封闭，以形成 夹层（30）之间，片材材料路径（14）延伸穿过该间隙。 该装置的特征在于密封装置（33）以将每个路径限定辊（28）密封到壳体（16）和装置（36）以限定压区（P）上方的静态液位（S）。