摘要:
A semiconductor device includes: a capacitor: an access transistor with impurity regions, controlling input/output of charge stored in the capacitor, one of the impurity regions being electrically connected to the capacitor; a latch circuit located above a silicon substrate, and storing the potential of a storage node of the capacitor; and a bit line connected to the other of the impurity regions of the access transistor T6. At least a portion of the latch circuit is formed above the bit line.
摘要:
A semiconductor integrated circuit device utilizing a memory cell containing a transistor to write information and a storage MOSFET to retain an information voltage in the gate, a word line placed to intersect with a write data line and a read data line, for connecting to the control terminal of the write transistor and a memory cell array for issuing an output on the read data line corresponding to the read signal from said memory cell in response to a select signal from said write transistor and by means of a data select circuit select one from among said plurality of read data lines from the data line select circuit and connect to either a first or second common data line, precharge said read data line to a first voltage within a first period, discharge said read data line to a second voltage by means of a second storage MOSFET of said memory cell set to on status for said word line selected within the second period, precharge said first and second common data lines to a third voltage between said first and said second voltages within said first period and, amplify the read signal appearing on either of the common data lines from the read data line selected by said data line select circuit within said second period by using the precharge voltage on said other common data line as a reference voltage.
摘要:
A method for writing data to single-transistor capacitorless (1T/0C) RAM cell, wherein the cell structure is predicated on an SOI MOS transistor that has a floating body region (12). Data is written to the cell by the instigation of band-to-band tunneling (BTBT) and the resulting generation of hole/electron pairs. Electrons are drawn from the body region through forward-biased drain (14) and source (15) regions so that holes accumulate in the body region. The increase in threshold voltage, caused by the accumulation of holes, may be defined and detected as a logic level (ONE, for example). In one embodiment, a split biasing scheme applies substantially identical voltages to the drain and to the source and a negative bias to the gate. In alternative embodiments, a negative gate bias is not required and the drain and source bias voltages may be offset so as to mitigate source damage.
摘要:
In order to operate an integrated dynamic memory having a memory cell array having bit lines and word lines a plurality of individual actions—to be performed for a memory access—from the activation of one of the word lines up to the precharging of the word lines are controlled in a synchronized manner with a clock signal. A value for defining a defined number of clock cycles between at least two individual actions is programmed at the beginning. For this purpose, a control circuit has a programmable unit. In this way, in conjunction with a clocked circuit, a comparatively high data throughput is made possible even at variable clock frequencies.
摘要:
A ROM embedded DRAM allows hard programming of ROM cells by shorting DRAM capacitor plates during fabrication. In one embodiment, the intermediate dielectric layer is removed and the plates are shorted with a conductor. In another embodiment, an upper conductor and dielectric are removed and a conductor is fabricated in contact with the DRAM storage plate. The memory allows ROM cells to be hard programmed to different data states, such as Vcc and Vss.
摘要:
A dynamic random access memory (DRAM) cell and associated array are disclosed. The DRAM cell (300) includes a storage capacitor (304) and a pass transistor (302). The pass transistor (302) includes a source region (322), drain region (320) and channel region (324). A top gate (318) is disposed over the channel region (324) and a bottom gate (310) is disposed below the channel region (324). The top gate (318) and bottom gate (310) are commonly driven to provide greater control of the pass transistor (302) operation, including an off state with reduced source-to-drain leakage. The DRAM array (400) includes memory cells (414) having pass transistors (500) with double-gate structures. Memory cells (414) within the same row are commonly coupled to a top word line and bottom word line. The resistance of the top and bottom word lines is reduced by a word line strap layer (600). The DRAM array (400) further includes a strapping area that is void of memory cells. Conductive contact between the top word line bottom word line, and word line strap layer (600) of each row is made within the strapping area by way of strapping vias (604) and top-to-bottom word line vias (602).
摘要:
A fast DRAM memory uses ground-sensing as opposed to traditional Vdd/2 sensing. A selected DRAM cell connects to a bit-line true (BLT) or a bit-line complement (BLC). At the start of each cycle the BLT and BLC are restored to ground potential. A pair of alternating reference cells are provided for each bit-line. When a selected DRAM cell is connected either BLT or BLC the first reference cell in the pair is connected to the other bitline to provide a reference voltage to the other bitline which can be compared to the voltage provided by the selected DRAM cell. On a subsequent cycle using the same bitline the second reference cell in the pair is used. Thus it is not necessary to wait for the first reference cell to recharge prior to beginning the next cycle. Switching between the first and second reference cells in the pair alternates in this manner resulting in faster cycle time. The write-back of the reference cells can be hidden since an alternate cell is available for next cycle's reference bitline generation.
摘要:
Memory devices and other integrated circuit devices having a first capacitor and a second capacitor with an interposing selective isolation device, and methods of their operation. A selective isolation device is a device selectively in a state of conductance or non-conductance. When the selective isolation device is in a state of conductance, the first capacitor is coupled to the second capacitor. When the selective isolation device is in a state of non-conductance, the first capacitor is electrically isolated from the second capacitor. In memory devices, such parallel coupling of adjacent storage capacitors of adjacent memory cells is useful in increasing beta ratio and providing defect isolation. Such coupling of adjacent storage capacitors generally reduces the number of uniquely addressable memory cells.
摘要:
To provide a DRAM circuit capable of achieving a high speed write operation even when the write operation is accompanied with a write masking operation, and a method of controlling the same. A DRAM circuit of the present invention has a novel column switch for connecting a bit line pair and a data line pair via a sense amplifier. The novel column switch has a function to separate a bit line pair corresponding to a selected data line pair during the write mask operation. As a result, even if the column switch is made to be ON before the it line pair is sufficiently amplified by the sense amplifier, there is no fear that data on the bit line pair is destroyed due to a malfunction of the sense amplifier, thus making it possible to achieve a high speed write operation without depending on whether the write masking operation in the DRAM circuit is performed or not.
摘要:
A planar capacitor for use within a dynamic random access memory (DRAM) cell is operated within semiconductor depletion during normal storage operations to increase the charge retention time of the capacitor. Operation within semiconductor depletion allows a significant increase in charge retention time in a capacitor for which gate oxide leakage is the predominant leakage mechanism. The voltages that are applied to the storage cell during DRAM operation are controlled so that the storage capacitor within the cell remains in depletion during storage of both a logic zero and a logic one. Although the capacitance of the cell is decreased by operating in depletion, the charge retention time of the cell can be increased by multiple orders of magnitude. In one application, the inventive structures and techniques are implemented within a DRAM device that is embedded within logic circuitry.