公开(公告)号：US12085860B2

公开(公告)日：2024-09-10

申请号：US17150685

申请日：2021-01-15

申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

发明人： Tai-Yu Chen ,  Heng-Hsin Liu ,  Li-Jui Chen ,  Shang-Chieh Chien

IPC分类号： G03F7/00 ,  G21K1/06 ,  H05G2/00

CPC分类号： G03F7/70033 ,  G03F7/7055 ,  G03F7/7085 ,  G03F7/70916 ,  G21K1/065 ,  H05G2/005 ,  H05G2/008

摘要： A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become a plasma and emit extreme ultraviolet radiation. An array of sensors sense the extreme ultraviolet radiation and charged particles emitted by the droplets. A control system analyses sensor signals from the sensors and adjusts plasma generation parameters responsive to the sensor signals.

公开(公告)号：US20240221969A1

公开(公告)日：2024-07-04

申请号：US17300329

申请日：2023-06-15

申请人： INCOHERENT VISION INC.

发明人： Dusan SARENAC ,  Dmitry PUSHIN

IPC分类号： G21K1/06

CPC分类号： G21K1/06

摘要： There is described a structured wave generator generally having a neutron source generating a neutron beam having a propagation axis and a lateral coherence length extending perpendicular to the propagation axis; and a substrate spaced-apart from the neutron source, the substrate having an array of phase gratings distributed on the substrate for receiving the neutron beam, each phase grating having a body made of a grating material and having a holographic profile, the holographic profile having an in-plane dimension being equal or smaller than the lateral coherence length of the neutron beam, wherein when the neutron beam interacts with the array of phase gratings, at least a portion of the neutron beam diffracts to form a structured wave.

公开(公告)号：US11984236B2

公开(公告)日：2024-05-14

申请号：US16743025

申请日：2020-01-15

申请人： ASML NETHERLANDS B.V.

发明人： Han-Kwang Nienhuys ,  Rilpho Ludovicus Donker ,  Gosse Charles De Vries

IPC分类号： G03F7/00 ,  G02B5/02 ,  G21K1/06 ,  H01S3/23 ,  H05G2/00

CPC分类号： G21K1/067 ,  G02B5/0221 ,  G02B5/0268 ,  G02B5/0284 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70991 ,  G03F7/70191 ,  G21K2201/064 ,  H01S3/2308 ,  H05G2/008

摘要： A radiation system includes a beam splitting apparatus configured to split a main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.

公开(公告)号：US11976924B2

公开(公告)日：2024-05-07

申请号：US17288483

申请日：2019-10-28

申请人： IXBLUE ,  INSTITUT D'OPTIQUE GRADUATE SCHOOL ,  CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE ,  UNIVERSITE DE BORDEAUX

发明人： David Brynle Barrett ,  Pierrick Cheiney ,  Philippe Bouyer

IPC分类号： G01C19/58 ,  G01P15/093 ,  G01P15/18 ,  G21K1/06

CPC分类号： G01C19/58 ,  G01P15/093 ,  G01P15/18

摘要： Disclosed is a multi-axis atom interferometer system, including a source of cold atoms, a laser source generating a first light pulse configured in such a way as to spatially split the source of cold atoms into a first cloud of atoms propagating along a first trajectory along a first axis and a second cloud of atoms propagating along a second trajectory along a second axis, a second light pulse adapted to spatially deflect the first trajectory along the second axis and simultaneously the second trajectory along the first axis towards a first point and a last light pulse adapted to recombine the at least one part of the first cloud of atoms and the at least one part of the second cloud of atoms at the first point, and a detection system measuring an interferometric phase-shift accumulated between the first light pulse and the last light pulse.

公开(公告)号：US11972875B2

公开(公告)日：2024-04-30

申请号：US17762477

申请日：2020-09-23

申请人： CONVERGENT R.N.R. LTD

发明人： Shirly Borukhin ,  Michael Kleckner ,  Aharon Bar-David ,  Zeev Harel

IPC分类号： G21K1/06 ,  B23H7/02 ,  B23H9/00

CPC分类号： G21K1/06 ,  B23H7/02 ,  B23H9/008 ,  G21K2201/062

摘要： A method of manufacturing burr-edged reflecting tile elements for a mosaic X-ray lens configured for forming an X-ray beam comprises steps of: (a) providing a single crystal having first and second faces thereof being parallel therebetween; single crystal having crystallographic planes thereof being parallel to first and second faces of the single crystal; the first face dedicated for reflecting an X-ray beam to be incident thereto; (b) cutting the single crystal by means of a wire electrical discharging machine normally to the main faces. The step of cutting the single crystal comprises moving a wire within a cut in direction from the second face to the first face; such that burrs configured for reflecting the X-ray beam to be incident thereto are formed on edges of the cut.

公开(公告)号：US11940276B2

公开(公告)日：2024-03-26

申请号：US17177895

申请日：2021-02-17

申请人： Government of the United States of America, as represented by the Secretary of Commerce

发明人： John Edward Kitching ,  Elizabeth Ann Donley ,  Azure Lynn Hansen ,  Yun-Jhih Chen

IPC分类号： G01C19/62 ,  G01B9/02015 ,  G01P15/093 ,  G21K1/06 ,  G21K1/12 ,  G01C19/64

CPC分类号： G01C19/62 ,  G01B9/0203 ,  G01P15/093 ,  G21K1/067 ,  G21K1/12 ,  G01C19/64

摘要： An inertial point-source matter-wave atom interferometer gyroscope includes an analyzer that receives fringe images of gyroscope atoms and includes: a first fringe image that includes a first fringe phase, a second fringe image that includes a second fringe phase; and a third fringe image that includes a third fringe phase, wherein the first fringe phase, the second fringe phase, and the third fringe phase are different; a phase mapper of the analyzer that produces a interferometric phase map for the gyroscope atoms from the fringe images of the gyroscope atoms; and a fitter of the analyzer in communication with the phase mapper and that receives the interferometric phase map from the analyzer and determines inertial parameters of the gyroscope atoms from the interferometric phase map, the inertial parameters including an acceleration and a rotation rate of the inertial point-source matter-wave atom interferometer gyroscope relative to the gyroscope atoms.

公开(公告)号：US11924955B2

公开(公告)日：2024-03-05

申请号：US18052129

申请日：2022-11-02

申请人： Gigaphoton Inc.

发明人： Yoshiyuki Honda

IPC分类号： H05G2/00 ,  G03F7/00 ,  G21K1/06

CPC分类号： H05G2/008 ,  G03F7/70033 ,  G03F7/70191 ,  G03F7/70533 ,  G21K1/067 ,  H05G2/003

摘要： An extreme ultraviolet light generation apparatus includes a target supply unit configured to output a droplet target into a chamber device, a prepulse laser light irradiation system configured to irradiate the droplet target with prepulse laser light having linear polarization to generate a diffusion target, and a main pulse laser light irradiation system configured to irradiate the diffusion target with main pulse laser light to generate extreme ultraviolet light. Here, a cross section perpendicular to an optical axis of the main pulse laser light when being radiated to the diffusion target having a shape longer in a polarization direction of the prepulse laser light when being radiated to the droplet target than in directions other than the polarization direction.

公开(公告)号：US20240062928A1

公开(公告)日：2024-02-22

申请号：US17892020

申请日：2022-08-19

申请人： UChicago Argonne, LLC

发明人： Ayman H. Said ,  Thomas Gog ,  Jung Ho Kim ,  Emily K. Aran

IPC分类号： G21K1/06

CPC分类号： G21K1/06 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

摘要： The invention provides a method for fabricating analyzers, the method comprising providing a radiation manipulating material on a first surface of a flexible support; contacting a second surface of the flexible support to a permeable mold, wherein the mold has a first flexible support contact surface and a second surface; and applying negative pressure to the second side of the flexible support to cause the flexible support to conform to the first flexible support contact surface of the mold. Also provided is a system for fabricating crystal analyzers, the system comprising crystal structures reversibly attached to a flexible support; a porous mold reversibly contacting the flexible support, wherein the mold defines a topography; and a negative pressure applied to the flexible support to cause the crystal structures to conform to the topography.

公开(公告)号：US11852984B2

公开(公告)日：2023-12-26

申请号：US18164835

申请日：2023-02-06

申请人： Samsung Electronics Co., Ltd.

发明人： Sunghyup Kim ,  Ho Yu ,  Jeonggil Kim ,  Minseok Choi

IPC分类号： G03F7/00 ,  H05G2/00 ,  G21K1/06

CPC分类号： G03F7/70916 ,  G03F7/70033 ,  G03F7/70891 ,  G21K1/06 ,  H05G2/005 ,  H05G2/008

摘要： A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.

公开(公告)号：US20230400772A1

公开(公告)日：2023-12-14

申请号：US18332192

申请日：2023-06-09

申请人： Carl Zeiss SMT GmbH

发明人： Eugen Doetzel ,  Johannes Kruis ,  Benjamin Sigel ,  Dietmar Duerr ,  Tobias Hegele ,  Alexander Ostendorf ,  Sebastian Henseler ,  Christian Beyrle ,  Christian Werner ,  Alexander Kaniut

IPC分类号： G03F7/20 ,  G21K1/06 ,  G02B27/62

CPC分类号： G03F7/70258 ,  G21K1/06 ,  G02B27/62

摘要： A method for swapping an optical system, such as a DUV mirror, of a projection exposure apparatus, comprises: a) raising the optical system along a centre axis of the optical system so that mount struts of the optical system pass out of contact with frame struts of a frame carrying the optical system; b) rotating the optical system about the centre axis so that the mount struts are arranged between the frame struts; c) lowering the optical system along the centre axis; and d) shifting the optical system perpendicularly to the centre axis so that the optical system is moved out of a housing.