摘要:
An apparatus for melting an electrically conductive metallic material includes a vacuum chamber and a hearth disposed in the vacuum chamber. At least one wire-discharge ion plasma electron emitter is disposed in or adjacent the vacuum chamber and is positioned to direct a wide-area field of electrons into the vacuum chamber, wherein the wide-area electron field has sufficient energy to heat the electrically conductive metallic material to its melting temperature. The apparatus may further include at least one of a mold and an atomizing apparatus which is in communication with the vacuum chamber and is positioned to receive molten material from the hearth.
摘要:
A plasma source apparatus for generating a beam of charged particles is disclosed. The apparatus comprises: a plasma chamber provided with an inlet for the ingress of gas and an aperture for the extraction of charged particles from the plasma chamber; a radio frequency (RF) plasma generation unit for generating a plasma inside the plasma chamber, the radio frequency plasma generation unit comprising first and second resonant circuits each tuned to resonate at substantially the same resonant frequency, the first resonant circuit comprising a first antenna and a first, RF power source adapted to drive the first resonant circuit at substantially its resonant frequency, and the second resonant circuit comprising a second antenna, whereby in use an RF signal is induced in the second antenna by the first resonant circuit due to resonant coupling, the second resonant circuit being configured to apply the induced RF signal to the plasma chamber to generate a plasma therein; and a particle accelerating unit for extracting charged particles from the plasma and accelerating the charged particles to form a beam, the particle accelerating unit comprising a second power source configured to apply potential between the plasma chamber and an accelerating electrode, the region between the plasma chamber and the accelerating electrode constituting an acceleration column. The second power source is adapted to output a high voltage relative to that output by the first, RF power source.
摘要:
An electron flood apparatus 1 of the present invention comprises a chamber 22 having a first part 22a made of conductive material and a second part 22b made of insulating material, and extending along a predefined closed curve Ax. A coil 18 is provided outside the first part 22a to generate a magnetic field in a direction intersecting with the surface formed by the predefined closed curve Ax. The coil 18 and the chamber 22 are inductively coupled by the magnetic field. Since the inert gas plasma is generated in the chamber 22 mainly by inductive coupling, electrons contained in the plasma have a low energy. Here, by applying voltage to an electrode 21, electrons having a low energy in the chamber 22 are emitted from an opening 14.
摘要:
A plasma ion source comprises coaxially oriented electrodes of which a first electrode has the shape of a rod and a second electrode an annular shape, positioned in a space filled with a gas of atomic number greater than that of Boron, a current source up to 100 KA to be reacted within 1 usec and structure for focussing ions located near a formed pinch plasma.
摘要:
A broad-beam electron source has a chamber into which is introduced an ionizing gas. Electrons are emitted between a cathode and an anode assembly to ionize that gas. The electrons within the plasma are drawn outwardly from the chamber through an apertured wall, which constitutes a screen, and thereafter are accelerated toward a target in a well-directed beam. A comparatively copious supply of electrons is developed, while yet requiring only low voltages in connection with its generation and resulting in correspondingly low electron energies. Ions produced external to the electron source itself are utilized to assist in neutralizing the charge density of the electron beam in order to help maintain its definition. For insulative targets, secondarily emitted electrons permit conservation of surface charge.
摘要:
A gas discharge electron gun for generating an electron beam by secondary emission from an active surface of a cathode which is surrounded by a cathode sleeve coaxially projecting towards an open end of a tubular anode.
摘要:
A gas discharge electron gun for generating an electron beam by means of a glow discharge. A rapid control (.apprxeq.1 msec) is possible by admitting the gas to the gun through at least one aperture in the inner wall of a tubular positive electrode.
摘要:
In the disclosed electron gun positive ions generated by a hollow cathode plasma discharge in a first chamber are accelerated through control and shield grids into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam having a distribution adjacent to the cathode emissive surface substantially the same as the distribution of the ion beam impinging upon the cathode. After passing through the grids and the plasma discharge chamber, the electron beam exits from the electron gun via a foil window. Control of the generated electron beam is achieved by applying a relatively low control voltage between the control grid and the electron gun housing (which resides at ground potential) to control the density of the positive ions bombarding the cathode.
摘要:
A glow discharge device comprising an enclosure and means to maintain a suitable gas in the enclosure at a predetermined pressure. An electrode arrangement is either at least partly disposed within the enclosure or forms part of a wall of the enclosure. The electrode arrangement includes one or more anodes, a cathode, and a control electrode. Power supply means are provided to apply a electrical potentials to the anode or anodes said cathode and said control electrode to maintain a first potential difference between an anode and said cathode to generate a first glow discharge, and to maintain a second potential difference between an anode and said control electrode to generate a second glow discharge. The combined first and second glow discharges produces a beam of charged particles, the power intensity of which is controlled by varying the potential applied to the control electrode to vary the glow discharge independently of the potential applied to the cathode.