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    Ion milling device
    1.
    发明授权
    Ion milling device 有权

    公开(公告)号：US12230471B2

    公开(公告)日：2025-02-18

    申请号：US17788556

    申请日：2019-12-24

    Applicant: Hitachi High-Tech Corporation

    Inventor： Shota Aida ,  Hisayuki Takasu ,  Atsushi Kamino ,  Hitoshi Kamoshida

    IPC: H01J37/24 ,  H01J37/08 ,  H01J37/244 ,  H01J37/30 ,  H01J37/305

    Abstract: There is provided an ion milling apparatus that can enhance reproducibility of ion distribution.
    The ion milling apparatus includes an ion source 101, a sample stage 102 on which a sample processed by radiating a non-convergent ion beam from the ion source 101 is placed, a drive unit 107 that moves a measurement member holding section 106 holding an ion beam current measurement member 105 along a track located between the ion source and the sample stage, and an electrode 112 that is disposed near the track, in which a predetermined positive voltage is applied to the electrode 112, the ion beam current measurement member 105 is moved within a radiation range of the ion beam by the drive unit 107, in a state in which the ion beam is output from the ion source 101 under a first radiation condition, and an ion beam current that flows when the ion beam is radiated to the ion beam current measurement member 105 is measured.

    METHOD OF ASSEMBLING DRIFT TUBE ASSEMBLIES IN ION IMPLANTORS
    3.
    发明申请
    METHOD OF ASSEMBLING DRIFT TUBE ASSEMBLIES IN ION IMPLANTORS 有权

    公开(公告)号：US20240420919A1

    公开(公告)日：2024-12-19

    申请号：US18210524

    申请日：2023-06-15

    Applicant: Applied Materials, Inc.

    Inventor： Aaron P. WEBB ,  Krag R. SENIOR ,  Chris CZAJKA ,  Charles T. CARLSON ,  Jason M. SCHALLER

    IPC: H01J37/30 ,  H01J37/317 ,  H05H9/04

    Abstract: An ion implantation system including an ion source for generating an ion beam, an end station for holding a substrate to be implanted by the ion beam, and a linear accelerator disposed between the ion source and the end station and adapted to accelerate the ion beam, the linear accelerator comprising at least one acceleration stage including a resonator coil coupled to a drift tube assembly, the drift tube assembly including a first drift tube coupled to a first end of a first insulting rod via interference fit, a second drift tube coupled to a first end of a second insulting rod via interference fit, and a mounting bracket coupled to a second end of the first insulting rod and to a second end of the second insulting rod via interference fit.

    Method and device for spatial charged particle bunching
    5.
    发明授权
    Method and device for spatial charged particle bunching 有权

    公开(公告)号：US12068130B2

    公开(公告)日：2024-08-20

    申请号：US18333085

    申请日：2023-06-12

    Applicant: NexGen Semi Holding, Inc.

    Inventor： Mark Joseph Bennahmias ,  Michael John Zani ,  Jeffrey Winfield Scott

    IPC: H01J37/30 ,  H01J37/31 ,  H01J37/317

    CPC classification number: H01J37/3007 ,  H01J37/3174 ,  H01J2237/04

    Abstract: A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric field. The series includes a first electrode, a last electrode and one- or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam configured to hit the target.

    ELECTRONIC TWEEZERS
    10.
    发明公开
    ELECTRONIC TWEEZERS 审中-公开

    公开(公告)号：US20240136149A1

    公开(公告)日：2024-04-25

    申请号：US18548062

    申请日：2021-02-28

    Applicant: ZHEJIANG UNIVERSITY

    Inventor： He TIAN ,  Tulai SUN ,  Tianxing REN ,  Wanru ZHANG ,  Xinkai CHEN ,  Ze ZHANG

    IPC: H01J37/30

    CPC classification number: H01J37/3005

    Abstract: The present invention relates to a method for manipulating a tiny object, including: providing a charged particle beam; forming a non-uniform charge distribution in a fluid medium; and applying, to a tiny object, a gradient force formed by the non-uniform charge distribution. The present invention extends manipulation to a nanoscale, and can be applied to various microscopic tiny objects such as conductors, non-conductors, and living or non-living biological cells or organelles, and therefore surely promote great progress in the fields of physics, chemistry, biology and medicine.

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