ION ANALYSIS DEVICE
    1.
    发明申请

    公开(公告)号:US20230048972A1

    公开(公告)日:2023-02-16

    申请号:US17792170

    申请日:2020-03-12

    摘要: An ion analysis device 1 configured to generate and analyze product ions from precursor ions derived from a sample component includes: a reaction chamber 132 into which the precursor ions are introduced; a radical emitter 134 made of a predetermined kind of metal and disposed in the reaction chamber or a space communicating with the reaction chamber, at least a part of a surface of the radical emitter being oxidized or nitrided; a heating unit 20 configured to heat the radical emitter to a predetermined temperature; and separation detection units 135 and 136 configured to separate and detect, according to at least one of a mass-to-charge ratio and an ion mobility, product ions generated from the precursor ions by a reaction with radicals emitted from the radical emitter heated to the predetermined temperature.

    SPECIMEN IMAGING SYSTEMS AND METHODS

    公开(公告)号:US20220344138A1

    公开(公告)日:2022-10-27

    申请号:US17763294

    申请日:2020-10-02

    摘要: Disclosed herein are specimen imaging systems, comprising: a sample stage in a vacuum environment, the sample stage configured to support a specimen; an electron beam generator configured to focus an electron beam on a first predetermined location on the specimen; a nanospray dispenser configured to dispense a nanospray onto a second predetermined location on the specimen; a mass spectrometer; and an extraction conduit configured to extract a plume of charged particles generated as a result of contact between the nanospray and the specimen and deliver the charged particles to the mass spectrometer. The system can create a topological and chemical map of the specimen by analyzing at least a portion of the specimen with a mass spectrometer to determine a chemical composition of the specimen at the second predetermined location and analyzing at least a portion of the specimen with the electron beam to determine a surface topology.

    WAFER SAMPLE ANALYSIS METHOD AND DEVICE

    公开(公告)号:US20220318988A1

    公开(公告)日:2022-10-06

    申请号:US17597614

    申请日:2021-07-13

    发明人: Gaofeng XU

    IPC分类号: G06T7/00 H01J49/14

    摘要: The present disclosure provides a wafer sample analysis method and device. The method is applied to a secondary-ion-mass spectroscope (Sims) and includes: providing a wafer sample, the wafer sample at least including a slope configured to expose a substrate, a first protective layer and a first doped layer on a same surface, the first protective layer being formed on the substrate, and the first doped layer being formed on the first protective layer; and acquiring and analyzing a slope image of the slope to obtain a doping depth and a doping concentration of elements in the wafer sample in the slope image.

    Ion source
    8.
    发明授权

    公开(公告)号:US11282691B2

    公开(公告)日:2022-03-22

    申请号:US16956809

    申请日:2018-12-21

    摘要: A method of ionizing a sample is disclosed that comprises heating a sample so that analyte is released from the sample, producing charged particles such as charged droplets downstream of the sample, and using the charged particles to ionize at least some of the analyte released from the sample so as to produce analyte ions.

    Emission current measurement for superior instrument-to-instrument repeatability

    公开(公告)号:US11145502B2

    公开(公告)日:2021-10-12

    申请号:US16721517

    申请日:2019-12-19

    IPC分类号: H01J49/14 H01J49/02 H01J49/26

    摘要: An ion source assembly is described that includes an electron source configured to inject electrons into an ion volume to ionize an atom or molecule in the ion volume, wherein the electron source includes a filament. A lens electrode is positioned adjacent the electron source and includes an opening configured to pass electrons therethrough from the electron source into the ion volume. A supply voltage source is coupled to the filament and configured to supply a first voltage to the filament, wherein the first voltage is operable to ionize the molecules in the ion volume. Further, a bias voltage source is coupled to the supply voltage source and configured to supply a bias voltage to the lens electrode. Electrons striking the lens electrode are thereafter returned to the filament.