Pulsed laser driver
    6.
    发明授权

    公开(公告)号:US11581693B2

    公开(公告)日:2023-02-14

    申请号:US16582478

    申请日:2019-09-25

    摘要: The disclosure relates to a pulsed laser driver that utilizes a high-voltage switch transistor to support a high output voltage for a laser, and a low-voltage switch transistor that switches between an ON state and an OFF state to generate a pulsed current that is supplied to the laser to generate an output pulsed laser signal. The pulsed laser driver switches the low-voltage switch transistor between the ON state and the OFF state according to an input pulsed signal such that the output pulsed laser signal is modulated according to the input pulsed signal. The pulsed laser driver also utilizes a feedback control module to control the gate terminal voltage of the high-voltage switch transistor to improve the precision of the output pulsed laser signal.

    Picosecond Optical Radiation Systems and Methods of Use

    公开(公告)号:US20220387105A1

    公开(公告)日:2022-12-08

    申请号:US17886685

    申请日:2022-08-12

    申请人: CYNOSURE, LLC

    摘要: Methods, systems and apparatus are disclosed for delivery of pulsed treatment radiation by employing a pump radiation source generating picosecond pulses at a first wavelength, and a frequency-shifting resonator having a lasing medium and resonant cavity configured to receive the picosecond pulses from the pump source at the first wavelength and to emit radiation at a second wavelength in response thereto, wherein the resonant cavity of the frequency-shifting resonator has a round trip time shorter than the duration of the picosecond pulses generated by the pump radiation source. Methods, systems and apparatus are also disclosed for providing beam uniformity and a sub-harmonic resonator.

    EXPOSURE SYSTEM, LASER CONTROL PARAMETER PRODUCTION METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20220373893A1

    公开(公告)日:2022-11-24

    申请号:US17817182

    申请日:2022-08-03

    申请人: Gigaphoton Inc.

    摘要: An exposure system according to an aspect of the present disclosure includes a laser apparatus emitting a pulse laser beam, an illumination optical system guiding the pulse laser beam to a reticle, a reticle stage moving the reticle, and a processor controlling emission of the pulse laser beam and movement of the reticle. The exposure system performs scanning exposure of a semiconductor substrate by irradiating the reticle with the pulse laser beam. The reticle has first and second regions. The processor instructs the laser apparatus about, based on proximity effect characteristics corresponding to the first and second regions, a value of a control parameter of the pulse laser beam corresponding to each region so that the laser apparatus emits the pulse laser beam with which a difference of the proximity effect characteristic of each region from a reference proximity effect characteristic is in an allowable range.