Laser system and electronic device manufacturing method

    公开(公告)号:US12160085B2

    公开(公告)日:2024-12-03

    申请号:US17220993

    申请日:2021-04-02

    Abstract: A laser system according to one aspect of the present disclosure includes a wavelength-variable first solid-state laser device configured to output a first pulse laser beam; a wavelength conversion system including a first nonlinear crystal configured to wavelength-convert the first pulse laser beam and a first rotation stage configured to change a first incident angle of the first pulse laser beam on the first nonlinear crystal; an excimer amplifier configured to amplify a pulse laser beam wavelength-converted by the wavelength conversion system; and a control unit configured to receive, from an external device, data of a target center wavelength of an excimer laser beam output from the excimer amplifier, control a wavelength of the first pulse laser beam in accordance with the instructed target center wavelength, and control the first incident angle on the first nonlinear crystal in accordance with an average value of the target center wavelength.

    ELECTRONIC DEVICE MANUFACTURING METHOD AND LITHOGRAPHY CONTROL PROCESSOR

    公开(公告)号:US20240219846A1

    公开(公告)日:2024-07-04

    申请号:US18606012

    申请日:2024-03-15

    Inventor: Koichi FUJII

    CPC classification number: G03F7/70633 G03F7/70358 H01S3/08009 H01S3/225

    Abstract: An electronic device manufacturing method includes performing scanning exposure in which plural scan fields of a first photosensitive substrate are exposed to pulse laser light having a reference wavelength, measuring overlay errors at plural positions in each of the plural scan fields, calculating the average of the overlay errors at each of the plural positions in scan fields scanned in the same scan direction out of the plural scan fields, calculating the amount of wavelength adjustment with respect to the reference wavelength in such a way that a first overlay error parameter calculated from the averages and distortions produced when the wavelength of the pulse laser light is changed from the reference wavelength is smaller than a second overlay error parameter calculated from the averages, causing a laser apparatus to generate the pulse laser light having a wavelength controlled by using the amount of wavelength adjustment, outputting the pulse laser light to an exposure apparatus, and exposing a second photosensitive substrate to the pulse laser light in the exposure apparatus to manufacture electronic devices.

    LASER SYSTEM
    5.
    发明公开
    LASER SYSTEM 审中-公开

    公开(公告)号:US20240170905A1

    公开(公告)日:2024-05-23

    申请号:US18552634

    申请日:2022-03-07

    Abstract: A laser system comprising: a laser operable to generate a laser beam; an optical system comprising a first optical element and a second optical element; and an output through which the laser beam exits the laser system; the laser, optical system and output arranged such that the laser beam travels to the first optical element, the second optical element and the output sequentially; wherein the first optical element has a first focal length, the second optical element has a second focal length equal to the first focal length, and the second optical element is spaced from the first optical element by a distance of two times the first focal length.

    ULTRAVIOLET LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20240128701A1

    公开(公告)日:2024-04-18

    申请号:US18531771

    申请日:2023-12-07

    Abstract: An ultraviolet laser device includes an oscillation stage laser outputting linearly polarized pulse laser light having an ultraviolet wavelength, an optical isolator arranged on an optical path between the oscillation stage laser and an amplifier, and a processor. The optical isolator includes a first polarizer, a first Faraday rotator rotating a polarization direction of the pulse laser light transmitted through the first polarizer in a first rotation direction, a second polarizer arranged so that the pulse laser light output from the first Faraday rotator is transmitted therethrough, a first actuator relatively moving the first magnet and the first Faraday material in an optical axis direction, and a first sensor measuring a power of pulse laser light reflected by the second polarizer among the pulse laser light output from the oscillation stage laser. The processor controls the first actuator based on a measurement result of the first sensor.

    LASER DEVICE, LASER OSCILLATION METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20240079844A1

    公开(公告)日:2024-03-07

    申请号:US18504532

    申请日:2023-11-08

    Inventor: Takashi SHIGA

    Abstract: A laser device includes a master oscillator outputting pulse laser light at a first discharge timing synchronized with a repetition frequency; an amplifier amplifying the pulse laser light by exciting, at a second discharge timing, a laser medium through which the pulse laser light passes; and a processor setting the second discharge timing by adding a delay time to the first discharge timing, holding a first value as a command value of the delay time corresponding to a first repetition frequency, holding a second value as the command value of the delay time corresponding to a second repetition frequency, and outputting the command value of the second value after outputting the command value of a third value between the first value and the second value when the repetition frequency is changed from the first repetition frequency to the second repetition frequency after outputting the command value of the first value.

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