公开(公告)号：US11607700B1

公开(公告)日：2023-03-21

申请号：US15587800

申请日：2017-05-05

申请人： Madeline A. Kuchinski

发明人： Madeline A. Kuchinski ,  Frank A. Kuchinski ,  Stephen T. Opresko ,  Cullen L. Hackler

IPC分类号： B05B13/02 ,  B05C13/00

摘要： An apparatus for transporting a component at least partially coated with a flowable coating material is provided. The apparatus includes a holder adapted for selectively forming a releasable coupling with the component. The holder including a screen for minimizing contact with the component during the transfer. The screen thus serves as a spacer for creating multiple areas of contact with the component, yet the contact is achieved in a manner such that damage to the coating is minimized. Related methods are also disclosed.

公开(公告)号：US20220379339A1

公开(公告)日：2022-12-01

申请号：US17819378

申请日：2022-08-12

申请人： KABUSHIKI KAISHA TOSHIBA ,  TOSHIBA ENERGY SYSTEMS & SOLUTIONS CORPORATION

发明人： Naomi SHIDA ,  Katsuyuki NAITO ,  Yutaka SAITA

IPC分类号： B05C11/02 ,  B05C5/02 ,  B05C13/00 ,  B05D1/40 ,  B05D1/26

摘要： According to one embodiment, a coating apparatus includes a coating bar configured to face a member to be coated, and a plurality of nozzles configured to supply a liquid toward the coating bar. A number of the nozzles is 3 or more. An arithmetic mean roughness Ra of at least a part of a surface of the coating bar is not less than 0.5 μm and not more than 10 μm.

公开(公告)号：US11489119B2

公开(公告)日：2022-11-01

申请号：US16574334

申请日：2019-09-18

申请人： KATEEVA, INC.

发明人： Alexander Sou-Kang Ko ,  Justin Mauck ,  Eliyahu Vronsky ,  Conor F. Madigan ,  Eugene Rabinovich ,  Nahid Harjee ,  Christopher Buchner ,  Gregory Lewis

IPC分类号： B05D5/00 ,  B41J11/00 ,  H01L51/00 ,  H01L51/52 ,  B05B15/60 ,  B05C13/00 ,  B05C15/00 ,  B41J2/01 ,  B41J3/407 ,  H01L21/67 ,  H01L21/677 ,  H01L51/56 ,  H01L21/673 ,  B05D3/06 ,  C09D11/101

摘要： A method for providing a substrate coating comprises transferring a substrate to an enclosed ink jet printing system; printing organic material in a deposition region of the substrate using the enclosed ink jet printing system, the deposition region comprising at least a portion of an active region of a light-emitting device on the substrate; loading the substrate with the organic material deposited thereon to an enclosed curing module; supporting the substrate in the enclosed curing module, the supporting the substrate comprising floating the substrate on a gas cushion established by a floatation support apparatus; and while supporting the substrate in the enclosed curing module, curing the organic material deposited on the substrate to form an organic film layer.

公开(公告)号：US20220055056A1

公开(公告)日：2022-02-24

申请号：US17408854

申请日：2021-08-23

申请人： Tyco Electronics (Shanghai) Co. Ltd. ,  TE Connectivity Services GmbH ,  Kunshan League Automechanism Co., Ltd.

发明人： Rong Zhang ,  Roberto Francisco-Yi Lu ,  Dandan Zhang ,  Lvhai Hu ,  Haidong Wu ,  Yuting He

IPC分类号： B05B13/02 ,  B25J11/00 ,  B25J9/00 ,  B25J5/02 ,  B65G19/02 ,  B65G23/32 ,  B05C5/02 ,  B05C13/00 ,  B05C15/00

摘要： A painting system includes a conveying mechanism adapted to convey a workpiece to be painted to a painting station, a holding and rotating mechanism mounted at the painting station and adapted to hold and rotate the workpiece, and a robot having a nozzle adapted to spray a paint on the workpiece held by the holding and rotating mechanism. The robot is configured to spray the paint onto the workpiece while the holding and rotating mechanism rotates the workpiece, spraying a layer of the paint on an outer surface of the workpiece.

公开(公告)号：US11246249B2

公开(公告)日：2022-02-08

申请号：US16849249

申请日：2020-04-15

申请人： Illinois Tool Works Inc.

发明人： Thomas C. Prentice ,  Fernando J. Aguiar ,  Scott A. Reid

IPC分类号： H05K13/04 ,  B05C5/02 ,  B05B3/02 ,  B05C13/00 ,  H05K3/12 ,  H01L21/67

摘要： A dispensing system includes a dispensing unit assembly configured to dispense viscous material and a gantry coupled to the frame. The gantry is configured to support the dispensing unit assembly and to move the dispensing unit assembly in x-axis and y-axis directions. The dispensing unit assembly includes a support bracket secured to the gantry and a movable bracket rotatably coupled to the support bracket by a first strain wave gear system configured to enable the rotation of the movable bracket with respect to the support bracket about a first axis. The dispensing unit assembly further includes a dispensing unit rotatably coupled to the movable bracket by a second strain wave gear system configured to enable the rotation of the dispensing unit with respect to the movable bracket about a second axis generally perpendicular to the first axis.

公开(公告)号：US10957565B2

公开(公告)日：2021-03-23

申请号：US16941405

申请日：2020-07-28

申请人： Applied Materials, Inc.

发明人： Shimin Mao ,  Simon Huang ,  Ashish Goel ,  Anantha Subramani ,  Philip Allan Kraus

IPC分类号： B05C11/00 ,  B05C13/00 ,  C23C16/52 ,  C23C14/54 ,  H01L21/67

摘要： Embodiments include systems, devices, and methods for monitoring etch or deposition rates, or controlling an operation of a wafer fabrication process. In an embodiment, a processing tool includes a processing chamber having a liner wall around a chamber volume, and a monitoring device having a sensor exposed to the chamber volume through a hole in the liner wall. The sensor is capable of measuring, in real-time, material deposition and removal rates occurring within the chamber volume during the wafer fabrication process. The monitoring device can be moved relative to the hole in the liner wall to selectively expose either the sensor or a blank area to the chamber volume through the hole. Accordingly, the wafer fabrication process being performed in the chamber volume may be monitored by the sensor, and the sensor may be sealed off from the chamber volume during an in-situ chamber cleaning process. Other embodiments are also described and claimed.

公开(公告)号：US10714687B2

公开(公告)日：2020-07-14

申请号：US15459485

申请日：2017-03-15

申请人： Samsung Display Co., Ltd.

发明人： Hyea-Weon Shin

IPC分类号： H01L51/00 ,  B05C13/00 ,  H01L51/56 ,  B05C5/00 ,  B41J3/407

摘要： A display panel manufacturing device including a stage slider, a first stage configured to slide on the stage slider and to receive a test substrate, a second stage on the stage slider and configured to receive a main substrate, and a patterning unit located at a distance from the stage slider and configured to discharge organic drops onto the test substrate, configured to analyze patterns of the organic drops, configured to modify the patterns of the discharged organic drops according to an analysis of the patterns of the organic drops, and configured to discharge the organic drops onto the main substrate.

公开(公告)号：US10589310B2

公开(公告)日：2020-03-17

申请号：US15502886

申请日：2015-08-12

申请人： KAHLA THÜRINGEN PORZELLAN GMBH ,  TOMABOND GMBH

发明人： Tobias Stephan Maier ,  Holger Raithel

IPC分类号： B05D1/00 ,  B05D1/02 ,  B05C13/00 ,  B05C13/02 ,  B05B13/02 ,  B05D1/18

摘要： The invention relates to a device for arranging objects in particular tableware, in a system for coating including a base element, an adapter element and a support element, each of which are designed in such a manner that they can be plugged together in a direction (z). In the plugged-together state, the adapter element is arranged between the base element and the support element with the object disposed in a predetermined position on the adapter element. The adapter element, the base element and the support element are locked relative to one another with the object in such a manner that only a relative movement in the direction (z) is possible amongst each other. The invention further relates to a method for the arrangement of objects, in particular tableware with the device, in a system for coating.

公开(公告)号：US10537273B2

公开(公告)日：2020-01-21

申请号：US16504636

申请日：2019-07-08

申请人： SIO2 MEDICAL PRODUCTS, INC.

发明人： John T. Felts ,  Thomas E. Fisk ,  Robert S. Abrams ,  John Ferguson ,  Jonathan R. Freedman ,  Robert J. Pangborn ,  Peter J. Sagona

IPC分类号： A61L31/10 ,  A61B5/15 ,  C23C16/505 ,  C23C16/52 ,  C23C16/54 ,  G01N33/00 ,  A61B5/154 ,  A61L31/14 ,  C23C16/04 ,  C23C16/50 ,  G01N23/2273 ,  C23C16/458 ,  G01N15/08 ,  G01N30/72 ,  A61L31/08 ,  B05C13/02 ,  C23C16/40 ,  B23Q7/04 ,  B05C13/00 ,  B23Q7/14

摘要： Methods for processing a vessel, for example to provide a gas barrier or lubricity, are disclosed. First and second PECVD or other vessel processing stations or devices and a vessel holder comprising a vessel port are provided. An opening of the vessel can be seated on the vessel port. The interior surface of the seated vessel can be processed via the vessel port by the first and second processing stations or devices. Vessel barrier and lubricity coatings and coated vessels, for example syringes and medical sample collection tubes are disclosed. A vessel processing system is also disclosed.

公开(公告)号：US20190304825A1

公开(公告)日：2019-10-03

申请号：US16443185

申请日：2019-06-17

申请人： Applied Materials, Inc.

发明人： Dale R. Du BOIS ,  Juan Carlos ROCHA-ALVAREZ ,  Sanjeev BALUJA ,  Ganesh BALASUBRAMANIAN ,  Lipyeow YAP ,  Jianhua ZHOU ,  Thomas NOWAK

IPC分类号： H01L21/68 ,  H01L21/687 ,  H01L21/67 ,  H01L21/324 ,  B05C13/00 ,  H01J37/32 ,  C23C16/458

摘要： A method and apparatus for heating a substrate in a chamber are provided. an apparatus for positioning a substrate in a processing chamber. In one embodiment, the apparatus comprises a substrate support assembly having a support surface adapted to receive the substrate and a plurality of centering fingers for supporting the substrate at a distance parallel to the support surface and for centering the substrate relative to a reference axis substantially perpendicular to the support surface. The plurality of the centering fingers are movably disposed along a periphery of the support surface, and each of the plurality of centering fingers comprises a first end portion for either contacting or supporting a peripheral edge of the substrate.