公开(公告)号：US20240351020A1

公开(公告)日：2024-10-24

申请号：US18581696

申请日：2024-02-20

申请人： Wisconsin Alumni Research Foundation

发明人： Chao Li ,  Jiaquan Yu ,  Theodorus Evan de Groot ,  David James Beebe

IPC分类号： B01L3/00 ,  B05D1/00 ,  B05D5/08

CPC分类号： B01L3/502 ,  B05D1/60 ,  B05D5/08 ,  B01L2300/166

摘要： Systems, methods, compositions of matter, and kits for undermedia repellency are disclosed. In some cases, these involve a first volume of a first liquid presented in a second volume of a second liquid above a first location of a first surface. The first liquid, second liquid, and first location can have properties sufficient to give rise to undermedia perfect liquid repellency.

公开(公告)号：US12116466B2

公开(公告)日：2024-10-15

申请号：US17605095

申请日：2020-04-22

申请人： NIKON-ESSILOR CO., LTD. ,  SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Katsuyoshi Takeshita ,  Hideyuki Wakiyasu ,  Tomohiro Ito ,  Tomonori Miyamoto ,  Masayoshi Tokuda

IPC分类号： C08J7/04 ,  B05D1/00 ,  B05D3/10 ,  B05D5/08 ,  C03C17/34 ,  C09D183/04 ,  G02B1/111 ,  G02B1/14 ,  G02B1/18

CPC分类号： C08J7/042 ,  B05D1/60 ,  B05D3/10 ,  B05D5/086 ,  C03C17/3405 ,  C09D183/04 ,  G02B1/111 ,  G02B1/14 ,  G02B1/18 ,  B05D2203/35 ,  B05D2506/10 ,  B05D2518/10 ,  C03C2217/73

摘要： An object of the present invention is to provide a laminate which has a substrate, an intermediate layer, and a water-repellent layer laminated in this order, and has excellent abrasion resistance. The present invention is a laminate comprising: a substrate (s) having an anti-reflection layer; an intermediate layer (c) placed on the anti-reflection layer side of the substrate; and a water-repellent layer (r), in this order, wherein the intermediate layer (c) is a cured layer of a mixture composition (cc) of an organosilicon compound (C), or a vapor deposition layer of the organosilicon compound (C), the organosilicon compound (C) contains a silicon atom together with an amino group and/or an amine skeleton, the water-repellent layer (r) is a cured layer of a mixture composition (ca) of an organosilicon compound (A) in which a monovalent group having a perfluoropolyether structure is bound to a silicon atom through a linking group or without a linking group located therebetween, and a hydrolyzable group is bound to the silicon atom through a linking group or without a linking group located therebetween, and the laminate satisfies the following requirement (1),



(1) a water sliding angle is not larger than 50° after a abrasion resistance test in which a 200 g load per 1.5 cm×1.5 cm area is applied to a surface on the water-repellent layer (r) side of the laminate and the surface is rubbed 20,000 times.

公开(公告)号：US12110418B2

公开(公告)日：2024-10-08

申请号：US17289322

申请日：2019-11-12

申请人： LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST)

发明人： Nicolas Boscher ,  Giuseppe Bengasi ,  Kamal Baba

IPC分类号： C09D5/24 ,  B05D1/00 ,  C09D165/00 ,  H01B1/12 ,  H10K85/10

CPC分类号： C09D5/24 ,  B05D1/60 ,  C09D165/00 ,  H01B1/128 ,  H10K85/111

摘要： A conductive coating comprising polymers of meso-meso, β-β doubly linked fused and/or meso-β, β-meso doubly linked fused and/or meso-meso, β-β, β-βtriply linked fused (poly)porphyrins. A method for forming on a substrate a thin conductive coating of polymers of meso-meso, β-β doubly and/or meso-β, β-meso doubly and/or meso- meso, β-β, β-β triply linked fused (poly)porphyrins, the method comprising the steps of providing a substrate in a vacuum chamber, performing on the substrate an oxidative chemical vapour deposition reaction with an oxidant and at least one porphyrin monomer.

公开(公告)号：US20240326087A1

公开(公告)日：2024-10-03

申请号：US18620152

申请日：2024-03-28

申请人： COMMISSARIAT À L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

发明人： Pierre MONTMEAT ,  Franck FOURNEL ,  Thierry ENOT

IPC分类号： B05D1/00 ,  B05D3/02

CPC分类号： B05D1/005 ,  B05D3/0254 ,  B05D2203/30

摘要： A method for rectifying a polymer film including the steps of: a) providing a first substrate including a front surface, the front surface having a surface energy less than approximately 22 mJ/m2, b) spreading a thermoplastic polymer on the front surface leading to the formation of a polymer film and at least one dewetted zone of the front surface, c) providing a second substrate including a non-stick surface, d) bonding the polymer film and the non-stick surface leading to the formation of a bonding interface having an adhesion energy lower than the adhesion energy between the polymer film and the front surface, e) applying a creep treatment so that the at least one dewetted zone of the front surface is covered by creep of the polymer film, and f) disassembly at the bonding interface so as to obtain the front surface completely covered by the rectified polymer film.

公开(公告)号：US12099294B2

公开(公告)日：2024-09-24

申请号：US16650510

申请日：2018-09-28

申请人： University of Massachusetts

发明人： James J. Watkins ,  Irene R. Howell

IPC分类号： G03F7/00 ,  B05D1/00 ,  C23C16/04 ,  C23C16/40 ,  C23C16/455

CPC分类号： G03F7/0002 ,  B05D1/005 ,  C23C16/045 ,  C23C16/405 ,  C23C16/45525

摘要： Various embodiments disclosed relate to methods of manufacturing textured surfaces nanoimprint lithography with nanoparticulate inks. The present invention provides methods that allow flexible patterning of substrates with features having complex geometries.

公开(公告)号：US20240307914A1

公开(公告)日：2024-09-19

申请号：US18603922

申请日：2024-03-13

申请人： FLOSFIA INC.

发明人： Makoto SHIMIZU ,  Hiroshi SHIHO ,  Hiroyuki ANDO ,  Naoyuki TSUKAMOTO ,  Yuji KATO

IPC分类号： B05D1/00 ,  C09D4/00

CPC分类号： B05D1/60 ,  B05D1/005 ,  C09D4/00 ,  B05D2203/30

摘要： The present disclosure provides a film formation method having an excellent mass productivity.
The present disclosure provides a film formation method using one aqueous solution or different aqueous solutions containing at least one of a metal complex having two or more different ligands and a metal complex having same ligands and substituents as well as a gallium compound, in which the metal complex having the two or more different ligands has nitrogen atom, and the metal complex having the same ligands and substituents has a halogen atom.

公开(公告)号：US12085903B2

公开(公告)日：2024-09-10

申请号：US17703950

申请日：2022-03-24

申请人： Subrat Sahu

发明人： Subrat Sahu

IPC分类号： G05B13/04 ,  B05D1/00 ,  G05B13/02

CPC分类号： G05B13/048 ,  B05D1/00 ,  G05B13/0265 ,  G05B13/042

摘要： A method, device, and system for configuring a coating machine for coating a surface of a product using a coating substance are provided. The method includes determining a value associated with one or more parameters from a plurality of parameters associated with the coating operation. The method also includes predicting a value associated with at least one attribute associable with the coating substance based on the determined value associated with the one or more parameters using a trained machine learning model. The method includes configuring the coating machine for coating the surface using the coating substance based on the predicted value associated with the at least one attribute associable with the coating substance. The method also includes initiating a coating operation at the configured coating machine for coating the surface of the product using the coating substance.

公开(公告)号：US20240253079A1

公开(公告)日：2024-08-01

申请号：US18633581

申请日：2024-04-12

申请人： SCREEN Holdings Co., Ltd.

发明人： Yuji TANAKA ,  Masaya ASAI ,  Masahiko HARUMOTO ,  Koji KANEYAMA

IPC分类号： B05D1/00 ,  B05C11/08 ,  B05C11/10 ,  B05D1/36 ,  B05D3/00 ,  C23F1/00 ,  C23F1/08 ,  H01L21/67 ,  H01L21/677 ,  H01L21/687

CPC分类号： B05D1/005 ,  B05C11/08 ,  B05C11/10 ,  B05C11/1039 ,  B05D1/36 ,  B05D3/007 ,  C23F1/00 ,  C23F1/08 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67742 ,  H01L21/68707

摘要： A coating liquid containing metal as a metal-containing coating liquid is supplied to a surface to be processed of a substrate by a coating processing unit, whereby a metal-containing coating film is formed on the surface to be processed. The substrate on which the metal-containing coating film has been formed is transported to a metal removal unit by a transport mechanism. A removal liquid for dissolving the metal is supplied to a peripheral portion of the substrate by the metal removal unit such that the metal-containing coating film remains in a region except for the peripheral portion of the surface to be processed of the substrate.

公开(公告)号：US12051629B2

公开(公告)日：2024-07-30

申请号：US16825512

申请日：2020-03-20

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Seunghwa Hyun ,  Younghwan Kim ,  Hwayoung Park ,  Youngsu Ryu ,  Yusang Cheon

IPC分类号： H01L21/66 ,  B05D1/00 ,  G01N21/95 ,  G03F7/16 ,  H01L21/67

CPC分类号： H01L22/12 ,  B05D1/005 ,  G01N21/9503 ,  G03F7/162 ,  H01L21/67023

摘要： A semiconductor device manufacturing system includes a spin coater and a coating layer inspector. The spin coater includes: a chuck, a rotation driver configured to rotate the chuck; and a solution dispenser configured to spray a solution onto a portion of the coating layer formed on an edge portion of the wafer, wherein the coating layer inspector includes an edge inspection camera and an inspection controller configured to determine a radius, eccentricity, and a top-view shape of the coating layer, based on images of the edge portion of the wafer.

公开(公告)号：US12038263B2

公开(公告)日：2024-07-16

申请号：US17793473

申请日：2021-01-14

申请人： EURENCO

发明人： Bastien Chautar ,  Julien Loyer ,  Sébastien Cuvelier

IPC分类号： F42C19/08 ,  B05D1/00 ,  B05D1/26 ,  B05D7/22 ,  C06C7/02 ,  F42B3/195 ,  F42B33/02

CPC分类号： F42C19/0826 ,  B05D1/002 ,  B05D1/26 ,  B05D7/22 ,  C06C7/02 ,  F42B3/195 ,  F42B33/0207

摘要： A device for depositing paste patterns on the surface of the channel of a tube, the device comprising a frame supporting a first mechanical assembly for holding, positioning and moving the tube, and a second mechanical assembly for extruding paste for depositing said paste patterns, the assemblies cooperating with one another.