PHOTOSENSITIVE POLYIMIDE COMPOSITIONS
    7.
    发明公开

    公开(公告)号:US20240288770A1

    公开(公告)日:2024-08-29

    申请号:US18609813

    申请日:2024-03-19

    申请人: PROMERUS, LLC

    摘要: Embodiments in accordance with the present invention encompass photosensitive compositions containing a variety of soluble polyimide polymers and various additives including photoacid generator, photo radical generator and one or more photo crosslinking agents which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. In some embodiments the compositions of this invention are shown to feature excellent hitherto unachievable mechanical properties. The negative images formed therefrom can be readily cured at lower temperatures than the conventional polyimides and exhibit improved thermo-mechanical properties, among other property enhancements.