Dimension measurement apparatus, dimension measurement program, and semiconductor manufacturing system

    公开(公告)号:US11600536B2

    公开(公告)日:2023-03-07

    申请号:US16957480

    申请日:2019-07-04

    摘要: The disclosure relates to a dimension measurement apparatus that reduces time required for dimension measurement and eliminates errors caused by an operator. Therefore, the dimension measurement apparatus uses a first image recognition model that extracts a boundary line between a processed structure and a background over the entire cross-sectional image and/or a boundary line of an interface between different kinds of materials, and a second image recognition that output information for dividing the boundary line extending over the entire cross-sectional image obtained from the first image recognition model for each unit pattern constituting a repetitive pattern, obtains coordinates of a plurality of feature points defined in advance for each unit pattern, and measures a dimension defined as a distance between two predetermined points of the plurality of feature points.

    System and method for automated object measurement

    公开(公告)号:US11599088B2

    公开(公告)日:2023-03-07

    申请号:US17199184

    申请日:2021-03-11

    摘要: A method for automated part probing using a physical machine defining a physical working volume, the method including: generating a virtual model based on a virtual part design received from a user account, the virtual model comprising a virtual part model, based on the virtual part design, virtually fixed to a virtual fixture plate arranged within a virtual working volume representative of the physical working volume; generating a probing routine based on the virtual model; sending the probing routine to the machine; receiving probe outputs from the machine; and validating the virtual model based on the probe outputs.

    Point cloud data extraction method and point cloud data extraction device

    公开(公告)号:US11204243B2

    公开(公告)日:2021-12-21

    申请号:US16461160

    申请日:2018-02-28

    摘要: Target point cloud data about a specific road are extracted from perimeter point cloud data acquired by moving a road surface measurement device along a measurement route and scanning the surroundings thereof. A data storage unit stores trajectory point sequence data that represent, as a plurality of trajectory points, the perimeter point cloud data and a trajectory of the movement of the road surface measurement device. A trajectory point sequence setting unit acquires a trajectory point sequence at equal intervals from the trajectory point sequence data. An extraction area setting unit sets, as extraction areas, a column area Ci and a parallelepiped area Hi that are geometric areas disposed at predetermined positions below a trajectory point Xi. An approximate nearest neighbor search processing unit and an extraction processing unit extract, as the target point cloud data, point data that belong to this extraction area of the perimeter point cloud data.

    MEASUREMENT SYSTEM, SUBSTRATE PROCESSING SYSTEM, AND DEVICE MANUFACTURING METHOD

    公开(公告)号:US20200266087A1

    公开(公告)日:2020-08-20

    申请号:US16868952

    申请日:2020-05-07

    申请人: NIKON CORPORATION

    摘要: A measurement system to be used in a manufacturing line for micro-devices is provided independently from an exposure apparatus. The measurement system has measurement devices that each performs measurement processing on substrates (e.g., substrates that have gone through at least one processing but before being coated with a sensitive agent), and a carrying system for performing delivery of substrates to/from the measurement devices. The measurement devices include a first measurement device that acquires position information on a plurality of marks formed on a substrate under a setting of a first condition, and a second measurement device that acquires position information on a plurality of marks formed on another substrate (e.g., another substrate included in the same lot as the substrate on which acquiring position information is performed under the setting of the first condition in the first measurement device) under a setting of a first condition.