公开(公告)号：US20240365469A1

公开(公告)日：2024-10-31

申请号：US18566430

申请日：2022-04-22

申请人： FUJIKURA PRINTED CIRCUITS LTD.

发明人： Daisuke Arai ,  Toshiya Iwamura

IPC分类号： H05K1/11 ,  G03F1/50 ,  G03F7/00 ,  G03F7/20 ,  H05K1/02 ,  H05K3/00 ,  H05K3/06

CPC分类号： H05K1/118 ,  G03F1/50 ,  G03F7/2016 ,  G03F7/70475 ,  H05K1/0281 ,  H05K3/0082 ,  H05K3/064

摘要： A method for producing a flexible printed wiring board using a photoresist includes placing the photoresist, including a first region and a second region, on a substrate, placing a first photomask including a first light-transmitting portion such that the first light-transmitting portion faces the first region to expose the photoresist through the first light-transmitting portion, and placing a second photomask including a second light-transmitting portion such that the second light-transmitting portion faces the second region to expose the photoresist through the second light-transmitting portion. The first region is adjacent to the second region such that an edge portion of the first region overlaps an edge portion of the second region. The first light-transmitting portion has a linear shape including a first tip having a tapered shape.

公开(公告)号：US20240365461A1

公开(公告)日：2024-10-31

申请号：US18769912

申请日：2024-07-11

申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

发明人： Yu-Kuang SUN ,  Ming-Hsun TSAI ,  Wei-Shin CHENG ,  Cheng-Hao LAI ,  Hsin-Feng CHEN ,  Chiao-Hua CHENG ,  Cheng-Hsuan WU ,  Yu-Fa LO ,  Jou-Hsuan LU ,  Shang-Chieh CHIEN ,  Li-Jui CHEN ,  Heng-Hsin LIU

IPC分类号： H05G2/00 ,  G03F7/00 ,  G05D23/19

CPC分类号： H05G2/006 ,  G03F7/70033 ,  G05D23/19

摘要： The present disclosure is directed to a modularized vessel droplet generator assembly (MGDVA) including a droplet generator assembly (DGA). Under a normal operation, the liquid fuel moves along an operation pathway extending through the DGA to eject or discharge the liquid fuel (e.g., liquid tin) from a nozzle of the DGA into a vacuum chamber. The liquid fuel in the vacuum chamber is then exposed to a laser generating an extreme ultra-violet (EUV) light. Under a service operation, the operation pathway is closed and a service pathway extending through the DGA is opened. A gas is introduced into the service pathway forming a gas-liquid interface between the gas and the liquid fuel. The gas-liquid interface is driven to an isolation valve directly adjacent to the DGA. In other words, the gas pushes back the liquid fuel to the isolation valve. Once the gas-liquid interface reaches the isolation valve, the isolation valve is closed isolating the DGA from the liquid fuel.

公开(公告)号：US20240361707A1

公开(公告)日：2024-10-31

申请号：US18637683

申请日：2024-04-17

申请人： CANON KABUSHIKI KAISHA

发明人： JUNICHI MOTOJIMA

IPC分类号： G03F7/00

CPC分类号： G03F7/70775 ,  G03F7/70725

摘要： An exposure apparatus for projecting a pattern of an original onto a substrate by a projection optical system, and exposing the substrate, is provided. The apparatus includes a stage configured to move while holding the substrate, a measurement device configured to perform, at a plurality of measurement points in an exposure region, measurement of a height position of the substrate held by the stage, and a controller configured to control the measurement device, and correct a position of the stage based on a result of the measurement such that a shift amount of the height position with respect to an image plane of the projection optical system is decreased. The controller is configured to set the plurality of measurement points in the exposure region based on information regarding the exposure region.

公开(公告)号：US20240361700A1

公开(公告)日：2024-10-31

申请号：US18686905

申请日：2022-09-09

申请人： ASAHI KASEI KABUSHIKI KAISHA

发明人： Yuka YOSHIDA ,  Takumi ISHII

IPC分类号： G03F7/40 ,  B41M1/04 ,  G03F7/00 ,  G03F7/20

CPC分类号： G03F7/40 ,  B41M1/04 ,  G03F7/0035 ,  G03F7/2002

摘要： A method for producing a printing plate, containing: an exposure step of forming a relief by the exposure of a photosensitive resin composition; and a developing step of performing development by attaching or adsorbing the photosensitive resin composition of an unexposed portion in the exposure step to a development medium, wherein a storage elastic modulus of the photosensitive resin composition of the unexposed portion at a development temperature of the developing step is 100 Pa or more and 4000 Pa or less, and the development medium is a wiper having an elastic recovery rate of 30% or more and 99% or less.

公开(公告)号：US20240361697A1

公开(公告)日：2024-10-31

申请号：US18560234

申请日：2021-05-14

申请人： Resonac Corporation

发明人： Yuki IMAZU ,  Kazuyuki MITSUKURA ,  Masaya TOBA ,  Yu AOKI ,  Takuya KOMINE

IPC分类号： G03F7/16 ,  G01N5/04 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/168 ,  G01N5/04 ,  G03F7/038 ,  G03F7/039 ,  H01L21/0274

摘要： The present disclosure relates to a method for selecting a photosensitive resin composition, the method including: a step of applying a photosensitive resin composition on a substrate and drying the photosensitive resin composition to form a resin film; a step of heat-treating the resin film in a nitrogen atmosphere to obtain a cured film; and a step of raising the temperature from 25° C. to 300° C. at a rate of 10° C./min in a nitrogen atmosphere and then measuring weight loss of the cured film, in which a photosensitive resin composition capable of producing the cured film having a weight loss ratio at 300° C. of 1.0% to 6.0% is selected.

公开(公告)号：US20240361695A1

公开(公告)日：2024-10-31

申请号：US18644370

申请日：2024-04-24

申请人： ASM IP Holding B.V.

发明人： João Ricardo Antunes Afonso ,  Yiting Sun ,  Fanyong Ran ,  Jerome Samuel Nicolas ,  Zecheng Liu

IPC分类号： G03F7/16 ,  G03F7/004 ,  G03F7/075

CPC分类号： G03F7/167 ,  G03F7/0043 ,  G03F7/0751 ,  G03F7/0755

摘要： Methods of forming structures including an adhesion layer and structures including the adhesion layer are disclosed. The adhesion layer may include nitrogen. The method can include forming a metal oxide resist overlying and in contact with the adhesion layer. Exemplary methods further include forming the photoresist underlayer.

公开(公告)号：US20240361689A1

公开(公告)日：2024-10-31

申请号：US18382720

申请日：2023-10-23

申请人： SAMSUNG SDI CO., LTD.

发明人： Heejo MOON ,  Baek Soung PARK ,  Juho JUNG ,  Chang-Hyun KWON ,  Kwangwon SEO

IPC分类号： G03F7/004 ,  C07D401/14 ,  G03F7/00 ,  G03F7/027

CPC分类号： G03F7/0048 ,  C07D401/14 ,  G03F7/0007 ,  G03F7/027 ,  G02B5/223

摘要： a photosensitive resin composition, a photosensitive resin layer, and a color filter manufactured using the same, the photosensitive resin composition includes a colorant; a photopolymerizable compound; a photopolymerization initiator; a binder resin; and a solvent; wherein the colorant includes a pigment, a dispersant, and a dispersion aid represented by Chemical Formula 1:

公开(公告)号：US20240361496A1

公开(公告)日：2024-10-31

申请号：US18685998

申请日：2022-08-12

申请人： NILT Switzerland GmbH

发明人： Maksim Zalkovskij ,  Brian Bilenberg

IPC分类号： G02B1/00 ,  G03F7/00 ,  G03F7/20

CPC分类号： G02B1/002 ,  G03F7/0005 ,  G03F7/2004 ,  G02B2207/101

摘要： Metastructures composed of a plurality of sublayers each of which has a respective index of refraction that differs from the index of refraction of at least one of the other sublayers are described, as are methods for manufacturing the metastructures. Intermediate wafers that can be produced during the methods also are described.

公开(公告)号：US20240361350A1

公开(公告)日：2024-10-31

申请号：US18770357

申请日：2024-07-11

申请人： Taiwan Semiconductor Manufacturing Company, Ltd.

发明人： En Hao LAI ,  Chi YANG ,  Shang-Chieh CHIEN ,  Li-Jui CHEN ,  Po-Chung CHENG

IPC分类号： G01P5/20 ,  G02B27/00 ,  G03F1/42 ,  G03F7/00 ,  G03F7/20 ,  H05G2/00

CPC分类号： G01P5/20 ,  G02B27/0006 ,  G03F1/42 ,  G03F7/20 ,  G03F7/70025 ,  G03F7/70033 ,  H05G2/008

摘要： A method includes irradiating a target droplet in an extreme ultraviolet (EUV) light source of an extreme ultraviolet lithography tool with non-ionizing light from a droplet illumination module. The method further includes detecting light reflected and/or scattered by the target droplet, and performing particle image velocimetry, based on the detected light, to determine a velocity of the target droplet. The method also includes adjusting a time delay between a generation of the target droplet and a generation of an excitation laser beam based on the velocity of the target droplet.

公开(公告)号：US12133319B2

公开(公告)日：2024-10-29

申请号：US17562819

申请日：2021-12-27

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

发明人： Ting-Ya Cheng ,  Chun-Lin Chang ,  Li-Jui Chen ,  Han-Lung Chang

IPC分类号： H05G2/00 ,  G02B7/185 ,  G02B26/06 ,  G02B26/08 ,  G02B27/09 ,  G03F7/00

CPC分类号： H05G2/008 ,  G02B7/185 ,  G02B26/06 ,  G02B26/0858 ,  G02B27/0933 ,  G02B27/0977 ,  G03F7/70033 ,  H05G2/005

摘要： An apparatus for generating extreme ultraviolet (EUV) radiation includes a droplet generator configured to generate target droplets. An excitation laser is configured to heat the target droplets using excitation pulses to convert the target droplets to plasma. A deformable mirror is disposed in a path of the excitation laser. A controller is configured to adjust parameters of the excitation laser by controlling the deformable mirror based on a feedback parameter.