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257 条记录 (耗时 0.023 秒)

    Scanning transmission electron microscope and adjustment method of optical system
    1.
    发明授权
    Scanning transmission electron microscope and adjustment method of optical system 有权

    公开(公告)号：US11545337B2

    公开(公告)日：2023-01-03

    申请号：US17236074

    申请日：2021-04-21

    申请人： JEOL Ltd.

    发明人： Ryusuke Sagawa

    IPC分类号： H01J37/256 ,  H01J37/26 ,  H01J37/28 ,  H01J37/10 ,  H01J37/147 ,  H01J37/22

    摘要： A scanning transmission electron microscope that scans a specimen with an electron probe to acquire an image. The scanning transmission electron microscope includes: an optical system which includes a condenser lens and an objective lens; an imaging device which is arranged on a back focal plane or a plane conjugate to the back focal plane of the objective lens and which is capable of photographing a Ronchigram; and a control unit which performs adjustment of the optical system. The control unit is configured or programed to: acquire an image of a change in a Ronchigram that is attributable to a change in a relative positional relationship between the specimen and the electron probe; and determine a center of the Ronchigram based on the image of the change in the Ronchigram.

    Techniques for determining and correcting for expected dose variation during implantation of photoresist-coated substrates
    3.
    发明授权
    Techniques for determining and correcting for expected dose variation during implantation of photoresist-coated substrates 有权

    公开(公告)号：US11264205B2

    公开(公告)日：2022-03-01

    申请号：US17093468

    申请日：2020-11-09

    申请人： APPLIED Materials, Inc.

    发明人： Eric Donald Wilson ,  George Gammel

    IPC分类号： H01J37/00 ,  H01J37/317 ,  H01J37/256 ,  H01J37/244 ,  H01J37/304

    摘要： A method, including using an implant recipe to perform an implant by scanning an ion beam along a first axis over a substrate, coated with a photoresist layer, while the substrate is scanned along a perpendicular axis; measuring an implant current (I) during the implant, using a first detector, positioned to a side of a substrate position; determining a value of a difference ratio (I−B)/(B), based upon the implant current, where B is current measured by the first detector, during a calibration at base pressure; determining a plurality of values of a current ratio (CR) for the plurality of instances, based upon the difference ratio, the current ratio being a ratio of the implant current to a current measured by a second detector, positioned over the substrate position, during the calibration; and adjusting scanning the ion beam, scanning of the substrate, or a combination thereof, based upon the current ratio.

    Electron beam irradiation apparatus
    6.
    发明授权
    Electron beam irradiation apparatus 有权
    电子束照射装置

    公开(公告)号：US09053905B2

    公开(公告)日：2015-06-09

    申请号：US14090065

    申请日：2013-11-26

    申请人： Hitachi High-Technologies Corporation

    发明人： Shahedul Hoque ,  Hajime Kawano

    IPC分类号： H01J37/256 ,  H01J37/244 ,  G01N23/203 ,  H01J37/29 ,  H01J37/28

    CPC分类号： H01J37/29 ,  G01N23/203 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24475

    摘要： The present invention has for its object to provide an electron beam irradiation apparatus which can suppress influences the electric fields generated by a plurality of backscattered electron detectors have. To attain the above object, an electron beam irradiation apparatus equipped with a scanning deflector comprises a plurality of backscattered electron detectors, a power source for detectors which applies voltages to the plural backscattered electron detectors, respectively, and a controller device which adjusts application voltages the power source for detectors delivers, on the basis of an image shift when the voltages are applied to the plural backscattered electron detectors.

    摘要翻译： 本发明的目的是提供一种能够抑制由多个背散射电子检测器产生的电场的影响的电子束照射装置。 为了实现上述目的，配备有扫描偏转器的电子束照射装置包括多个背散射电子检测器，分别向多个背散射电子检测器施加电压的检测器的电源以及调节施加电压的控制装置 用于检测器的电源基于当将电压施加到多个后向散射电子检测器时的图像移位来传递。

    Charged particle vortex wave generation
    7.
    发明授权
    Charged particle vortex wave generation 有权
    带电粒子涡流产生

    公开(公告)号：US09018596B2

    公开(公告)日：2015-04-28

    申请号：US14366564

    申请日：2012-12-19

    申请人： Universiteit Antwerpen

    发明人： Johan Verbeeck ,  Gustaaf Van Tendeloo

    IPC分类号： H01J37/04 ,  H01J37/26 ,  H01J3/02 ,  H01J37/06 ,  H01J37/08 ,  H01J37/256

    CPC分类号： H01J37/04 ,  H01J3/02 ,  H01J3/021 ,  H01J37/06 ,  H01J37/08 ,  H01J37/256 ,  H01J37/261 ,  H01J2237/06383 ,  H01J2237/2614

    摘要： A device for imparting an orbital angular momentum to a charged particle wave propagating along a beam axis in a charged particle beam generating apparatus is described. The device comprises a support element having a target region adapted for transmitting a charged particle wave propagating along a beam axis and an induction means for inducing a magnetic flux along an elongated profile having a free end portion located in the target region and the induction means is adapted for providing a magnetic flux in the elongated profile in order to induce an angular gradient, relative to the beam axis, of the phase of the charged particle wave when transmitted through the target region. A corresponding method is also disclosed, as well as the use thereof in electron microscopy.

    摘要翻译： 描述了一种用于对带电粒子束产生装置中沿着光束轴传播的带电粒子波进行轨道角动量的装置。 该装置包括支撑元件，该支撑元件具有适于传输沿着光束轴传播的带电粒子波的目标区域和用于沿着具有位于目标区域中的自由端部分的细长轮廓感应磁通量的感应装置，并且感应装置是 适于在细长轮廓中提供磁通量，以便当透射通过目标区域时引起带电粒子波相位相对于光束轴的角度梯度。 还公开了相应的方法，以及其在电子显微镜中的应用。

    DEFECT INSPECTION APPARATUS AND DEFECT INSPECTION METHOD
    9.
    发明申请
    DEFECT INSPECTION APPARATUS AND DEFECT INSPECTION METHOD 有权
    缺陷检查装置和缺陷检查方法

    公开(公告)号：US20140312225A1

    公开(公告)日：2014-10-23

    申请号：US14254589

    申请日：2014-04-16

    申请人： ADVANTEST CORPORATION ,  TOPPAN PRINTING CO., LTD.

    发明人： Tsutomu Murakawa ,  Isao Yonekura

    IPC分类号： H01J37/256 ,  G01N23/225

    CPC分类号： H01J37/256 ,  G01N23/2251 ,  G03F1/86 ,  H01J2237/2446 ,  H01J2237/24578 ,  H01J2237/24592

    摘要： There is provided a defect inspection apparatus including: an electron scanning unit configured to scan a surface of a sample with an electron beam; a plurality of detectors arranged around an optical axis of the electron beam and configured to detect electrons emitted from the surface of the sample by scanning the electron beam; a signal processing unit configured to generate image data of the surface of the sample based on detection signals from the detectors; an analysis unit configured to detect a defect due to irregularities of the surface of the sample based on the image data; and a control unit configured to control a scanning speed of the electron beam depending on the type of the sample.

    摘要翻译： 提供了一种缺陷检查装置，包括：电子扫描单元，被配置为用电子束扫描样品的表面; 多个检测器，围绕电子束的光轴布置，并且被配置为通过扫描电子束来检测从样品的表面发射的电子; 信号处理单元，被配置为基于来自检测器的检测信号生成样本的表面的图像数据; 分析单元，被配置为基于所述图像数据来检测由于所述样本的表面的不规则性引起的缺陷; 以及控制单元，被配置为根据样品的类型来控制电子束的扫描速度。

    Automated Mineral Classification
    10.
    发明申请
    Automated Mineral Classification 有权
    自动矿物分类

    公开(公告)号：US20140117231A1

    公开(公告)日：2014-05-01

    申请号：US13662072

    申请日：2012-10-26

    申请人： FEI Company

    发明人： Michael James Owen ,  Michael Buhot

    IPC分类号： G01N23/225 ,  H01J37/256

    CPC分类号： G01N23/2252 ,  G01N2223/418 ,  H01J37/256 ,  H01J37/28 ,  H01J2237/2442 ,  H01J2237/24425 ,  H01J2237/2804 ,  H01J2237/2807

    摘要： The present invention discloses a combination of two existing approaches for mineral analysis and makes use of the Similarity Metric Invention, that allows mineral definitions to be described in theoretical compositional terms, meaning that users are not required to find examples of each mineral, or adjust rules. This system allows untrained operators to use it, as opposed to previous systems, which required extensive training and expertise.

    摘要翻译： 本发明公开了两种现有的矿物分析方法的组合，并且使用了相似性度量发明，其允许以理论组成术语描述矿物定义，这意味着用户不需要找到每种矿物的实例，或调整规则 。 该系统允许未经训练的运营商使用它，而不是以前的系统，需要广泛的培训和专业知识。