Radiation-emitting semiconductor chip

    公开(公告)号:US12080827B2

    公开(公告)日:2024-09-03

    申请号:US18186037

    申请日:2023-03-17

    申请人: OSRAM OLED GmbH

    摘要: In an embodiment a radiation-emitting semiconductor chip includes a semiconductor body having an active region configured to generate radiation, a first contact layer having a first contact area and a first contact finger structure connected to the first contact area, a second contact layer having a second contact area and a second contact finger structure connected to the second contact area, a current distribution layer electrically conductively connected to the first contact layer, a connection layer electrically conductively connected to the first contact layer via the current distribution layer and an insulation layer, wherein the insulation layer is arranged in places between the connection layer and the current distribution layer, wherein the insulation layer has at a plurality of openings, in which the connection layer and the current distribution layer adjoin one another, and wherein edge regions of the insulation layer includes more openings than a central region of the insulation layer.

    SEMICONDUCTOR DEVICE AND DISPLAY DEVICE
    3.
    发明公开

    公开(公告)号:US20240290922A1

    公开(公告)日:2024-08-29

    申请号:US18572437

    申请日:2022-03-11

    发明人: KEIJI SUGI

    摘要: Reduction of the maximum luminance is suppressed. A semiconductor device according to an embodiment includes a light emitter (105) provided on an upper surface of a substrate, a metal microstructure (108) disposed on a side opposite to the substrate with the light emitter interposed therebetween and spaced apart from the light emitter by a predetermined distance, and a reflector (109) provided on the substrate so as to partition adjacent semiconductor devices.

    MICRO-LED WITH IMPROVED LIGHT EXTRACTION
    4.
    发明公开

    公开(公告)号:US20240282888A1

    公开(公告)日:2024-08-22

    申请号:US18571080

    申请日:2022-06-10

    申请人: Google LLC

    IPC分类号: H01L33/20 H01L27/15 H01L33/46

    CPC分类号: H01L33/20 H01L27/15 H01L33/46

    摘要: A micro light-emitting diode, micro-LED, is configured to provide increased light-extraction. The micro-LED (300) according to the present disclosure has a lateral dimension less than 20 micrometres and comprises: a light-emitting layer (106), an output facet (308), an optical interface (via a mirror 114) parallel to the light-emitting layer, and a non-vertical sidewall (102) forming an angle with respect to a normal of the light-emitting layer. The layer (106) emits light (310) comprising a first light (312) in a first trajectory that escapes the micro-LED through the output facet (308) without reflecting off the optical interface and a second light (314) in a second trajectory that reflects off the optical interface and the non-vertical sidewall (102) and escapes through the output facet. The disclosed micro-LEDs may further include one or more of: cavity effects, light guiding, total internal reflection at low-index layers, mirrors, and micro-optics.

    Light emitting diode structure
    9.
    发明授权

    公开(公告)号:US11984530B2

    公开(公告)日:2024-05-14

    申请号:US17235729

    申请日:2021-04-20

    发明人: Ching-Chung Chen

    摘要: A light emitting diode (LED) structure includes a substrate, a first type semiconductor layer, a second type semiconductor layer, and a multi-quantum well light-emitting layer. The first type semiconductor layer is disposed on the substrate and has a patterned structure layer on a surface of the first type semiconductor layer away from the substrate. The multi-quantum well light-emitting layer is sandwiched between the patterned structure layer and the second type semiconductor layer and covers the patterned structure layer. The multi-quantum well light-emitting layer has multiple first thickness regions, multiple second thickness regions, and multiple transition regions. The first thickness region has a thickness greater than the second thickness region in a vertical direction from the first type semiconductor layer to the second type semiconductor layer. The transition region has a thickness that gradually decreases in a direction from the first thickness regions to the second thickness region.