ACOUSTIC TUNING NETWORK IN AN ACOUSTIC FILTER CIRCUIT

    公开(公告)号:US20240333257A1

    公开(公告)日:2024-10-03

    申请号:US18616708

    申请日:2024-03-26

    申请人: Qorvo US, Inc.

    发明人: Nadim Khlat

    IPC分类号: H03H9/54 H03H9/205

    CPC分类号: H03H9/542 H03H9/205

    摘要: An acoustic tuning network is provided. In embodiments disclosed herein, the acoustic tuning network can be coupled in parallel to an acoustic resonator and tuned to either cancel an input current or an output current of the acoustic resonator. As such, it is possible to provide multiple acoustic tuning networks in an acoustic filter circuit having multiple acoustic resonators to enable a variety of application scenarios.

    ACOUSTIC WAVE DEVICE
    5.
    发明公开

    公开(公告)号:US20240297634A1

    公开(公告)日:2024-09-05

    申请号:US18657884

    申请日:2024-05-08

    发明人: Katsuya DAIMON

    IPC分类号: H03H9/145 H03H9/02 H03H9/54

    摘要: An acoustic wave device includes a support including a support substrate, a piezoelectric layer on the support, and an IDT electrode including busbars and electrode fingers, and a mass-adding film on the piezoelectric layer. In plan view as seen in a stacking direction in which the support and the piezoelectric layer are stacked, an acoustic reflector overlaps at least a portion of the IDT electrode. d/p is less than or equal to about 0.5, where d is a thickness of the piezoelectric layer and p is a center-to-center distance between adjacent electrode fingers. A region in which adjacent electrode fingers overlap each other when seen from an electrode-finger-facing direction is a crossing region. Regions between the crossing region and the pair of busbars include first and second gap regions. The mass-adding film overlaps the gap region in plan view and is on the second main surface of the piezoelectric layer.

    Fabrication method of film bulk acoustic resonator (FBAR) filter device

    公开(公告)号:US12068733B2

    公开(公告)日:2024-08-20

    申请号:US18473670

    申请日:2023-09-25

    IPC分类号: H03H3/02 H03H9/17 H03H9/54

    CPC分类号: H03H3/02 H03H9/171 H03H9/54

    摘要: A method for fabricating a film bulk acoustic resonator (FBAR) filter device is provided. The method includes: forming a first electrode of each one of a first resonator and a second resonator on a first surface of a piezoelectric layer, forming a first passivation layer of each one of the first resonator and the second resonator on a corresponding one of the first electrodes, forming a second electrode of each one of the first resonator and the second resonator on a second surface of the piezoelectric layer, conducting a radio frequency (RF) performance test on the FBAR filter device, adjusting a thickness of the second electrode of the first resonator based on a result of the RF performance test, and forming a second passivation layer of each one of the first resonator and the second resonator on a corresponding one of the second electrodes.