公开(公告)号：WO2023067580A1

公开(公告)日：2023-04-27

申请号：PCT/IB2022/060178

申请日：2022-10-24

Applicant: NOVA MEASURING INSTRUMENTS INC.

Inventor： POIS, Heath ,  LEE, Wei Ti ,  WARAD, Laxmi ,  KISLITSYN, Dmitry ,  LUND, Parker ,  TSENG, Benny ,  CHEN, James ,  SINGH, Saurabh

IPC: G01N23/223 ,  G01B15/02 ,  H01L21/66

Abstract: A system to characterize a film layer within a measurement box is disclosed. The system obtains a first mixing fraction corresponding to a first X-ray beam, the mixing fraction represents a fraction of the first X-ray beam inside a measurement box of a wafer sample, the measurement box represents a bore structure disposed over a substrate and having a film layer disposed inside the bore structure. The system obtains a contribution value for the measurement box corresponding to the first X-ray beam, the contribution value representing a species signal outside the measurement box that contributes to a same species signal inside the measurement box. The system obtains a first measurement detection signal corresponding to a measurement of the measurement box using the first X-ray beam. The system determines a measurement value of the film layer based on the first measurement detection signal, the contribution value, and the first mixing fraction.